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name:-0.016669034957886
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Yamada; Tomotaka Patent Filings

Yamada; Tomotaka

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yamada; Tomotaka.The latest application filed is for "resist composition and method for forming resist pattern".

Company Profile
1.16.22
  • Yamada; Tomotaka - Kawasaki JP
  • YAMADA; Tomotaka - Kawasaki-shi JP
  • Yamada; Tomotaka - Kanagawa N/A JP
  • Yamada; Tomotaka - Atsugi JP
  • Yamada, Tomotaka - Atsugi-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Resist composition and method for forming resist pattern
Grant 10,261,416 - Yamada , et al.
2019-04-16
Resist Composition And Method For Forming Resist Pattern
App 20180067394 - YAMADA; Tomotaka ;   et al.
2018-03-08
Resist composition, method of forming resist pattern, and polymeric compound
Grant 9,170,487 - Suzuki , et al. October 27, 2
2015-10-27
Method of forming resist pattern by nanoimprint lithography
Grant 8,828,304 - Sato , et al. September 9, 2
2014-09-09
Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20130260312 - Suzuki; Yusuke ;   et al.
2013-10-03
Photosensitive resin composition and method of forming pattern
Grant 8,216,763 - Sato , et al. July 10, 2
2012-07-10
Resist composition
Grant 8,198,004 - Hirayama , et al. June 12, 2
2012-06-12
Photosensitive Resin Composition And Method Of Forming Pattern
App 20090220889 - Sato; Kazufumi ;   et al.
2009-09-03
Method Of Forming Resist Pattern By Nanoimprint Lithography
App 20090189317 - Sato; Kazufumi ;   et al.
2009-07-30
Resist composition
Grant 7,541,138 - Hirayama , et al. June 2, 2
2009-06-02
Resist Composition
App 20090130605 - Hirayama; Taku ;   et al.
2009-05-21
Resist composition
Grant 7,527,909 - Hirayama , et al. May 5, 2
2009-05-05
Silsesquioxane Resin, Positive Resist Composition, Resist Laminate, And Method Of Forming Resist Pattern
App 20090068586 - Nakamura; Tsuyoshi ;   et al.
2009-03-12
Resist composition
Grant 7,501,220 - Hirayama , et al. March 10, 2
2009-03-10
Positive resist composition
Grant 7,416,832 - Kawana , et al. August 26, 2
2008-08-26
Lift-off positive resist composition
Grant 7,318,992 - Kawana , et al. January 15, 2
2008-01-15
Composition for forming antireflection coating
App 20070281098 - Hirayama; Taku ;   et al.
2007-12-06
Positive resist composition
Grant 7,261,994 - Hosono , et al. August 28, 2
2007-08-28
Resist Composition
App 20070190436 - Hirayama; Taku ;   et al.
2007-08-16
Resist Composition
App 20070178394 - Hirayama; Taku ;   et al.
2007-08-02
Positive resist composition, resist laminates and process for forming resist patterns
App 20070009828 - Tamura; Koki ;   et al.
2007-01-11
Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist pattern
App 20060222866 - Nakamura; Tsuyoshi ;   et al.
2006-10-05
Composition for forming antireflection coating
App 20060021964 - Hirayama; Taku ;   et al.
2006-02-02
Chemical amplification type silicone based positive photoresist composition
App 20060003252 - Hirayama; Taku ;   et al.
2006-01-05
Composition for forming antireflection coating
App 20050282090 - Hirayama, Kawasaki-shi ;   et al.
2005-12-22
Lift-off positive resist composition
App 20050227171 - Kawana, Daisuke ;   et al.
2005-10-13
Positive resist composition
App 20050227170 - Hosono, Takayuki ;   et al.
2005-10-13
Positive resist composition
App 20050221225 - Kawana, Daisuke ;   et al.
2005-10-06
Resist composition
App 20050014090 - Hirayama, Taku ;   et al.
2005-01-20
Method for the preparation of a semiconductor device
Grant 6,818,380 - Maemori , et al. November 16, 2
2004-11-16
Method for the preparation of a semiconductor device
Grant 6,777,158 - Maemori , et al. August 17, 2
2004-08-17
Method for the preparation of a semiconductor device
App 20040067615 - Maemori, Satoshi ;   et al.
2004-04-08
Crosslinked positive-working photoresist composition
Grant 6,630,282 - Oomori , et al. October 7, 2
2003-10-07
Method for the preparation of a semiconductor device
App 20020045133 - Maemori, Satoshi ;   et al.
2002-04-18
Crosslinked positive-working photoresist composition
App 20020034704 - Oomori, Katsumi ;   et al.
2002-03-21
Positive-working photoresist composition
App 20020031722 - Oomori, Katsumi ;   et al.
2002-03-14
Positive-working photoresist composition
Grant 6,340,553 - Oomori , et al. January 22, 2
2002-01-22

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