loadpatents
Patent applications and USPTO patent grants for Yang; Chuen Huei.The latest application filed is for "method to determine process window".
Patent | Date |
---|---|
Method to determine process window Grant 8,225,237 - Wu , et al. July 17, 2 | 2012-07-17 |
Method for constructing OPC model Grant 8,166,424 - Wu , et al. April 24, 2 | 2012-04-24 |
Method for selectively amending layout patterns Grant 8,042,069 - Yang , et al. October 18, 2 | 2011-10-18 |
Method of verifying a layout pattern Grant 7,913,196 - Wu , et al. March 22, 2 | 2011-03-22 |
Method To Determine Process Window App 20100131914 - Wu; Te-Hung ;   et al. | 2010-05-27 |
Mask pattern and method for forming the same Grant 7,687,206 - Fu , et al. March 30, 2 | 2010-03-30 |
Method For Constructing Opc Model App 20100070944 - Wu; Te-Hung ;   et al. | 2010-03-18 |
Method for correcting photomask pattern Grant 7,669,153 - Wu , et al. February 23, 2 | 2010-02-23 |
Method of inspecting photomask defect Grant 7,664,614 - Wu , et al. February 16, 2 | 2010-02-16 |
Method For Selectively Amending Layout Patterns App 20100036644 - Yang; Yu-Shiang ;   et al. | 2010-02-11 |
Method Of Inspecting Photomask Defect App 20090119045 - Wu; Te-Hung ;   et al. | 2009-05-07 |
Method of verifying a layout pattern App 20080295062 - Wu; Te-Hung ;   et al. | 2008-11-27 |
Method For Correcting Photomask Pattern App 20080270969 - Wu; Te-Hung ;   et al. | 2008-10-30 |
Mask Pattern And Method For Forming The Same App 20080220341 - Fu; Chuan-Hsien ;   et al. | 2008-09-11 |
Method For Correcting Photomask Pattern App 20080178140 - Lin; Ling-Chieh ;   et al. | 2008-07-24 |
Lithography method Grant 7,312,020 - Lin , et al. December 25, 2 | 2007-12-25 |
Phase shift mask Grant 7,141,337 - Lin , et al. November 28, 2 | 2006-11-28 |
Photomask pattern Grant 7,008,732 - Lin , et al. March 7, 2 | 2006-03-07 |
Photomask for enhancing contrast App 20050112473 - Hung, Wen-Tien ;   et al. | 2005-05-26 |
Lithography Method App 20050100829 - Lin, Chin-Lung ;   et al. | 2005-05-12 |
Photomask pattern App 20040229131 - Lin, Chin-Lung ;   et al. | 2004-11-18 |
A phase shift mask App 20040197671 - Lin, Chin-Lung ;   et al. | 2004-10-07 |
Photolithography process with hybrid chromeless phase shift mask App 20040023124 - Lin, Chin-Lung ;   et al. | 2004-02-05 |
Chromeless PSM with chrome assistant feature App 20040013948 - Lin, Chin-Lung ;   et al. | 2004-01-22 |
Method of dividing a semiconductor integrated circuit pattern App 20040006759 - Yang, Chuen Huei ;   et al. | 2004-01-08 |
Photolithography process for producing gates and conductive lines App 20020110765 - Lai, Chien-Wen ;   et al. | 2002-08-15 |
Scarf Grant D396,338 - Yang July 28, 1 | 1998-07-28 |
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