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Patent applications and USPTO patent grants for Yamada; Taisuke.The latest application filed is for "photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device".
Patent | Date |
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Electric device system Grant 9,699,930 - Miura , et al. July 4, 2 | 2017-07-04 |
Photosensitive Resin Composition, Method For Producing Hardened Relief Pattern, Semiconductor Device And Display Device App 20170102613 - SHIBUI; Satoshi ;   et al. | 2017-04-13 |
Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device Grant 9,575,410 - Shibui , et al. February 21, 2 | 2017-02-21 |
Reversible room-temperature ionic liquids Grant 9,433,895 - Yu , et al. September 6, 2 | 2016-09-06 |
Electric Device System App 20160205801 - MIURA; Kazuyoshi ;   et al. | 2016-07-14 |
Photosensitive Resin Composition, Method For Producing Hardened Relief Pattern, Semiconductor Device And Display Device App 20140349222 - Shibui; Satoshi ;   et al. | 2014-11-27 |
Reversible Room-Temperature Ionic Liquids App 20140120013 - Yu; Tao ;   et al. | 2014-05-01 |
Reversible room-temperature ionic liquids Grant 8,574,453 - Yu , et al. November 5, 2 | 2013-11-05 |
Accumulator Grant 8,371,336 - Nakaoka , et al. February 12, 2 | 2013-02-12 |
Accumulator App 20120006438 - Nakaoka; Shinya ;   et al. | 2012-01-12 |
Reversible Room-Temperature Ionic Liquids App 20110076214 - Yu; Tao ;   et al. | 2011-03-31 |
Accumulator Grant 7,810,522 - Nakaoka , et al. October 12, 2 | 2010-10-12 |
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