loadpatents
Patent applications and USPTO patent grants for YAMAMOTO; Tatsushi.The latest application filed is for "manufacturing system and manufacturing method of sintered product".
Patent | Date |
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Manufacturing System And Manufacturing Method Of Sintered Product App 20220176448 - NOGUCHI; Shin ;   et al. | 2022-06-09 |
Method For Producing Sintered Member, And Sintered Member App 20210129223 - UEMOTO; Keiichi ;   et al. | 2021-05-06 |
Workpiece transport apparatus Grant 7,128,516 - Sugiyama , et al. October 31, 2 | 2006-10-31 |
Plasma process device App 20060150914 - Yamamoto; Naoko ;   et al. | 2006-07-13 |
Plasma processing method Grant 6,893,970 - Kanetsuki , et al. May 17, 2 | 2005-05-17 |
Plasma processing apparatus Grant 6,866,747 - Tadera , et al. March 15, 2 | 2005-03-15 |
Plasma processing apparatus App 20040206456 - Tadera, Takamitsu ;   et al. | 2004-10-21 |
Workpiece transport apparatus App 20040197184 - Sugiyama, Akira ;   et al. | 2004-10-07 |
Plasma processing apparatus Grant 6,783,628 - Yamamoto , et al. August 31, 2 | 2004-08-31 |
Backing plate used for sputtering apparatus and sputtering method Grant 6,776,879 - Yamamoto , et al. August 17, 2 | 2004-08-17 |
Plasma processing apparatus Grant 6,753,496 - Tadera , et al. June 22, 2 | 2004-06-22 |
Plasma processing apparatus Grant 6,726,802 - Tadera , et al. April 27, 2 | 2004-04-27 |
Plasma processing apparatus and plasma processing method App 20040029339 - Yamamoto, Naoko ;   et al. | 2004-02-12 |
Plasma process apparatus Grant 6,638,392 - Yamamoto , et al. October 28, 2 | 2003-10-28 |
Plasma process apparatus Grant 6,620,290 - Yamamoto , et al. September 16, 2 | 2003-09-16 |
Plasma process apparatus Grant 6,527,908 - Kanetsuki , et al. March 4, 2 | 2003-03-04 |
Plasma processing apparatus App 20030024647 - Tadera, Takamitsu ;   et al. | 2003-02-06 |
Plasma process device Grant 6,446,573 - Hirayama , et al. September 10, 2 | 2002-09-10 |
Plasma processing apparatus App 20020123200 - Yamamoto, Naoko ;   et al. | 2002-09-05 |
Backing plate used for sputtering apparatus and sputtering method App 20020100680 - Yamamoto, Tatsushi ;   et al. | 2002-08-01 |
Plasma processing method App 20020084255 - Kanetsuki, Norio ;   et al. | 2002-07-04 |
Plasma processing apparatus App 20020079294 - Tadera, Takamitsu ;   et al. | 2002-06-27 |
Plasma process apparatus App 20020043341 - Kanetsuki, Norio ;   et al. | 2002-04-18 |
Plasma process device App 20010052322 - Hirayama, Masaki ;   et al. | 2001-12-20 |
Plasma process apparatus App 20010050058 - Yamamoto, Tatsushi ;   et al. | 2001-12-13 |
Plasma process device Grant 6,286,454 - Hirayama , et al. September 11, 2 | 2001-09-11 |
Plasma process apparatus App 20010010207 - Yamamoto, Naoko ;   et al. | 2001-08-02 |
Positionally adjustable member and applications therefor Grant 5,728,240 - Yamamoto , et al. March 17, 1 | 1998-03-17 |
Magnetic recording/reproducing apparatus Grant 5,491,594 - Yamamoto , et al. February 13, 1 | 1996-02-13 |
Magneto-optical recording and reproducing device having integrally formed recording and reproducing magnetic heads Grant 5,202,862 - Ohta , et al. April 13, 1 | 1993-04-13 |
Method of manufacturing a magnetic head Grant 5,020,212 - Michijima , et al. June 4, 1 | 1991-06-04 |
Magnetic head core Grant 4,735,865 - Nago , et al. April 5, 1 | 1988-04-05 |
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