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Patent applications and USPTO patent grants for Yamadaya; Tokunori.The latest application filed is for "negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of pr".
Patent | Date |
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Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured film Grant 11,415,888 - Nakamura , et al. August 16, 2 | 2022-08-16 |
Permanent adhesive composition for image sensors, and bonding method and laminate using same Grant 10,611,934 - Yamadaya , et al. | 2020-04-07 |
Negative Type Photosensitive Resin Composition, Photosensitive Resist Film, Pattern Forming Method, Cured Film, And Method Of Pr App 20190235380 - NAKAMURA; Ryosuke ;   et al. | 2019-08-01 |
Permanent Adhesive Composition For Image Sensors, And Bonding Method And Laminate Using Same App 20190002744 - YAMADAYA; Tokunori ;   et al. | 2019-01-03 |
Application Liquid And Method For Formation Of A Silica-based Coating Film Using The Application Liquid App 20100247799 - YAMADAYA; Tokunori ;   et al. | 2010-09-30 |
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