loadpatents
Patent applications and USPTO patent grants for Yamada; Tomotaka.The latest application filed is for "resist composition and method for forming resist pattern".
Patent | Date |
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Resist composition and method for forming resist pattern Grant 10,261,416 - Yamada , et al. | 2019-04-16 |
Resist Composition And Method For Forming Resist Pattern App 20180067394 - YAMADA; Tomotaka ;   et al. | 2018-03-08 |
Resist composition, method of forming resist pattern, and polymeric compound Grant 9,170,487 - Suzuki , et al. October 27, 2 | 2015-10-27 |
Method of forming resist pattern by nanoimprint lithography Grant 8,828,304 - Sato , et al. September 9, 2 | 2014-09-09 |
Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound App 20130260312 - Suzuki; Yusuke ;   et al. | 2013-10-03 |
Photosensitive resin composition and method of forming pattern Grant 8,216,763 - Sato , et al. July 10, 2 | 2012-07-10 |
Resist composition Grant 8,198,004 - Hirayama , et al. June 12, 2 | 2012-06-12 |
Photosensitive Resin Composition And Method Of Forming Pattern App 20090220889 - Sato; Kazufumi ;   et al. | 2009-09-03 |
Method Of Forming Resist Pattern By Nanoimprint Lithography App 20090189317 - Sato; Kazufumi ;   et al. | 2009-07-30 |
Resist composition Grant 7,541,138 - Hirayama , et al. June 2, 2 | 2009-06-02 |
Resist Composition App 20090130605 - Hirayama; Taku ;   et al. | 2009-05-21 |
Resist composition Grant 7,527,909 - Hirayama , et al. May 5, 2 | 2009-05-05 |
Silsesquioxane Resin, Positive Resist Composition, Resist Laminate, And Method Of Forming Resist Pattern App 20090068586 - Nakamura; Tsuyoshi ;   et al. | 2009-03-12 |
Resist composition Grant 7,501,220 - Hirayama , et al. March 10, 2 | 2009-03-10 |
Positive resist composition Grant 7,416,832 - Kawana , et al. August 26, 2 | 2008-08-26 |
Lift-off positive resist composition Grant 7,318,992 - Kawana , et al. January 15, 2 | 2008-01-15 |
Composition for forming antireflection coating App 20070281098 - Hirayama; Taku ;   et al. | 2007-12-06 |
Positive resist composition Grant 7,261,994 - Hosono , et al. August 28, 2 | 2007-08-28 |
Resist Composition App 20070190436 - Hirayama; Taku ;   et al. | 2007-08-16 |
Resist Composition App 20070178394 - Hirayama; Taku ;   et al. | 2007-08-02 |
Positive resist composition, resist laminates and process for forming resist patterns App 20070009828 - Tamura; Koki ;   et al. | 2007-01-11 |
Silsesquioxane resin, positive resist composition,layered product including resist and method of forming resist pattern App 20060222866 - Nakamura; Tsuyoshi ;   et al. | 2006-10-05 |
Composition for forming antireflection coating App 20060021964 - Hirayama; Taku ;   et al. | 2006-02-02 |
Chemical amplification type silicone based positive photoresist composition App 20060003252 - Hirayama; Taku ;   et al. | 2006-01-05 |
Composition for forming antireflection coating App 20050282090 - Hirayama, Kawasaki-shi ;   et al. | 2005-12-22 |
Lift-off positive resist composition App 20050227171 - Kawana, Daisuke ;   et al. | 2005-10-13 |
Positive resist composition App 20050227170 - Hosono, Takayuki ;   et al. | 2005-10-13 |
Positive resist composition App 20050221225 - Kawana, Daisuke ;   et al. | 2005-10-06 |
Resist composition App 20050014090 - Hirayama, Taku ;   et al. | 2005-01-20 |
Method for the preparation of a semiconductor device Grant 6,818,380 - Maemori , et al. November 16, 2 | 2004-11-16 |
Method for the preparation of a semiconductor device Grant 6,777,158 - Maemori , et al. August 17, 2 | 2004-08-17 |
Method for the preparation of a semiconductor device App 20040067615 - Maemori, Satoshi ;   et al. | 2004-04-08 |
Crosslinked positive-working photoresist composition Grant 6,630,282 - Oomori , et al. October 7, 2 | 2003-10-07 |
Method for the preparation of a semiconductor device App 20020045133 - Maemori, Satoshi ;   et al. | 2002-04-18 |
Crosslinked positive-working photoresist composition App 20020034704 - Oomori, Katsumi ;   et al. | 2002-03-21 |
Positive-working photoresist composition App 20020031722 - Oomori, Katsumi ;   et al. | 2002-03-14 |
Positive-working photoresist composition Grant 6,340,553 - Oomori , et al. January 22, 2 | 2002-01-22 |
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