Yamagishi; Takanori

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yamagishi; Takanori.The latest application filed is for "copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography".

Company Profile

0.21.20

Yamagishi; Takanori - Chiba N/A JP
Yamagishi; Takanori - Funabashi N/A JP
Yamagishi; Takanori - Ichihara JP
YAMAGISHI; Takanori - Funabashi-shi JP
Yamagishi; Takanori - Ichihara-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Copolymer and composition for semiconductor lithography and process for producing the copolymer Grant 8,859,180 - Oikawa , et al. October 14, 2	2014-10-14
Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography Grant 8,709,698 - Iijima , et al. April 29, 2	2014-04-29
Method for producing a copolymer solution with a uniform concentration for semiconductor lithography Grant 8,377,625 - Yamagishi , et al. February 19, 2	2013-02-19
Copolymer for immersion lithography and compositions Grant 8,211,615 - Yamagishi , et al. July 3, 2	2012-07-03
Resist polymer and method for producing the polymer Grant 8,163,852 - Yamagishi , et al. April 24, 2	2012-04-24
Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography App 20120071638 - Iijima; Minoru ; et al.	2012-03-22
Resist polymer solution and process for producing the same Grant 8,119,321 - Yamagishi , et al. February 21, 2	2012-02-21
Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography Grant 8,067,516 - Iijima , et al. November 29, 2	2011-11-29
Process for producing polymer for semiconductor lithography Grant 8,030,419 - Yamagishi , et al. October 4, 2	2011-10-04
Positive resist composition and method of forming resist pattern Grant 7,972,762 - Muroi , et al. July 5, 2	2011-07-05
Copolymer for semiconductor lithography and process for producing the same Grant 7,960,494 - Yamagishi , et al. June 14, 2	2011-06-14
Copolymer for semiconductor lithography and producing method thereof, and composition Grant 7,910,282 - Yamagishi , et al. March 22, 2	2011-03-22
Copolymer For Semiconductor Lithography And Producing Method Thereof, And Composition App 20100324245 - YAMAGISHI; Takanori ; et al.	2010-12-23
Production process of copolymer for semiconductor lithography Grant 7,838,606 - Yamagishi , et al. November 23, 2	2010-11-23
Method For Producing A Copolymer Solution With A Uniform Concentration For Semiconductor Lithography App 20100143842 - YAMAGISHI; Takanori ; et al.	2010-06-10
Copolymer for semiconductor lithography and process for production thereof Grant 7,695,889 - Yamagishi , et al. April 13, 2	2010-04-13
Copolymer For Immersion Lithography And Compositions App 20100047710 - Yamagishi; Takanori ; et al.	2010-02-25
Process For Producing Polymer For Semiconductor Lithography App 20100048848 - Yamagishi; Takanori ; et al.	2010-02-25
Copolymer For Semiconductor Lithography And Process For Producing The Same App 20090306328 - Yamagishi; Takanori ; et al.	2009-12-10
Positive Resist Composition And Method Of Forming Resist Pattern App 20090233220 - Muroi; Masaaki ; et al.	2009-09-17
Resist polymer and method for producing the polymer App 20090123868 - Yamagishi; Takanori ; et al.	2009-05-14
Thiol compound, copolymer and method for producing the copolymer Grant 7,411,097 - Yamagishi , et al. August 12, 2	2008-08-12
Copolymer For Semiconductor Lithography And Producing Method Thereof, And Composition App 20080114139 - Yamagishi; Takanori ; et al.	2008-05-15
Method for prevention of increase in particles in copolymer for semiconductor resist Grant 7,342,087 - Yamagishi , et al. March 11, 2	2008-03-11
Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography App 20070269741 - Iijima; Minoru ; et al.	2007-11-22
Novel thiol compound, copolymer and method for producing the copolymer App 20070161764 - Yamagishi; Takanori ; et al.	2007-07-12
Thiol compound, copolymer and method for producing the copolymer Grant 7,220,808 - Yamagishi , et al. May 22, 2	2007-05-22
Resist polymer solution and process for producing the same App 20070111137 - Yamagishi; Takanori ; et al.	2007-05-17
Copolymer for semiconductor lithography, composition and thiol compound App 20060287469 - Iijima; Minoru ; et al.	2006-12-21
Copolymer for semiconductor lithography and process for production thereof App 20060257784 - Yamagishi; Takanori ; et al.	2006-11-16
Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process Grant 7,045,582 - Yamagishi , et al. May 16, 2	2006-05-16
Method for prevention of increase in particles in copolymer for semiconductor resist App 20060058433 - Yamagishi; Takanori ; et al.	2006-03-16
Resist polymer and method for producing the polymer App 20050287474 - Yamagishi, Takanori ; et al.	2005-12-29
Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this process App 20050131184 - Yamagishi, Takanori ; et al.	2005-06-16
Production process of copolymer for semiconductor lithography App 20050096447 - Yamagishi, Takanori ; et al.	2005-05-05
Novel thiol compound, copolymer and method for producing the copolymer App 20040181023 - Yamagishi, Takanori ; et al.	2004-09-16
Resist polymer and method for producing the polymer App 20040167298 - Yamagishi, Takanori ; et al.	2004-08-26
Process for the preparation of p-ethylphenol Grant 4,927,979 - Yamagishi , et al. May 22, 1	1990-05-22

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