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name:-0.24983191490173
name:-0.0046169757843018
Yamashita; Fumiko Patent Filings

Yamashita; Fumiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yamashita; Fumiko.The latest application filed is for "substrate processing apparatus and substrate processing method".

Company Profile
2.19.19
  • Yamashita; Fumiko - Miyagi JP
  • Yamashita; Fumiko - Kurokawa-gun Miyagi
  • Yamashita; Fumiko - Nirasaki JP
  • Yamashita; Fumiko - Kurokawa JP
  • Yamashita; Fumiko - Nirasaki-shi JP
  • Yamashita; Fumiko - Nirasaki-City JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate processing apparatus and substrate processing method
Grant 10,923,329 - Nishimura , et al. February 16, 2
2021-02-16
Substrate Processing Apparatus And Substrate Processing Method
App 20200111646 - NISHIMURA; Eiichi ;   et al.
2020-04-09
Etching method and substrate processing apparatus
Grant 9,882,124 - Nishimura , et al. January 30, 2
2018-01-30
Etching apparatus
Grant 9,691,643 - Nishimura , et al. June 27, 2
2017-06-27
Plasma processing method and plasma processing apparatus
Grant 9,660,182 - Sone , et al. May 23, 2
2017-05-23
Etching method and substrate processing apparatus
Grant 9,419,211 - Nishimura , et al. August 16, 2
2016-08-16
Pattern forming method
Grant 9,412,618 - Morikita , et al. August 9, 2
2016-08-09
Etching Method
App 20160203998 - TOBANA; Toshikatsu ;   et al.
2016-07-14
Pattern Forming Method
App 20160042970 - Morikita; Shinya ;   et al.
2016-02-11
Semiconductor device manufacturing method
Grant 9,245,764 - Nishimura , et al. January 26, 2
2016-01-26
Method and apparatus for forming a periodic pattern using a self-assembled block copolymer
Grant 9,234,083 - Nishimura , et al. January 12, 2
2016-01-12
Method of etching copper layer and mask
Grant 9,208,997 - Nishimura , et al. December 8, 2
2015-12-08
Plasma processing method and manufacturing method of semiconductor device
Grant 9,177,781 - Tahara , et al. November 3, 2
2015-11-03
Substrate processing method and storage medium
Grant 9,165,784 - Nishimura , et al. October 20, 2
2015-10-20
Method of etching metal layer
Grant 9,150,969 - Nishimura , et al. October 6, 2
2015-10-06
Etching Method And Substrate Processing Apparatus
App 20150214474 - NISHIMURA; Eiichi ;   et al.
2015-07-30
Substrate Processing Apparatus And Substrate Processing Method
App 20150132970 - Nishimura; Eiichi ;   et al.
2015-05-14
Semiconductor Device Manufacturing Method
App 20150079790 - Nishimura; Eiichi ;   et al.
2015-03-19
Plasma Processing Method And Plasma Processing Apparatus
App 20150050750 - Sone; Takashi ;   et al.
2015-02-19
Method And Apparatus For Forming A Periodic Pattern Using A Self-assembled Block Copolymer
App 20150048049 - Nishimura; Eiichi ;   et al.
2015-02-19
Etching Apparatus
App 20150013908 - NISHIMURA; Eiichi ;   et al.
2015-01-15
Etching method and etching apparatus
Grant 8,877,081 - Nishimura , et al. November 4, 2
2014-11-04
Method Of Etching Metal Layer
App 20140251945 - NISHIMURA; Eiichi ;   et al.
2014-09-11
Substrate processing method and storage medium
Grant 8,778,206 - Nishimura , et al. July 15, 2
2014-07-15
Etching Method And Substrate Processing Apparatus
App 20140120635 - Nishimura; Eiichi ;   et al.
2014-05-01
Method Of Etching Copper Layer And Mask
App 20140110373 - Nishimura; Eiichi ;   et al.
2014-04-24
Etching Method And Etching Apparatus
App 20130196511 - NISHIMURA; Eiichi ;   et al.
2013-08-01
Substrate processing method
Grant 8,383,521 - Nishimura , et al. February 26, 2
2013-02-26
Substrate Processing Method And Storage Medium
App 20120244718 - NISHIMURA; Eiichi ;   et al.
2012-09-27
Substrate Processing Method And Storage Medium
App 20120214315 - Nishimura; Eiichi ;   et al.
2012-08-23
Plasma Processing Method And Manufacturing Method Of Semiconductor Device
App 20120009786 - TAHARA; Shigeru ;   et al.
2012-01-12
Method And Apparatus For Recovering Pattern On Silicon Substrate
App 20110174337 - NISHIMURA; Eiichi ;   et al.
2011-07-21
Substrate Cleaning Method And Substrate Cleaning Apparatus
App 20110168205 - TAHARA; Shigeru ;   et al.
2011-07-14
Substrate Processing Method
App 20100233883 - Nishimura; Eiichi ;   et al.
2010-09-16

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