loadpatents
name:-0.020263910293579
name:-0.012144088745117
name:-0.00062417984008789
Yang; Chuen Huei Patent Filings

Yang; Chuen Huei

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yang; Chuen Huei.The latest application filed is for "method to determine process window".

Company Profile
0.11.16
  • Yang; Chuen Huei - Taipei TW
  • Yang; Chuen Huei - Taipei City TW
  • Yang; Chuen Huei - Fung Yung Taichung TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method to determine process window
Grant 8,225,237 - Wu , et al. July 17, 2
2012-07-17
Method for constructing OPC model
Grant 8,166,424 - Wu , et al. April 24, 2
2012-04-24
Method for selectively amending layout patterns
Grant 8,042,069 - Yang , et al. October 18, 2
2011-10-18
Method of verifying a layout pattern
Grant 7,913,196 - Wu , et al. March 22, 2
2011-03-22
Method To Determine Process Window
App 20100131914 - Wu; Te-Hung ;   et al.
2010-05-27
Mask pattern and method for forming the same
Grant 7,687,206 - Fu , et al. March 30, 2
2010-03-30
Method For Constructing Opc Model
App 20100070944 - Wu; Te-Hung ;   et al.
2010-03-18
Method for correcting photomask pattern
Grant 7,669,153 - Wu , et al. February 23, 2
2010-02-23
Method of inspecting photomask defect
Grant 7,664,614 - Wu , et al. February 16, 2
2010-02-16
Method For Selectively Amending Layout Patterns
App 20100036644 - Yang; Yu-Shiang ;   et al.
2010-02-11
Method Of Inspecting Photomask Defect
App 20090119045 - Wu; Te-Hung ;   et al.
2009-05-07
Method of verifying a layout pattern
App 20080295062 - Wu; Te-Hung ;   et al.
2008-11-27
Method For Correcting Photomask Pattern
App 20080270969 - Wu; Te-Hung ;   et al.
2008-10-30
Mask Pattern And Method For Forming The Same
App 20080220341 - Fu; Chuan-Hsien ;   et al.
2008-09-11
Method For Correcting Photomask Pattern
App 20080178140 - Lin; Ling-Chieh ;   et al.
2008-07-24
Lithography method
Grant 7,312,020 - Lin , et al. December 25, 2
2007-12-25
Phase shift mask
Grant 7,141,337 - Lin , et al. November 28, 2
2006-11-28
Photomask pattern
Grant 7,008,732 - Lin , et al. March 7, 2
2006-03-07
Photomask for enhancing contrast
App 20050112473 - Hung, Wen-Tien ;   et al.
2005-05-26
Lithography Method
App 20050100829 - Lin, Chin-Lung ;   et al.
2005-05-12
Photomask pattern
App 20040229131 - Lin, Chin-Lung ;   et al.
2004-11-18
A phase shift mask
App 20040197671 - Lin, Chin-Lung ;   et al.
2004-10-07
Photolithography process with hybrid chromeless phase shift mask
App 20040023124 - Lin, Chin-Lung ;   et al.
2004-02-05
Chromeless PSM with chrome assistant feature
App 20040013948 - Lin, Chin-Lung ;   et al.
2004-01-22
Method of dividing a semiconductor integrated circuit pattern
App 20040006759 - Yang, Chuen Huei ;   et al.
2004-01-08
Photolithography process for producing gates and conductive lines
App 20020110765 - Lai, Chien-Wen ;   et al.
2002-08-15
Scarf
Grant D396,338 - Yang July 28, 1
1998-07-28

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