Yahiro; Takehisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yahiro; Takehisa.The latest application filed is for "charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method".

Company Profile

0.7.8

Yahiro; Takehisa - Ageo JP
YAHIRO; Takehisa - Ageo-shi JP
Yahiro; Takehisa -
Yahiro; Takehisa - Kamagaya JP
Yahiro; Takehisa - Tokyo JP
Yahiro, Takehisa - Agea-shi JP
Yahiro, Takehisa - Kamagaya-shi JP
Yahiro; Takehisa - Kawasaki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method Grant 11,276,546 - Yahiro March 15, 2	2022-03-15
Charged Particle Beam Optical System, Exposure Apparatus, Exposure Method And Device Manufacturing Method App 20200051774 - YAHIRO; Takehisa	2020-02-13
Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus Grant 7,019,313 - Yahiro , et al. March 28, 2	2006-03-28
Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus App 20050127307 - Yahiro, Takehisa	2005-06-16
Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system Grant 6,861,187 - Yahiro March 1, 2	2005-03-01
Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus Grant 6,831,282 - Yahiro December 14, 2	2004-12-14
Devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system Grant 6,635,402 - Yahiro October 21, 2	2003-10-21
Methods and devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system App 20030096179 - Yahiro, Takehisa	2003-05-22
Methods and devices for evaluating imaging characteristics of a charged-particle-beam microlithography system App 20030085365 - Yahiro, Takehisa	2003-05-08
Methods and devices for evaluating beam blur in subfields projection-exposed by a charged-particle-beam microlithography apparatus App 20030075690 - Yahiro, Takehisa	2003-04-24
Methods for determining focus and astigmatism in charged-particle-beam microlithography App 20030043358 - Suganuma, Wakako ; et al.	2003-03-06
Methods and devices for evaluating beam blur in a charged-particle-beam microlithography apparatus App 20020113214 - Yahiro, Takehisa	2002-08-22
Methods and devices for measuring and adjusting illumination uniformity obtained from a charged-particle illumination-optical system App 20010016294 - Yahiro, Takehisa	2001-08-23
Charged-particle-beam microlithographic methods for correction of reticle distortions Grant 6,277,532 - Yahiro August 21, 2	2001-08-21
Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction Grant 6,204,509 - Yahiro , et al. March 20, 2	2001-03-20

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