Xu; Robert Q.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Xu; Robert Q..The latest application filed is for "breakdown voltage blocking device".

Company Profile

0.12.7

Xu; Robert Q. - Fremont CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Breakdown voltage blocking device Grant 9,722,041 - Xu , et al. August 1, 2	2017-08-01
Super-high density trench MOSFET Grant 9,431,530 - Xu , et al. August 30, 2	2016-08-30
Breakdown Voltage Blocking Device App 20140077287 - Xu; Robert Q. ; et al.	2014-03-20
Method of forming self aligned contacts for a power MOSFET Grant 8,629,019 - Xu , et al. January 14, 2	2014-01-14
Method of forming self aligned contacts for a power MOSFET Grant 8,367,500 - Xu , et al. February 5, 2	2013-02-05
Self aligned contact in a semiconductor device and method of fabricating the same Grant 8,080,459 - Xu December 20, 2	2011-12-20
Super-high Density Trench Mosfet App 20110089486 - Xu; Robert Q. ; et al.	2011-04-21
Method of forming self aligned contacts for a power MOSFET Grant 7,642,164 - Xu , et al. January 5, 2	2010-01-05
Self-aligned differential oxidation in trenches by ion implantation Grant 7,012,005 - Lichtenberger , et al. March 14, 2	2006-03-14
Self aligned contact in a semiconductor device and method of fabricating the same App 20050224891 - Xu, Robert Q.	2005-10-13
Semiconductor substrate with trenches for reducing substrate resistance Grant 6,858,471 - Korec , et al. February 22, 2	2005-02-22
Method of forming self aligned contacts for a power mosfet App 20040058481 - Xu, Robert Q. ; et al.	2004-03-25
Thicker oxide formation at the trench bottom by selective oxide deposition Grant 6,709,930 - Chan , et al. March 23, 2	2004-03-23
Thicker Oxide Formation At The Trench Bottom By Selective Oxide Deposition App 20030235958 - Chan, Ben ; et al.	2003-12-25
Self-aligned differential oxidation in trenches by ion implantation App 20030235959 - Lichtenberger, Karl ; et al.	2003-12-25

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