| Patent | Date |
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Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method
Grant 11,429,018 - Shimizu , et al. August 30, 2 | 2022-08-30 |
Organic processing liquid for patterning chemical amplification resist film, container for organic processing liquid for patterning chemical amplification resist film, and pattern forming method, method of manufacturing electronic device, and electronic de
Grant 10,705,428 - Yamanaka , et al. | 2020-07-07 |
Method Of Manufacturing Chemical Fluid For Manufacturing Electronic Material, Pattern Forming Method, Method Of Manufacturing Semiconductor Device, Chemical Fluid For Manufacturing Electronic Material, Container, And Quality Inspection Method
App 20190011827 - SHIMIZU; Tetsuya ; et al. | 2019-01-10 |
Pattern forming method, and, method for producing electronic device and electronic device, each using the same
Grant 10,126,651 - Sugiyama , et al. November 13, 2 | 2018-11-13 |
Method for manufacturing organic processing fluid for patterning of chemical amplification type resist film, organic processing fluid for patterning of chemical amplification type resist film, pattern forming method, method for manufacturing electronic device, and electronic device
Grant 10,088,752 - Yamanaka , et al. October 2, 2 | 2018-10-02 |
Pattern forming method, and, electronic device producing method and electronic device, each using the same
Grant 9,885,956 - Yamanaka , et al. February 6, 2 | 2018-02-06 |
Pattern formation method, etching method, electronic device manufacturing method, and electronic device
Grant 9,810,981 - Ueba , et al. November 7, 2 | 2017-11-07 |
Organic Treatment Liquid For Patterning Resist Film, Method Of Producing Organic Treatment Liquid For Patterning Resist Film, Storage Container Of Organic Treatment Liquid For Patterning Resist Film, Pattern Forming Method Using The Same, And Method Of Producing Electronic Device
App 20170184973 - YAMANAKA; Tsukasa | 2017-06-29 |
Pattern Formation Method, Etching Method, Electronic Device Manufacturing Method, And Electronic Device
App 20160342083 - UEBA; Ryosuke ; et al. | 2016-11-24 |
Pattern Peeling Method, Electronic Device And Method For Manufacturing The Same
App 20160077440 - YAMANAKA; Tsukasa ; et al. | 2016-03-17 |
Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20160054658 - YOSHIDOME; Masahiro ; et al. | 2016-02-25 |
Pattern Formation Method, Electronic-device Manufacturing Method, And Electronic Device
App 20160033870 - NAKAMURA; Takashi ; et al. | 2016-02-04 |
Method For Manufacturing Organic Processing Fluid For Patterning Of Chemical Amplification Type Resist Film, Organic Processing Fluid For Patterning Of Chemical Amplification Type Resist Film, Pattern Forming Method, Method For Manufacturing Electronic Device, And Electronic Device
App 20160026088 - YAMANAKA; Tsukasa ; et al. | 2016-01-28 |
Organic Processing Liquid For Patterning Chemical Amplification Resist Film, Container For Organic Processing Liquid For Patterning Chemical Amplification Resist Film, And Pattern Forming Method, Method Of Manufacturing Electronic Device, And Electronic Device Using The Same
App 20150227049 - YAMANAKA; Tsukasa ; et al. | 2015-08-13 |
Self-organizing Composition For Forming Pattern, Method For Forming Pattern By Self-organization Of Block Copolymer Using Same, And Pattern
App 20150197663 - MIZUTANI; Kazuyoshi ; et al. | 2015-07-16 |
Pattern Forming Method, And, Method For Producing Electronic Device And Electronic Device, Each Using The Same
App 20150160555 - SUGIYAMA; Shinichi ; et al. | 2015-06-11 |
Pattern Forming Method, And, Electronic Device Producing Method And Electronic Device, Each Using The Same
App 20150140482 - YAMANAKA; Tsukasa ; et al. | 2015-05-21 |
Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device
Grant 8,530,003 - Sato , et al. September 10, 2 | 2013-09-10 |
Method Of Forming Pattern
App 20130101812 - Kamimura; Sou ; et al. | 2013-04-25 |
Method and device for immersion treatment of vehicle
Grant 8,287,709 - Hagihara , et al. October 16, 2 | 2012-10-16 |
Polybenzoxazole Precursor, Photosensitive Resin Composition Using The Same, And Manufacturing Method Of Semiconductor Device
App 20120115333 - SATO; Kenichiro ; et al. | 2012-05-10 |
Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device
Grant 8,133,550 - Sato , et al. March 13, 2 | 2012-03-13 |
Method And Device For Immersion Treatment Of Vehicle
App 20100200416 - Hagihara; Yusuke ; et al. | 2010-08-12 |
Photosensitive composition and pattern forming method using the same
Grant 7,749,678 - Yamanaka July 6, 2 | 2010-07-06 |
Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device
Grant 7,615,331 - Yamanaka , et al. November 10, 2 | 2009-11-10 |
Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same
Grant 7,371,501 - Yamanaka , et al. May 13, 2 | 2008-05-13 |
Photosensitive resin composition and manufacturing method of semiconductor device using the same
Grant 7,368,216 - Sato , et al. May 6, 2 | 2008-05-06 |
Photosensitive Resin Composition, Production Method Of Cured Relief Pattern Using The Same And Semiconductor Device
App 20080081294 - YAMANAKA; Tsukasa ; et al. | 2008-04-03 |
Polybenzoxazole Precursor, Photosensitive Resin Composition Using The Same, And Manufacturing Method Of Semiconductor Device
App 20080076849 - SATO; Kenichiro ; et al. | 2008-03-27 |
Photosensitive resin composition and method for manufacturing semiconductor device using the same
Grant 7,348,122 - Sato , et al. March 25, 2 | 2008-03-25 |
Method For Manufacturing Photosensitive Resin Composition And Relief Pattern Using The Same
App 20070254243 - YAMANAKA; Tsukasa | 2007-11-01 |
Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same
App 20070212899 - Yamanaka; Tsukasa ; et al. | 2007-09-13 |
Positive resist composition and method of pattern formation using the same
Grant 7,252,924 - Yamanaka , et al. August 7, 2 | 2007-08-07 |
Photosensitive resin composition and manufacturing method of semiconductor device using the same
App 20070172753 - Sato; Kenichiro ; et al. | 2007-07-26 |
Photosensitive resin composition and manufacturing method of semiconductor device using the same
App 20070166643 - Sato; Kenichiro ; et al. | 2007-07-19 |
Positive-working resist composition
Grant 7,241,551 - Takahashi , et al. July 10, 2 | 2007-07-10 |
Photosensitive resin composition and method for manufacturing semiconductor device using the same
App 20070048656 - Sato; Kenichiro ; et al. | 2007-03-01 |
Photosensitive composition and pattern forming method using the same
App 20050233242 - Yamanaka, Tsukasa | 2005-10-20 |
Positive-working resist composition
App 20040248035 - Takahashi, Hyou ; et al. | 2004-12-09 |
Positive resist composition and method of pattern formation using the same
App 20040197707 - Yamanaka, Tsukasa ; et al. | 2004-10-07 |
Positive photosensitive composition
Grant 6,200,729 - Aoai , et al. March 13, 2 | 2001-03-13 |
Positive working photosensitive composition
Grant 6,013,411 - Aoai , et al. January 11, 2 | 2000-01-11 |
Positive working photosensitive composition
Grant 5,837,420 - Aoai , et al. November 17, 1 | 1998-11-17 |
Positive photosensitive composition
Grant 5,824,451 - Aoai , et al. October 20, 1 | 1998-10-20 |
Positive resin composition sensitive to ultraviolet rays
Grant 5,707,776 - Kawabe , et al. January 13, 1 | 1998-01-13 |
Positive-working photosensitive composition
Grant 5,683,856 - Aoai , et al. November 4, 1 | 1997-11-04 |
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