Yang; Hee-jeon

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yang; Hee-jeon.The latest application filed is for "etching method using plasma, and method of fabricating semiconductor device including the etching method".

Company Profile

0.5.6

Yang; Hee-jeon - Suwon-si KR
Yang, Hee-jeon - Kunpo-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etching method using plasma, and method of fabricating semiconductor device including the etching method Grant 9,865,474 - Kim , et al. January 9, 2	2018-01-09
Etching Method Using Plasma, And Method Of Fabricating Semiconductor Device Including The Etching Method App 20170062235 - Kim; Gon-Jun ; et al.	2017-03-02
Etching method using plasma, and method of fabricating semiconductor device including the etching method Grant 9,520,301 - Kim , et al. December 13, 2	2016-12-13
Etching Method Using Plasma, And Method Of Fabricating Semiconductor Device Including The Etching Method App 20160111298 - Kim; Go-jun ; et al.	2016-04-21
Apparatus to treat a substrate Grant 8,404,080 - Jeon , et al. March 26, 2	2013-03-26
Apparatus to treat a substrate App 20070017446 - Jeon; Sang-jean ; et al.	2007-01-25
Semiconductor manufacturing apparatus App 20050155555 - Han, Kyu-hee ; et al.	2005-07-21
System for making semiconductor devices and processing control thereof App 20050027481 - Yang, Hee-jeon ; et al.	2005-02-03

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