Yamage; Masashi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yamage; Masashi.The latest application filed is for "high frequency antenna and plasma processing device".

Company Profile

0.5.9

Yamage; Masashi - Yokohama JP
Yamage; Masashi - Kanagawa-ken JP
Yamage; Masashi - Yokohama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
High frequency antenna and plasma processing device Grant 10,971,334 - Sugimoto , et al. April 6, 2	2021-04-06
High Frequency Antenna And Plasma Processing Device App 20210057184 - SUGIMOTO; Yuta ; et al.	2021-02-25
Shower head, processing apparatus, and shower plate Grant 10,837,113 - Tsuno , et al. November 17, 2	2020-11-17
Shower Head, Processing Apparatus, And Shower Plate App 20190085458 - TSUNO; Satoshi ; et al.	2019-03-21
Transparent Conductive Material, Dispersion Liquid, Transparent Conductive Film, And Methods For Manufacturing Same App 20130147089 - MURAYAMA; Hirotoshi ; et al.	2013-06-13
Plasma generating apparatus and plasma treatment apparatus Grant 8,133,348 - Ganachev , et al. March 13, 2	2012-03-13
Method Of Treating Catalyst For Nanocarbon Production And Method Of Manufacturing Nanocarbon App 20110223333 - Yamage; Masashi ; et al.	2011-09-15
Supported Catalyst, Method For Manufacturing Supported Catalyst, Fuel Cell, And Method For Manufacturing Fuel Cell App 20090081510 - Hayamizu; Naoya ; et al.	2009-03-26
Plasma Generating Apparatus And Plasma Treatment Apparatus App 20090045749 - Ganachev; Ivan Petrov ; et al.	2009-02-19
Electron emitting element, manufacturing method for electron emitting element, and display device having electron emitting element App 20080030122 - Yamage; Masashi	2008-02-07
Electron Emission Element, Method Of Manufacturing Electron Emission Element, And Display Device With Electron Emission Element App 20080012462 - Yamage; Masashi	2008-01-17
Plasma process end point determination method and apparatus, and plasma evaluation method and apparatus Grant 6,184,687 - Yamage , et al. February 6, 2	2001-02-06
Plasma processing apparatus and a plasma processing method Grant 6,059,922 - Yamazaki , et al. May 9, 2	2000-05-09

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