Yanagisawa; Akio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yanagisawa; Akio.The latest application filed is for "raw material solution for metal organic chemical vapor deposition method and method for manufacturing composite oxide film containing hf-si using the raw material solution".

Company Profile

0.2.5

Yanagisawa; Akio - Kounosu-shi JP
Yanagisawa; Akio - Naka-gun JP
Yanagisawa; Akio - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Raw Material Solution for Metal Organic Chemical Vapor Deposition Method and Method for Manufacturing Composite Oxide Film Containing Hf-Si Using the Raw Material Solution App 20080299312 - Itsuki; Atsushi ; et al.	2008-12-04
Raw Material Solution for Metal Organic Chemical Vapor Deposition and Composite Oxide-Based Dielectric Thin Film Produced by Using the Raw Material App 20080072792 - Yanagisawa; Akio ; et al.	2008-03-27
Capacitor Film Forming Material App 20070231251 - Itsuki; Atsushi ; et al.	2007-10-04
Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same Grant 7,196,211 - Itsuki , et al. March 27, 2	2007-03-27
Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds Grant 7,045,645 - Hirakoso , et al. May 16, 2	2006-05-16
Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds App 20050090679 - Hirakoso, Hideyuki ; et al.	2005-04-28
Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same App 20050065358 - Itsuki, Atsushi ; et al.	2005-03-24

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