Yang; Chung-Ru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yang; Chung-Ru.The latest application filed is for "source/drain carbon implant and rta anneal, pre-sige deposition".

Company Profile

0.6.4

Yang; Chung-Ru - Chung-Ho TW
Yang; Chung-Ru - Chung-Ho City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Source/drain carbon implant and RTA anneal, pre-SiGe deposition Grant 8,404,546 - Woon , et al. March 26, 2	2013-03-26
RTP spike annealing for semiconductor substrate dopant activation Grant 8,232,114 - Lin , et al. July 31, 2	2012-07-31
Field-by-field laser annealing and feed forward process control Grant 8,188,447 - Yang , et al. May 29, 2	2012-05-29
Nitride film wet stripping Grant 8,105,851 - Ku , et al. January 31, 2	2012-01-31
Source/Drain Carbon Implant and RTA Anneal, Pre-SiGe Deposition App 20110027955 - Woon; Wei-Yen ; et al.	2011-02-03
Source/drain carbon implant and RTA anneal, pre-SiGe deposition Grant 7,838,887 - Woon , et al. November 23, 2	2010-11-23
Rtp Spike Annealing For Semiconductor Substrate Dopant Activation App 20100190274 - LIN; Chin-Ming ; et al.	2010-07-29
Field-by-field Laser Annealing And Feed Forward Process Control App 20100187444 - Yang; Chung-Ru ; et al.	2010-07-29
Source/Drain Carbon Implant and RTA Anneal, Pre-SiGe Deposition App 20090273034 - Woon; Wei-Yen ; et al.	2009-11-05

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