Yan; Pei-yang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yan; Pei-yang.The latest application filed is for "extreme ultraviolet (euv) mask protection against inspection laser damage".

Company Profile

0.31.29

Yan; Pei-yang - Saratoga CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Phase shift mask structure and fabrication process Grant 7,759,022 - Yan July 20, 2	2010-07-20
Mask with minimum reflectivity over absorber layer Grant 7,556,894 - Yan July 7, 2	2009-07-07
Method to correct EUVL mask substrate non-flatness Grant 7,534,532 - Yan May 19, 2	2009-05-19
Extreme Ultraviolet (euv) Mask Protection Against Inspection Laser Damage App 20090075179 - Ultanir; Erdem ; et al.	2009-03-19
Method and apparatus for clean photomask handling Grant 7,452,637 - Yan November 18, 2	2008-11-18
Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallel Grant 7,410,733 - Yan , et al. August 12, 2	2008-08-12
Phase shift mask structure and fabrication process App 20080076035 - Yan; Pei-yang	2008-03-27
Interference multilayer capping design for multilayer reflective mask blanks Grant 7,300,724 - Yan November 27, 2	2007-11-27
Reclaim method for extreme ultraviolet lithography mask blank and associated products App 20070090084 - Yan; Pei-Yang ; et al.	2007-04-26
Mask with minimum reflectivity over absorber layer App 20070026323 - Yan; Pei-Yang	2007-02-01
Reflective mask with high inspection contrast Grant 7,118,832 - Yan October 10, 2	2006-10-10
Leaky absorber for extreme ultraviolet mask App 20060222961 - Yan; Pei-Yang	2006-10-05
Photomasking Grant 7,083,881 - Yan August 1, 2	2006-08-01
Method to correct EUVL mask substrate non-flatness App 20060166109 - Yan; Pei-Yang	2006-07-27
Thermally-generated mask pattern Grant 7,078,136 - Yan July 18, 2	2006-07-18
Multilayer reflective extreme ultraviolet lithography mask blanks Grant 6,998,202 - Yan February 14, 2	2006-02-14
Proximity correcting lithography mask blanks Grant 6,998,203 - Yan February 14, 2	2006-02-14
Method and apparatus for clean photomask handling App 20050277031 - Yan, Pei-yang	2005-12-15
Interference multilayer capping design for multilayer reflective mask blanks App 20050277030 - Yan, Pei-Yang	2005-12-15
Double-metal EUV mask absorber App 20050227152 - Yan, Pei-Yang ; et al.	2005-10-13
Double-metal EUV mask absorber Grant 6,913,706 - Yan , et al. July 5, 2	2005-07-05
Absorber layer for EUV Grant 6,908,714 - Yan , et al. June 21, 2	2005-06-21
High performance EUV mask Grant 6,905,801 - Liang , et al. June 14, 2	2005-06-14
Photomasking App 20050069789 - Yan, Pei-Yang	2005-03-31
Proximity correcting lithography mask blanks App 20050026048 - Yan, Pei-Yang	2005-02-03
Multilayer reflective extreme ultraviolet lithography mask blanks App 20050026046 - Yan, Pei-Yang	2005-02-03
Photolithographic mask fabrication Grant 6,830,851 - Yan December 14, 2	2004-12-14
Photolithographic mask fabrication Grant 6,818,357 - Yan November 16, 2	2004-11-16
Photomasking Grant 6,818,361 - Yan November 16, 2	2004-11-16
Reflective mask with high inspection contrast App 20040131948 - Yan, Pei-Yang	2004-07-08
Double-metal EUV mask absorber App 20040124174 - Yan, Pei-Yang ; et al.	2004-07-01
Thermal generation of mask pattern App 20040126675 - Yan, Pei-Yang	2004-07-01
High performance EUV mask App 20040126670 - Liang, Shoudeng ; et al.	2004-07-01
Thermal generation of mask pattern Grant 6,756,158 - Yan June 29, 2	2004-06-29
Re-usable extreme ultraviolet lithography multilayer mask blank Grant 6,756,163 - Yan June 29, 2	2004-06-29
Enhanced inspection of extreme ultraviolet mask Grant 6,720,118 - Yan , et al. April 13, 2	2004-04-13
Re-usable extreme ultraviolet lithography multilayer mask blank App 20040002009 - Yan, Pei-Yang	2004-01-01
Extreme ultraviolet mask with improved absorber App 20030228530 - Yan, Pei-Yang ; et al.	2003-12-11
Absorberless phase-shifting mask for EUV Grant 6,641,959 - Yan November 4, 2	2003-11-04
Enhanced inspection of extreme ultraviolet mask App 20030203289 - Yan, Pei-Yang ; et al.	2003-10-30
Photolithographic mask fabrication App 20030190532 - Yan, Pei-Yang	2003-10-09
Method to fabricate extreme ultraviolet lithography masks Grant 6,630,273 - Yan , et al. October 7, 2	2003-10-07
Photomasking App 20030170572 - Yan, Pei-Yang	2003-09-11
Extreme ultraviolet mask with improved absorber Grant 6,610,447 - Yan , et al. August 26, 2	2003-08-26
Damascene extreme ultraviolet lithography alternative phase shift photomask and method of making Grant 6,607,862 - Yan , et al. August 19, 2	2003-08-19
Damascene extreme ultraviolet lithography (EUVL) photomask and method of making Grant 6,593,041 - Yan July 15, 2	2003-07-15
Enhanced inspection of extreme ultraviolet mask Grant 6,583,068 - Yan , et al. June 24, 2	2003-06-24
Photomasking Grant 6,562,522 - Yan May 13, 2	2003-05-13
Photolithographic mask fabrication App 20030064296 - Yan, Pei-Yang	2003-04-03
Damascene Extreme Ultraviolet Lithography Alternative Phase Shift Photomask And Method Of Making App 20030039894 - Yan, Pei-Yang ; et al.	2003-02-27
Absorberless phase-shifting mask for EUV App 20030031937 - Yan, Pei-Yang	2003-02-13
Damascene extreme ultraviolet lithography ( EUVL) photomask and method of making App 20030027053 - Yan, Pei-yang	2003-02-06
Thermal generation of mask pattern App 20030003373 - Yan, Pei-Yang	2003-01-02
Enhanced inspection of extreme ultraviolet mask App 20020142620 - Yan, Pei-Yang ; et al.	2002-10-03
Extreme ultraviolet mask with improved absorber App 20020142230 - Yan, Pei-Yang ; et al.	2002-10-03
Method to fabricate extreme ultraviolet lithography masks App 20020012855 - Yan, Pei-Yang ; et al.	2002-01-31
Clean-enclosure window to protect photolithographic mask Grant 6,280,886 - Yan August 28, 2	2001-08-28
Clean-enclosure window to protect photolithographic mask Grant 6,197,454 - Yan March 6, 2	2001-03-06
Method of protecting an EUV mask from damage and contamination Grant 5,928,817 - Yan , et al. July 27, 1	1999-07-27
Method and apparatus for enhancing the focus latitude in lithography Grant 5,303,002 - Yan April 12, 1	1994-04-12