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Patent applications and USPTO patent grants for Yang; Chan Syun.The latest application filed is for "gate structure for semiconductor device".
Patent | Date |
---|---|
Gate structure for semiconductor device Grant 8,901,665 - Kelly , et al. December 2, 2 | 2014-12-02 |
Gate Structure For Semiconductor Device App 20130161762 - Kelly; Andrew Joseph ;   et al. | 2013-06-27 |
Hydrogen ashing enhanced with water vapor and diluent gas Grant 7,807,579 - Yang , et al. October 5, 2 | 2010-10-05 |
Hydrogen Ashing Enhanced With Water Vapor And Diluent Gas App 20080261405 - Yang; Chan-Syun ;   et al. | 2008-10-23 |
Method for laterally etching a semiconductor structure App 20040077178 - Yang, Chan-Syun ;   et al. | 2004-04-22 |
Method for controlling the extent of notch or undercut in an etched profile using optical reflectometry App 20040018647 - Jones, Steven J. ;   et al. | 2004-01-29 |
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