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Crystal, Method Of Producing Crystal, And Method Of Self-organizing Silanol Compound
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Silanol Compound And Method For Producing Silanol Compound
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Silanol Compound And Method For Producing Silanol Compound
App 20210061824 - IGARASHI; Masayasu ; et al. | 2021-03-04 |
Composition for forming resist underlayer film and patterning process using the same
Grant 8,951,917 - Ogihara , et al. February 10, 2 | 2015-02-10 |
Silicon-containing resist underlayer film-forming composition and patterning process
Grant 8,715,913 - Ogihara , et al. May 6, 2 | 2014-05-06 |
Silicon-containing Resist Underlayer Film-forming Composition And Patterning Process
App 20130137041 - OGIHARA; Tsutomu ; et al. | 2013-05-30 |
Composition For Forming Resist Underlayer Film And Patterning Process Using The Same
App 20130005150 - OGIHARA; Tsutomu ; et al. | 2013-01-03 |
High-temperature bonding composition, substrate bonding method, and 3-D semiconductor device
Grant 8,277,600 - Hamada , et al. October 2, 2 | 2012-10-02 |
Substrate joining method and 3-D semiconductor device
Grant 8,257,528 - Yagihashi , et al. September 4, 2 | 2012-09-04 |
Conductive Pattern-forming Composition And Method
App 20120207917 - Hamada; Yoshitaka ; et al. | 2012-08-16 |
Film-forming Composition, Insulating Film With Low Dielectric Constant, Formation Method Thereof, And Semiconductor Device
App 20100283133 - Hamada; Yoshitaka ; et al. | 2010-11-11 |
Organic silicon oxide fine particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device
App 20100233482 - Hamada; Yoshitaka ; et al. | 2010-09-16 |
Method for forming insulating film with low dielectric constant
Grant 7,786,022 - Hamada , et al. August 31, 2 | 2010-08-31 |
Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device
Grant 7,754,330 - Hamada , et al. July 13, 2 | 2010-07-13 |
High-temperature Bonding Composition, Substrate Bonding Method, And 3-d Semiconductor Device
App 20100040895 - Hamada; Yoshitaka ; et al. | 2010-02-18 |
Substrate Joining Method And 3-d Semiconductor Device
App 20100040893 - Yagihashi; Fujio ; et al. | 2010-02-18 |
Positive resist material and pattern formation method using the same
Grant 7,651,829 - Hamada , et al. January 26, 2 | 2010-01-26 |
Organic Silicon Oxide Fine Particle And Preparation Method Thereof, Porous Film-forming Composition, Porous Film And Formation Method Thereof, And Semiconductor Device
App 20090294922 - Hamada; Yoshitaka ; et al. | 2009-12-03 |
Organic Silicon Oxide Fine Particles And Preparation Method Thereof, Porous Film-forming Composition, Porous Film And Formation Method Thereof, And Semiconductor Device
App 20090294726 - Hamada; Yoshitaka ; et al. | 2009-12-03 |
Siloxane Polymer, Preparation Method Thereof, Porous-film Forming Coating Solution Containing The Polymer, Porous Film, And Semiconductor Device Using The Porous Film
App 20080292863 - Yagihashi; Fujio ; et al. | 2008-11-27 |
Film-forming Composition, Insulating Film With Low Dielectric Constant, Formation Method Thereof, And Semiconductor Device
App 20080290521 - Hamada; Yoshitaka ; et al. | 2008-11-27 |
Semiconductor Interlayer-insulating Film Forming Composition, Preparation Method Thereof, Film Forming Method, And Semiconductor Device
App 20080290472 - Yagihashi; Fujio ; et al. | 2008-11-27 |
Semiconductor device comprising porous film
Grant 7,405,459 - Ogihara , et al. July 29, 2 | 2008-07-29 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
Grant 7,402,621 - Ogihara , et al. July 22, 2 | 2008-07-22 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20080118737 - Ogihara; Tsutomu ; et al. | 2008-05-22 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,357,961 - Iwabuchi , et al. April 15, 2 | 2008-04-15 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,341,775 - Hamada , et al. March 11, 2 | 2008-03-11 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
Grant 7,332,446 - Ogihara , et al. February 19, 2 | 2008-02-19 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,309,722 - Ogihara , et al. December 18, 2 | 2007-12-18 |
Antireflective film material, and antireflective film and pattern formation method using the same
Grant 7,303,785 - Ogihara , et al. December 4, 2 | 2007-12-04 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20070178319 - Hamada; Yoshitaka ; et al. | 2007-08-02 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,244,657 - Ogihara , et al. July 17, 2 | 2007-07-17 |
Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst
Grant 7,239,018 - Hamada , et al. July 3, 2 | 2007-07-03 |
Composition For Forming Porous Film, Porous Film And Method For Forming The Same, Interlevel Insulator Film, And Semiconductor Device
App 20070135565 - Ogihara; Tsutomu ; et al. | 2007-06-14 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20070108593 - Ogihara; Tsutomu ; et al. | 2007-05-17 |
Composition For Forming Porous Film, Porous Film And Method For Forming The Same, Interlevel Insulator Film, And Semiconductor Device
App 20070087124 - Iwabuchi; Motoaki ; et al. | 2007-04-19 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,205,338 - Ogihara , et al. April 17, 2 | 2007-04-17 |
Antireflective film material, and antireflective film and pattern formation method using the same
Grant 7,202,013 - Ogihara , et al. April 10, 2 | 2007-04-10 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20060289849 - Yagihashi; Fujio ; et al. | 2006-12-28 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,132,473 - Ogihara , et al. November 7, 2 | 2006-11-07 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
Grant 7,126,208 - Iwabuchi , et al. October 24, 2 | 2006-10-24 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film
Grant 7,119,354 - Yagihashi , et al. October 10, 2 | 2006-10-10 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
App 20060220253 - Hamada; Yoshitaka ; et al. | 2006-10-05 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
Grant 7,084,505 - Hamada , et al. August 1, 2 | 2006-08-01 |
Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device
App 20050165197 - Ogihara, Tsutomu ; et al. | 2005-07-28 |
Onium salts and positive resist materials using the same
Grant 6,841,334 - Yagihashi , et al. January 11, 2 | 2005-01-11 |
Antireflective film material, and antireflective film and pattern formation method using the same
App 20040253461 - Ogihara, Tsutomu ; et al. | 2004-12-16 |
Antireflective film material, and antireflective film and pattern formation method using the same
App 20040247900 - Ogihara, Tsutomu ; et al. | 2004-12-09 |
Positive resist material and pattern formation method using the same
App 20040241579 - Hamada, Yoshitaka ; et al. | 2004-12-02 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040235971 - Hamada, Yoshitaka ; et al. | 2004-11-25 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040232553 - Iwabuchi, Motoaki ; et al. | 2004-11-25 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040219372 - Ogihara, Tsutomu ; et al. | 2004-11-04 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040216641 - Hamada, Yoshitaka ; et al. | 2004-11-04 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040201014 - Yagihashi, Fujio ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040202874 - Iwabuchi, Motoaki ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040201007 - Yagihashi, Fujio ; et al. | 2004-10-14 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device
App 20040188809 - Ogihara, Tsutomu ; et al. | 2004-09-30 |
Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device
App 20040188846 - Hamada, Yoshitaka ; et al. | 2004-09-30 |
Composition for forming porous film and method for forming the same, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040180554 - Hamada, Yoshitaka ; et al. | 2004-09-16 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040180222 - Ogihara, Tsutomu ; et al. | 2004-09-16 |
Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040105986 - Ogihara, Tsutomu ; et al. | 2004-06-03 |
Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
App 20040091419 - Ogihara, Tsutomu ; et al. | 2004-05-13 |
Onium salts and positive resist materials using the same
App 20040076905 - Yagihashi, Fujio ; et al. | 2004-04-22 |
Film forming composition, porous film and their preparation
Grant 6,680,107 - Yagihashi , et al. January 20, 2 | 2004-01-20 |
Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same
Grant 6,667,415 - Yagihashi , et al. December 23, 2 | 2003-12-23 |
Onium Salts And Positive Resist Materials Using The Same
App 20030096189 - YAGIHASHI, FUJIO ; et al. | 2003-05-22 |
Film forming composition, porous film and their preparation
App 20020132908 - Yagihashi, Fujio ; et al. | 2002-09-19 |
Coating solution and method for forming dielectric film
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Binder composition and aqueous coating composition
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Tristertbutoxyphenyl sulfonium tosylate compound
Grant 5,633,409 - Watanabe , et al. May 27, 1 | 1997-05-27 |
Chemically amplified positive resist composition
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Cephalosporin derivatives
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