Yabe; Sachiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yabe; Sachiko.The latest application filed is for "fabrication method for device structure having transparent dielectric substrate".

Company Profile

0.6.7

Yabe; Sachiko - Tokyo JP
Yabe; Sachiko - Ibaraki JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fabrication method for device structure having transparent dielectric substrate Grant 8,076,220 - Nakamura , et al. December 13, 2	2011-12-13
Fabrication Method For Device Structure Having Transparent Dielectric Substrate App 20100240195 - Nakamura; Toshiyuki ; et al.	2010-09-23
Dielectric substrate with reflecting films Grant 7,745,880 - Nakamura , et al. June 29, 2	2010-06-29
Method for manufacturing electronic device Grant 7,439,171 - Soda , et al. October 21, 2	2008-10-21
Focus monitoring method Grant 7,388,651 - Yabe June 17, 2	2008-06-17
Method of forming alignment marks for semiconductor device fabrication Grant 7,332,405 - Yabe , et al. February 19, 2	2008-02-19
Semiconductor device structure and fabrication process App 20060102975 - Nakamura; Toshiyuki ; et al.	2006-05-18
Focus monitoring method App 20060103823 - Yabe; Sachiko	2006-05-18
Method for manufacturing electonic device App 20060094234 - Soda; Eiichi ; et al.	2006-05-04
Method of forming alignment marks for semiconductor device fabrication App 20050186756 - Yabe, Sachiko ; et al.	2005-08-25
Method of manufacturing an alignment mark Grant 6,809,002 - Yabe , et al. October 26, 2	2004-10-26
Method of manufacturing an alignment mark App 20020182821 - Yabe, Sachiko ; et al.	2002-12-05
Photoresist developing nozzle, photoresist developing apparatus, and photoresist developing method App 20020043541 - Yabe, Sachiko	2002-04-18

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