Yang; Baorui

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yang; Baorui.The latest application filed is for "method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect".

Company Profile

0.23.19

Yang; Baorui - Boise ID
Yang; Baorui - Pflugerville TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect Grant 7,977,017 - Yang July 12, 2	2011-07-12
Reticle constructions Grant 7,910,270 - Yang March 22, 2	2011-03-22
Method to Recover the Exposure Sensitivity of Chemically Amplified Resins from Post Coat Delay Effect App 20110045389 - Yang; Baorui	2011-02-24
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect Grant 7,826,033 - Yang November 2, 2	2010-11-02
Reticle Constructions App 20100248093 - Yang; Baorui	2010-09-30
Electron beam lithography system Grant 7,759,660 - Yang July 20, 2	2010-07-20
Methods of forming reticles Grant 7,754,399 - Yang July 13, 2	2010-07-13
Methods of Forming Reticles App 20090239162 - Yang; Baorui	2009-09-24
Method for quartz bump defect repair with less substrate damage Grant 7,569,314 - Yang , et al. August 4, 2	2009-08-04
Methods of forming reticles Grant 7,556,897 - Yang July 7, 2	2009-07-07
Methods of Forming Reticles App 20080305413 - Yang; Baorui	2008-12-11
Methods of forming reticles Grant 7,442,472 - Yang October 28, 2	2008-10-28
Methods of forming reticles Grant 7,432,025 - Yang October 7, 2	2008-10-07
Method for quartz bump defect repair with less substrate damage Grant 7,309,549 - Yang , et al. December 18, 2	2007-12-18
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect Grant 7,258,954 - Yang August 21, 2	2007-08-21
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect Grant 7,229,725 - Yang June 12, 2	2007-06-12
Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system Grant 7,229,742 - Yang June 12, 2	2007-06-12
Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system Grant 7,226,723 - Yang June 5, 2	2007-06-05
Method for quartz bump defect repair with less substrate damage App 20070105027 - Yang; Baorui ; et al.	2007-05-10
Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system App 20070102651 - Yang; Baorui	2007-05-10
Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system App 20070003874 - Yang; Baorui	2007-01-04
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect Grant 7,147,973 - Yang December 12, 2	2006-12-12
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect App 20060269853 - Yang; Baorui	2006-11-30
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect App 20060269852 - Yang; Baorui	2006-11-30
Methods of forming reticles App 20060234142 - Yang; Baorui	2006-10-19
Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure system App 20060183025 - Yang; Baorui ; et al.	2006-08-17
Reticle constructions and methods of forming reticles App 20060035156 - Yang; Baorui	2006-02-16
Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system App 20050233227 - Yang, Baorui	2005-10-20
Method for quartz bump defect repair with less substrate damage Grant 6,933,081 - Yang , et al. August 23, 2	2005-08-23
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect App 20050170266 - Yang, Baorui	2005-08-04
Method for quartz bump defect repair with less substrate damage App 20040202944 - Yang, Baorui ; et al.	2004-10-14
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect App 20040185349 - Yang, Baorui	2004-09-23
Methods of patterning materials; and photomasks Grant 6,723,476 - Yang April 20, 2	2004-04-20
Method for quartz bump defect repair with less substrate damage App 20030215721 - Yang, Baorui ; et al.	2003-11-20
Reduction of charging effect and carbon deposition caused by electron beam devices Grant 6,525,317 - Yang February 25, 2	2003-02-25
Methods of patterning materials; and photomasks App 20030027056 - Yang, Baorui	2003-02-06
Method for repairing MoSi attenuated phase shifting masks App 20010028045 - Yang, Baorui	2001-10-11
Inspection method and apparatus for detecting defects on photomasks Grant 6,297,879 - Yang , et al. October 2, 2	2001-10-02
Method for repairing bump and divot defects in a phase shifting mask Grant 6,291,115 - Yang September 18, 2	2001-09-18
Method for repairing MoSi attenuated phase shift masks Grant 6,277,526 - Yang August 21, 2	2001-08-21
Method for repairing alternating phase shifting masks Grant 6,096,459 - Yang August 1, 2	2000-08-01
Method for removing the carbon halo caused by FIB clear defect repair of a photomask Grant 6,030,731 - Yang February 29, 2	2000-02-29

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