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Semiconductor lithography system and/or method Grant 11,402,761 - Wu , et al. August 2, 2 | 2022-08-02 |
Reflective Mask And Fabricating Method Thereof App 20220146924 - WU; Tsiao-Chen ;   et al. | 2022-05-12 |
Reflective mask and fabricating method thereof Grant 11,243,461 - Wu , et al. February 8, 2 | 2022-02-08 |
Apparatus and method for generating an electromagnetic radiation Grant 11,199,767 - Lee , et al. December 14, 2 | 2021-12-14 |
Semiconductor Lithography System And/or Method App 20210364930 - Wu; Tsiao-Chen ;   et al. | 2021-11-25 |
Reflective Mask And Fabricating Method Thereof App 20200133113 - WU; Tsiao-Chen ;   et al. | 2020-04-30 |
Apparatus And Method For Generating An Electromagnetic Radiation App 20200117076 - LEE; CHUNG-CHIEH ;   et al. | 2020-04-16 |
Apparatus and method for generating an electromagnetic radiation Grant 10,509,311 - Lee , et al. Dec | 2019-12-17 |
Apparatus And Method For Generating An Electromagnetic Radiation App 20190369481 - LEE; CHUNG-CHIEH ;   et al. | 2019-12-05 |
High-brightness light source Grant 10,310,380 - Wu , et al. | 2019-06-04 |
Apparatus for shielding reticle Grant 10,162,276 - Cheng , et al. Dec | 2018-12-25 |
High-brightness Light Source App 20180157179 - WU; Tsiao-Chen ;   et al. | 2018-06-07 |
Pellicle and method for manufacturing the same Grant 9,864,270 - Ma , et al. January 9, 2 | 2018-01-09 |
Wafer surface conditioning for stability in fab environment Grant 9,847,302 - Wu , et al. December 19, 2 | 2017-12-19 |
Pellicle And Method For Manufacturing The Same App 20170205705 - Ma; Jeng-Shin ;   et al. | 2017-07-20 |
Apparatus For Shielding Reticle App 20170199471 - CHENG; WEN-HAO ;   et al. | 2017-07-13 |
Method for EUV power improvement with fuel droplet trajectory stabilization Grant 9,538,628 - Wu , et al. January 3, 2 | 2017-01-03 |
Method For Euv Power Improvement With Fuel Droplet Trajectory Stabilization App 20160366756 - Wu; Tsiao-Chen ;   et al. | 2016-12-15 |
Photoresist having improved extreme-ultraviolet lithography imaging performance Grant 9,389,506 - Chang , et al. July 12, 2 | 2016-07-12 |
Reflective mask and method of making same Grant 9,213,232 - Hsu , et al. December 15, 2 | 2015-12-15 |
Photoresist Having Improved Extreme-Ultraviolet Lithography Imaging Performance App 20150286138 - Chang; Shu-Hao ;   et al. | 2015-10-08 |
Photoresist having improved extreme-ultraviolet lithography imaging performance Grant 9,081,280 - Chang , et al. July 14, 2 | 2015-07-14 |
Reflective Mask And Method Of Making Same App 20150104736 - HSU; Pei-Cheng ;   et al. | 2015-04-16 |
Method and apparatus for ultraviolet (UV) patterning with reduced outgassing Grant 8,988,652 - Chang , et al. March 24, 2 | 2015-03-24 |
Reflective mask and method of making same Grant 8,877,409 - Hsu , et al. November 4, 2 | 2014-11-04 |
Method for patterning a photosensitive layer Grant 8,815,496 - Lu , et al. August 26, 2 | 2014-08-26 |
Phase shift mask for extreme ultraviolet lithography and method of fabricating same Grant 8,765,330 - Shih , et al. July 1, 2 | 2014-07-01 |
Method And Apparatus For Ultraviolet (uv) Patterning With Reduced Outgassing App 20140111781 - CHANG; Shu-Hao ;   et al. | 2014-04-24 |
Phase Shift Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same App 20140038086 - Shih; Chih-Tsung ;   et al. | 2014-02-06 |
Reflective Mask And Method Of Making Same App 20130280643 - Hsu; Pei-Cheng ;   et al. | 2013-10-24 |
Method for Patterning a Photosensitive Layer App 20130164686 - Lu; Hsiao-Tzu ;   et al. | 2013-06-27 |
Method for patterning a photosensitive layer Grant 8,394,576 - Lu , et al. March 12, 2 | 2013-03-12 |
Photoresist Having Improved Extreme-ultraviolet Lithography Imaging Performance App 20120219897 - Chang; Shu-Hao ;   et al. | 2012-08-30 |
Method For Patterning A Photosensitive Layer App 20120114872 - Lu; Hsiao-Tzu ;   et al. | 2012-05-10 |
Method for patterning a photosensitive layer Grant 8,124,323 - Lu , et al. February 28, 2 | 2012-02-28 |
Structure design and fabrication on photomask for contact hole manufacturing process window enhancement Grant 7,838,173 - Chang , et al. November 23, 2 | 2010-11-23 |
Thermal Control For EUV Lithography App 20100053575 - Huang; I-Hsiung ;   et al. | 2010-03-04 |
Method For Patterning A Photosensitive Layer App 20090081591 - Lu; Hsiao-Tzu ;   et al. | 2009-03-26 |
Method And Apparatus For Cleaning A Substrate App 20080156346 - Wang; Hsien-Cheng ;   et al. | 2008-07-03 |
Structure Design and Fabrication on Photomask For Contact Hole Manufacturing Process Window Enhancement App 20080131790 - Chang; Ya Hui ;   et al. | 2008-06-05 |
Dual damascene trench formation to avoid low-K dielectric damage Grant 7,169,701 - Yeh , et al. January 30, 2 | 2007-01-30 |
Dual damascene trench formation to avoid low-K dielectric damage App 20060003576 - Yeh; Chen-Nan ;   et al. | 2006-01-05 |
Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern Grant 6,383,693 - Wu , et al. May 7, 2 | 2002-05-07 |