| Patent | Date |
|---|
Thermocouple-fixing jig
Grant 11,150,142 - Yamasaki , et al. October 19, 2 | 2021-10-19 |
Film forming apparatus and gas injection member used therefor
Grant 11,069,512 - Okabe , et al. July 20, 2 | 2021-07-20 |
Substrate mounting table
Grant 10,968,514 - Satoh , et al. April 6, 2 | 2021-04-06 |
Titanium silicide region forming method
Grant 10,903,086 - Yamasaki , et al. January 26, 2 | 2021-01-26 |
Substrate Processing Method and Film Forming System
App 20200258747 - A1 | 2020-08-13 |
Method of performing a surface treatment on a mounting table, the mounting table and a plasma processing apparatus
Grant 10,738,374 - Okabe , et al. A | 2020-08-11 |
Vacuum processing apparatus and operation method thereof
Grant 10,731,248 - Yamasaki , et al. | 2020-08-04 |
Method of removing silicon oxide film
Grant 10,546,753 - Yamasaki , et al. Ja | 2020-01-28 |
Purging method
Grant 10,519,542 - Yamasaki , et al. Dec | 2019-12-31 |
Method Of Forming Metal Film And Film Forming Apparatus
App 20190385843 - WAKABAYASHI; Satoshi ; et al. | 2019-12-19 |
Method of removing silicon oxide film
Grant 10504740 - | 2019-12-10 |
Film-forming Method And Film-forming Apparatus
App 20190371572 - WAKABAYASHI; Satoshi ; et al. | 2019-12-05 |
Thermocouple-fixing Jig
App 20190301947 - YAMASAKI; Hideaki ; et al. | 2019-10-03 |
Pre-coating Method And Film Forming Method
App 20190218662 - ITATANI; Takeshi ; et al. | 2019-07-18 |
Substrate Mounting Table
App 20190153597 - SATOH; Kohichi ; et al. | 2019-05-23 |
Method of Removing Silicon Oxide Film
App 20190027371 - YAMASAKI; Hideaki ; et al. | 2019-01-24 |
Titanium Silicide Region Forming Method
App 20180308709 - YAMASAKI; Hideaki ; et al. | 2018-10-25 |
Oxide Film Removing Method, Oxide Film Removing Apparatus, Contact Forming Method, And Contact Forming System
App 20180261464 - Kobayashi; Takashi ; et al. | 2018-09-13 |
Substrate Processing Apparatus, Substrate Processing Method, And Storage Medium
App 20180209033 - Yamasaki; Hideaki ; et al. | 2018-07-26 |
Purging Method
App 20180179627 - YAMASAKI; Hideaki ; et al. | 2018-06-28 |
Film Forming Apparatus And Gas Injection Member Used Therefor
App 20180047541 - OKABE; Shinya ; et al. | 2018-02-15 |
Method Of Performing A Surface Treatment On A Mounting Table, The Mounting Table And A Plasma Processing Apparatus
App 20170204505 - OKABE; Shinya ; et al. | 2017-07-20 |
Vacuum Processing Apparatus And Operation Method Thereof
App 20170204518 - YAMASAKI; Hideaki ; et al. | 2017-07-20 |
Substrate Processing Apparatus, Substrate Processing Method, And Storage Medium
App 20160240370 - YAMASAKI; Hideaki ; et al. | 2016-08-18 |
Method for depositing metal layers on germanium-containing films using metal chloride precursors
Grant 9,330,936 - Hasegawa , et al. May 3, 2 | 2016-05-03 |
Method for forming TiN and storage medium
Grant 9,257,278 - Yamasaki , et al. February 9, 2 | 2016-02-09 |
Substrate Processing Apparatus
App 20150322571 - YAMASAKI; Hideaki ; et al. | 2015-11-12 |
TiN film forming method and storage medium
Grant 9,133,548 - Yamasaki , et al. September 15, 2 | 2015-09-15 |
Method For Depositing Metal Layers On Germanium-containing Films Using Metal Chloride Precursors
App 20150132939 - Hasegawa; Toshio ; et al. | 2015-05-14 |
METHOD FOR FORMING TiN AND STORAGE MEDIUM
App 20150004803 - Yamasaki; Hideaki ; et al. | 2015-01-01 |
TiN FILM FORMING METHOD AND STORAGE MEDIUM
App 20140206189 - YAMASAKI; Hideaki ; et al. | 2014-07-24 |
Method of forming conformal metal silicide films
Grant 8,785,310 - Hasegawa , et al. July 22, 2 | 2014-07-22 |
Ruthenium Film Formation Method And Computer Readable Storage Medium
App 20130230652 - KAWANO; Yumiko ; et al. | 2013-09-05 |
Method Of Forming Conformal Metal Silicide Films
App 20130196505 - Hasegawa; Toshio ; et al. | 2013-08-01 |
Method of cleaning powdery source supply system, storage medium, substrate processing system and substrate processing method
Grant 8,389,053 - Moriya , et al. March 5, 2 | 2013-03-05 |
Raw material feeding device, film formation system and method for feeding gaseous raw material
Grant 8,029,621 - Yamasaki , et al. October 4, 2 | 2011-10-04 |
Method of film deposition
Grant 7,960,278 - Yamasaki , et al. June 14, 2 | 2011-06-14 |
CV method using metal carbonyl gas
Grant 7,879,399 - Hatano , et al. February 1, 2 | 2011-02-01 |
Method For Forming W-based Film, Method For Forming Gate Electrode, And Method For Manufacturing Semiconductor Device
App 20100227459 - Yamasaki; Hideaki | 2010-09-09 |
Method Of Cleaning Powdery Source Supply System, Storage Medium, Substrate Processing System And Substrate Processing Method
App 20100136230 - Moriya; Tsuyoshi ; et al. | 2010-06-03 |
Cvd Film Forming Apparatus
App 20100064972 - YAMASAKI; Hideaki ; et al. | 2010-03-18 |
Method of integrating metal-containing films into semiconductor devices
Grant 7,674,710 - Ashigaki , et al. March 9, 2 | 2010-03-09 |
Metal Film Decarbonizing Method, Film Forming Method And Semiconductor Device Manufacturing Method
App 20090291549 - Yamasaki; Hideaki ; et al. | 2009-11-26 |
Raw Material Feeding Device And Film Formation System
App 20090250006 - Yamasaki; Hideaki ; et al. | 2009-10-08 |
Method Of Forming Tasin Film
App 20090197410 - Nakamura; Kazuhito ; et al. | 2009-08-06 |
Method of Film Deposition and Film Deposition System
App 20090142491 - Nakamura; Kazuhito ; et al. | 2009-06-04 |
Method of Film Deposition and Film Deposition System
App 20090140353 - Yamasaki; Hideaki ; et al. | 2009-06-04 |
Method For Treating Substrate And Recording Medium
App 20090117270 - Yamasaki; Hideaki ; et al. | 2009-05-07 |
Ruthenium Film Formation Method And Computer Readable Storage Medium
App 20090035466 - KAWANO; Yumiko ; et al. | 2009-02-05 |
Thin film forming method and thin film forming device
Grant 7,482,283 - Yamasaki , et al. January 27, 2 | 2009-01-27 |
Cvd Method Using Metal Carbonyl Gas And Computer Storage Medium Storing Program For Controlling Same
App 20080311297 - Hatano; Tatsuo ; et al. | 2008-12-18 |
Method for cleaning substrate processing chamber
Grant 7,456,109 - Yamasaki , et al. November 25, 2 | 2008-11-25 |
CVD method for forming metal film by using metal carbonyl gas
Grant 7,427,426 - Hatano , et al. September 23, 2 | 2008-09-23 |
Method Of Integrating Metal-containing Films Into Semiconductor Devices
App 20080119033 - Ashigaki; Shigeo ; et al. | 2008-05-22 |
Transition metal thin film forming method
Grant 7,361,595 - Yamasaki , et al. April 22, 2 | 2008-04-22 |
Film formation method
Grant 7,344,754 - Yamasaki , et al. March 18, 2 | 2008-03-18 |
Method for forming a passivated metal layer
Grant 7,189,431 - Yamasaki , et al. March 13, 2 | 2007-03-13 |
Method of depositing metal layers from metal-carbonyl precursors
Grant 7,078,341 - Yamasaki , et al. July 18, 2 | 2006-07-18 |
Method of forming a tantalum-containing gate electrode structure
Grant 7,067,422 - Nakamura , et al. June 27, 2 | 2006-06-27 |
CVD process capable of reducing incubation time
Grant 7,063,871 - Yamasaki , et al. June 20, 2 | 2006-06-20 |
Method for cleaning substrate processing chamber
App 20060124151 - Yamasaki; Hideaki ; et al. | 2006-06-15 |
Method For Forming A Passivated Metal Layer
App 20060068097 - Yamasaki; Hideaki ; et al. | 2006-03-30 |
Low-pressure deposition of ruthenium and rhenium metal layers from metal carbonyl precursors
App 20060068588 - Yamasaki; Hideaki ; et al. | 2006-03-30 |
Deposition of ruthenium metal layers in a thermal chemical vapor deposition process
App 20060068098 - Yamasaki; Hideaki ; et al. | 2006-03-30 |
Low-pressure deposition of metal layers from metal-carbonyl precursors
Grant 6,989,321 - Yamasaki , et al. January 24, 2 | 2006-01-24 |
Processing system, evacuating system for processing system, low-pressure CVD system, and evacuating system and trapping device for low-pressure CVD system
Grant 6,966,936 - Yamasaki , et al. November 22, 2 | 2005-11-22 |
Film formation method
App 20050233079 - Yamasaki, Hideaki ; et al. | 2005-10-20 |
Method of forming a tantalum-containing gate electrode structure
App 20050227441 - Nakamura, Kazuhito ; et al. | 2005-10-13 |
Method of forming a metal layer using an intermittent precursor gas flow process
Grant 6,924,223 - Yamasaki , et al. August 2, 2 | 2005-08-02 |
Method of manufacturing a WN contact plug
Grant 6,919,268 - Yamasaki , et al. July 19, 2 | 2005-07-19 |
Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring
Grant 6,913,996 - Yamasaki , et al. July 5, 2 | 2005-07-05 |
Film forming apparatus
App 20050120955 - Yamasaki, Hideaki ; et al. | 2005-06-09 |
Method of depositing metal layers from metal-carbonyl precursors
App 20050079708 - Yamasaki, Hideaki ; et al. | 2005-04-14 |
Method of forming a metal layer using an intermittent precursor gas flow process
App 20050069632 - Yamasaki, Hideaki ; et al. | 2005-03-31 |
Low-pressure deposition of metal layers from metal-carbonyl precursors
App 20050070100 - Yamasaki, Hideaki ; et al. | 2005-03-31 |
Method for depositing metal layers using sequential flow deposition
App 20050069641 - Matsuda, Tsukasa ; et al. | 2005-03-31 |
Method of making a metal oxide capacitor, including a barrier film
Grant 6,846,711 - Yamasaki , et al. January 25, 2 | 2005-01-25 |
Thin film forming method and thin film forming apparatus
App 20040231585 - Yamasaki, Hideaki ; et al. | 2004-11-25 |
Film forming unit
Grant 6,797,068 - Yamasaki , et al. September 28, 2 | 2004-09-28 |
Processing method and processing apparatus
App 20040060513 - Kojima, Yasuhiko ; et al. | 2004-04-01 |
CVD process capable of reducing incubation time
App 20040025789 - Yamasaki, Hideaki ; et al. | 2004-02-12 |
Thin film forming method and thin film forming device
App 20040029379 - Yamasaki, Hideaki ; et al. | 2004-02-12 |
Film-formation apparatus and source supplying apparatus therefor, gas concentration measuring method
App 20040007180 - Yamasaki, Hideaki ; et al. | 2004-01-15 |
Production method of semiconductor device and production device therefor
Grant 6,548,398 - Yamasaki April 15, 2 | 2003-04-15 |
Apparatus and method for delivery of precursor vapor from low vapor pressure liquid sources to a CVD chamber
Grant 6,548,112 - Hillman , et al. April 15, 2 | 2003-04-15 |
Processing system, evacuating system for processing system, low-pressure CVD system, and evacuating system and trapping device for low-pressure CVD system
App 20030037730 - Yamasaki, Hideaki ; et al. | 2003-02-27 |
Semiconductor device and method of manufacturing the same
App 20030038314 - Yamasaki, Hideaki ; et al. | 2003-02-27 |
Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring
App 20030003729 - Yamasaki, Hideaki ; et al. | 2003-01-02 |
Method and apparatus for manufacturing semiconductor device
App 20020173078 - Kawano, Yumiko ; et al. | 2002-11-21 |
CVD apparatus and CVD method
Grant 6,436,203 - Kaizuka , et al. August 20, 2 | 2002-08-20 |
Semiconductor device fabricating method and system for carrying out the same
Grant 6,399,484 - Yamasaki , et al. June 4, 2 | 2002-06-04 |
Semiconductor device and method of manufacturing the same
App 20020027240 - Yamasaki, Hideaki ; et al. | 2002-03-07 |
Semiconductor device manufacturing method
App 20010034127 - Yamasaki, Hideaki ; et al. | 2001-10-25 |
Semiconductor device and manufacturing method therefor
App 20010020715 - Yamasaki, Hideaki ; et al. | 2001-09-13 |
CVD apparatus and CVD method
Grant 6,089,184 - Kaizuka , et al. July 18, 2 | 2000-07-18 |
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