loadpatents
name:-0.0064220428466797
name:-0.018858194351196
name:-0.0015170574188232
Yamaoka; Tsuguo Patent Filings

Yamaoka; Tsuguo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yamaoka; Tsuguo.The latest application filed is for "ink composition and method for producing printed object".

Company Profile
0.15.5
  • Yamaoka; Tsuguo - Tokyo JP
  • Yamaoka; Tsuguo - Funabashi JP
  • Yamaoka; Tsuguo - Funabashi-shi JP
  • Yamaoka; Tsuguo - Chiba JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Ink composition and method for producing printed object
Grant 10,221,325 - Okawa , et al.
2019-03-05
Ink Composition And Method For Producing Printed Object
App 20180148590 - OKAWA; Masakatsu ;   et al.
2018-05-31
Photopolymerizable composition
Grant 7,368,224 - Yamaoka , et al. May 6, 2
2008-05-06
Process for producing ether compound
Grant 7,358,030 - Shimizu , et al. April 15, 2
2008-04-15
Composition sensitive to visible light
Grant 7,294,448 - Yamaoka , et al. November 13, 2
2007-11-13
Process for producing ether compound
App 20060074262 - Shimizu; Ikuo ;   et al.
2006-04-06
Process for producing ether compound
Grant 7,015,363 - Shimizu , et al. March 21, 2
2006-03-21
Composition sensitive to visible light
App 20060003259 - Yamaoka; Tsuguo ;   et al.
2006-01-05
Photopolymerizable composition
App 20050164120 - Yamaoka, Tsuguo ;   et al.
2005-07-28
Process for producing ether compound
App 20040181097 - Shimizu, Ikuo ;   et al.
2004-09-16
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
Grant 6,114,462 - Watanabe , et al. September 5, 2
2000-09-05
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
Grant 5,942,367 - Watanabe , et al. August 24, 1
1999-08-24
Positive-working light-sensitive composition
Grant 5,939,235 - Kondo , et al. August 17, 1
1999-08-17
Chemically amplified positive resist composition
Grant 5,882,844 - Tsuchiya , et al. March 16, 1
1999-03-16
Photopolymerizable composition containing squarylium compound
Grant 5,681,685 - Yamaoka , et al. October 28, 1
1997-10-28
Novel copolymer and photosensitive material containing the same
Grant 4,529,783 - Tsunoda , et al. July 16, 1
1985-07-16
Photosensitive compositions
Grant 4,515,886 - Yamaoka , et al. May 7, 1
1985-05-07
Photo polymerization initiator compositions having high sensitivity
Grant 4,474,868 - Yamaoka , et al. October 2, 1
1984-10-02
Photosensitive material
Grant 4,424,325 - Tsunoda , et al. January 3, 1
1984-01-03
Fluoroalkyl acrylate copolymer and composition containing the same
Grant 4,365,049 - Tsunoda , et al. December 21, 1
1982-12-21

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