Xu; Biwan
Patent Applications and Registrations
Patent applications and USPTO patent grants for Xu; Biwan.The latest application filed is for "advanced inorganic material for reflection of electromagnetic waves".
- Xu; Biwan - Hong Kong CN
| Patent | Date |
|---|---|
| Advanced inorganic material for reflection of electromagnetic waves Grant 9,340,971 - Li , et al. May 17, 2 | 2016-05-17 |
| Advanced Inorganic Material For Reflection Of Electromagnetic Waves App 20130256578 - Li; Zongjin ; et al. | 2013-10-03 |
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