loadpatents
Patent applications and USPTO patent grants for Xtal, Inc..The latest application filed is for "mask bias approximation".
Patent | Date |
---|---|
Mask Bias Approximation App 20190354005 - Lan; Song ;   et al. | 2019-11-21 |
Application of FreeForm MRC to SRAF Optimization Based on ILT Mask Optimization App 20190346768 - Huang; Jihui ;   et al. | 2019-11-14 |
Mask Pattern Generation Based on Fast Marching Method App 20190324366 - He; Yuan ;   et al. | 2019-10-24 |
Simulating near field image in optical lithography Grant 10,209,615 - Li , et al. Feb | 2019-02-19 |
Full chip lithographic mask generation Grant 10,146,124 - Li , et al. De | 2018-12-04 |
Simulating Near Field Image in Optical Lithography App 20180341173 - Li; Jiangwei ;   et al. | 2018-11-29 |
Full Chip Lithographic Mask Generation App 20170242333 - Li; Jiangwei ;   et al. | 2017-08-24 |
SEC | 0001659894 | XTAL Inc. of DELAWARE |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.