Wylie-Van Eerd; Ben
Patent Applications and Registrations
Patent applications and USPTO patent grants for Wylie-Van Eerd; Ben.The latest application filed is for "mirror, in particular for a microlithographic projection exposure system".
- Wylie-Van Eerd; Ben - Hataitai Wellington NZ
| Patent | Date |
|---|---|
| Mirror, in particular for a microlithographic projection exposure system Grant 11,360,393 - Wylie-Van Eerd , et al. June 14, 2 | 2022-06-14 |
| Mirror, In Particular For A Microlithographic Projection Exposure System App 20200174379 - WYLIE-VAN EERD; Ben ; et al. | 2020-06-04 |
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