Yang; Chung-I
Patent Applications and Registrations
Patent applications and USPTO patent grants for Yang; Chung-I.The latest application filed is for "multi-gate devices and fabricating the same with etch rate modulation".
- Yang; Chung-I - Hsinchu TW
- Yang; Chung-I - Kaohsiung City TW
- Yang; Chung-I - Kaohsiung TW
| Patent | Date |
|---|---|
| Dielectric fin structure Grant 11,404,576 - Lu , et al. August 2, 2 | 2022-08-02 |
| Multi-Gate Devices and Fabricating the Same with Etch Rate Modulation App 20220208989 - Wang; Chih-Ching ; et al. | 2022-06-30 |
| Dielectric Fin Structure App 20220115530 - Lu; Yu-Shan ; et al. | 2022-04-14 |
| Multi-gate devices and fabricating the same with etch rate modulation Grant 11,282,943 - Wang , et al. March 22, 2 | 2022-03-22 |
| Multi-Gate Devices and Fabricating the Same with Etch Rate Modulation App 20210391443 - Wang; Chih-Ching ; et al. | 2021-12-16 |
| Method and Apparatus for Increasing Luminous Intensity of an Ultraviolet Light Emitting Diode App 20180227997 - Chang; Ting-Chang ; et al. | 2018-08-09 |
| Method and apparatus for increasing luminous intensity of an ultraviolet light emitting diode Grant 10,045,414 - Chang , et al. August 7, 2 | 2018-08-07 |
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