loadpatents
Patent applications and USPTO patent grants for Yamashita; Fumiko.The latest application filed is for "substrate processing apparatus and substrate processing method".
Patent | Date |
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Substrate processing apparatus and substrate processing method Grant 10,923,329 - Nishimura , et al. February 16, 2 | 2021-02-16 |
Substrate Processing Apparatus And Substrate Processing Method App 20200111646 - NISHIMURA; Eiichi ;   et al. | 2020-04-09 |
Etching method and substrate processing apparatus Grant 9,882,124 - Nishimura , et al. January 30, 2 | 2018-01-30 |
Etching apparatus Grant 9,691,643 - Nishimura , et al. June 27, 2 | 2017-06-27 |
Plasma processing method and plasma processing apparatus Grant 9,660,182 - Sone , et al. May 23, 2 | 2017-05-23 |
Etching method and substrate processing apparatus Grant 9,419,211 - Nishimura , et al. August 16, 2 | 2016-08-16 |
Pattern forming method Grant 9,412,618 - Morikita , et al. August 9, 2 | 2016-08-09 |
Etching Method App 20160203998 - TOBANA; Toshikatsu ;   et al. | 2016-07-14 |
Pattern Forming Method App 20160042970 - Morikita; Shinya ;   et al. | 2016-02-11 |
Semiconductor device manufacturing method Grant 9,245,764 - Nishimura , et al. January 26, 2 | 2016-01-26 |
Method and apparatus for forming a periodic pattern using a self-assembled block copolymer Grant 9,234,083 - Nishimura , et al. January 12, 2 | 2016-01-12 |
Method of etching copper layer and mask Grant 9,208,997 - Nishimura , et al. December 8, 2 | 2015-12-08 |
Plasma processing method and manufacturing method of semiconductor device Grant 9,177,781 - Tahara , et al. November 3, 2 | 2015-11-03 |
Substrate processing method and storage medium Grant 9,165,784 - Nishimura , et al. October 20, 2 | 2015-10-20 |
Method of etching metal layer Grant 9,150,969 - Nishimura , et al. October 6, 2 | 2015-10-06 |
Etching Method And Substrate Processing Apparatus App 20150214474 - NISHIMURA; Eiichi ;   et al. | 2015-07-30 |
Substrate Processing Apparatus And Substrate Processing Method App 20150132970 - Nishimura; Eiichi ;   et al. | 2015-05-14 |
Semiconductor Device Manufacturing Method App 20150079790 - Nishimura; Eiichi ;   et al. | 2015-03-19 |
Plasma Processing Method And Plasma Processing Apparatus App 20150050750 - Sone; Takashi ;   et al. | 2015-02-19 |
Method And Apparatus For Forming A Periodic Pattern Using A Self-assembled Block Copolymer App 20150048049 - Nishimura; Eiichi ;   et al. | 2015-02-19 |
Etching Apparatus App 20150013908 - NISHIMURA; Eiichi ;   et al. | 2015-01-15 |
Etching method and etching apparatus Grant 8,877,081 - Nishimura , et al. November 4, 2 | 2014-11-04 |
Method Of Etching Metal Layer App 20140251945 - NISHIMURA; Eiichi ;   et al. | 2014-09-11 |
Substrate processing method and storage medium Grant 8,778,206 - Nishimura , et al. July 15, 2 | 2014-07-15 |
Etching Method And Substrate Processing Apparatus App 20140120635 - Nishimura; Eiichi ;   et al. | 2014-05-01 |
Method Of Etching Copper Layer And Mask App 20140110373 - Nishimura; Eiichi ;   et al. | 2014-04-24 |
Etching Method And Etching Apparatus App 20130196511 - NISHIMURA; Eiichi ;   et al. | 2013-08-01 |
Substrate processing method Grant 8,383,521 - Nishimura , et al. February 26, 2 | 2013-02-26 |
Substrate Processing Method And Storage Medium App 20120244718 - NISHIMURA; Eiichi ;   et al. | 2012-09-27 |
Substrate Processing Method And Storage Medium App 20120214315 - Nishimura; Eiichi ;   et al. | 2012-08-23 |
Plasma Processing Method And Manufacturing Method Of Semiconductor Device App 20120009786 - TAHARA; Shigeru ;   et al. | 2012-01-12 |
Method And Apparatus For Recovering Pattern On Silicon Substrate App 20110174337 - NISHIMURA; Eiichi ;   et al. | 2011-07-21 |
Substrate Cleaning Method And Substrate Cleaning Apparatus App 20110168205 - TAHARA; Shigeru ;   et al. | 2011-07-14 |
Substrate Processing Method App 20100233883 - Nishimura; Eiichi ;   et al. | 2010-09-16 |
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