loadpatents
name:-0.016310930252075
name:-0.01793098449707
name:-0.0052042007446289
Wu; Tsiao-Chen Patent Filings

Wu; Tsiao-Chen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wu; Tsiao-Chen.The latest application filed is for "reflective mask and fabricating method thereof".

Company Profile
5.25.24
  • Wu; Tsiao-Chen - Jhudong Township TW
  • WU; Tsiao-Chen - Hsinchu County TW
  • Wu; Tsiao-Chen - Hsinchu TW
  • Wu; Tsiao-Chen - Jhudong Township, Hsinchu County N/A TW
  • Wu; Tsiao Chen - Hsin-Chu TW
  • Wu; Tsiao Chen - Hsin-Chu County TW
  • Wu; Tsiao-Chen - Tucheng TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor lithography system and/or method
Grant 11,402,761 - Wu , et al. August 2, 2
2022-08-02
Reflective Mask And Fabricating Method Thereof
App 20220146924 - WU; Tsiao-Chen ;   et al.
2022-05-12
Reflective mask and fabricating method thereof
Grant 11,243,461 - Wu , et al. February 8, 2
2022-02-08
Apparatus and method for generating an electromagnetic radiation
Grant 11,199,767 - Lee , et al. December 14, 2
2021-12-14
Semiconductor Lithography System And/or Method
App 20210364930 - Wu; Tsiao-Chen ;   et al.
2021-11-25
Reflective Mask And Fabricating Method Thereof
App 20200133113 - WU; Tsiao-Chen ;   et al.
2020-04-30
Apparatus And Method For Generating An Electromagnetic Radiation
App 20200117076 - LEE; CHUNG-CHIEH ;   et al.
2020-04-16
Apparatus and method for generating an electromagnetic radiation
Grant 10,509,311 - Lee , et al. Dec
2019-12-17
Apparatus And Method For Generating An Electromagnetic Radiation
App 20190369481 - LEE; CHUNG-CHIEH ;   et al.
2019-12-05
High-brightness light source
Grant 10,310,380 - Wu , et al.
2019-06-04
Apparatus for shielding reticle
Grant 10,162,276 - Cheng , et al. Dec
2018-12-25
High-brightness Light Source
App 20180157179 - WU; Tsiao-Chen ;   et al.
2018-06-07
Pellicle and method for manufacturing the same
Grant 9,864,270 - Ma , et al. January 9, 2
2018-01-09
Wafer surface conditioning for stability in fab environment
Grant 9,847,302 - Wu , et al. December 19, 2
2017-12-19
Pellicle And Method For Manufacturing The Same
App 20170205705 - Ma; Jeng-Shin ;   et al.
2017-07-20
Apparatus For Shielding Reticle
App 20170199471 - CHENG; WEN-HAO ;   et al.
2017-07-13
Method for EUV power improvement with fuel droplet trajectory stabilization
Grant 9,538,628 - Wu , et al. January 3, 2
2017-01-03
Method For Euv Power Improvement With Fuel Droplet Trajectory Stabilization
App 20160366756 - Wu; Tsiao-Chen ;   et al.
2016-12-15
Photoresist having improved extreme-ultraviolet lithography imaging performance
Grant 9,389,506 - Chang , et al. July 12, 2
2016-07-12
Reflective mask and method of making same
Grant 9,213,232 - Hsu , et al. December 15, 2
2015-12-15
Photoresist Having Improved Extreme-Ultraviolet Lithography Imaging Performance
App 20150286138 - Chang; Shu-Hao ;   et al.
2015-10-08
Photoresist having improved extreme-ultraviolet lithography imaging performance
Grant 9,081,280 - Chang , et al. July 14, 2
2015-07-14
Reflective Mask And Method Of Making Same
App 20150104736 - HSU; Pei-Cheng ;   et al.
2015-04-16
Method and apparatus for ultraviolet (UV) patterning with reduced outgassing
Grant 8,988,652 - Chang , et al. March 24, 2
2015-03-24
Reflective mask and method of making same
Grant 8,877,409 - Hsu , et al. November 4, 2
2014-11-04
Method for patterning a photosensitive layer
Grant 8,815,496 - Lu , et al. August 26, 2
2014-08-26
Phase shift mask for extreme ultraviolet lithography and method of fabricating same
Grant 8,765,330 - Shih , et al. July 1, 2
2014-07-01
Method And Apparatus For Ultraviolet (uv) Patterning With Reduced Outgassing
App 20140111781 - CHANG; Shu-Hao ;   et al.
2014-04-24
Phase Shift Mask for Extreme Ultraviolet Lithography and Method of Fabricating Same
App 20140038086 - Shih; Chih-Tsung ;   et al.
2014-02-06
Reflective Mask And Method Of Making Same
App 20130280643 - Hsu; Pei-Cheng ;   et al.
2013-10-24
Method for Patterning a Photosensitive Layer
App 20130164686 - Lu; Hsiao-Tzu ;   et al.
2013-06-27
Method for patterning a photosensitive layer
Grant 8,394,576 - Lu , et al. March 12, 2
2013-03-12
Photoresist Having Improved Extreme-ultraviolet Lithography Imaging Performance
App 20120219897 - Chang; Shu-Hao ;   et al.
2012-08-30
Method For Patterning A Photosensitive Layer
App 20120114872 - Lu; Hsiao-Tzu ;   et al.
2012-05-10
Method for patterning a photosensitive layer
Grant 8,124,323 - Lu , et al. February 28, 2
2012-02-28
Structure design and fabrication on photomask for contact hole manufacturing process window enhancement
Grant 7,838,173 - Chang , et al. November 23, 2
2010-11-23
Thermal Control For EUV Lithography
App 20100053575 - Huang; I-Hsiung ;   et al.
2010-03-04
Method For Patterning A Photosensitive Layer
App 20090081591 - Lu; Hsiao-Tzu ;   et al.
2009-03-26
Method And Apparatus For Cleaning A Substrate
App 20080156346 - Wang; Hsien-Cheng ;   et al.
2008-07-03
Structure Design and Fabrication on Photomask For Contact Hole Manufacturing Process Window Enhancement
App 20080131790 - Chang; Ya Hui ;   et al.
2008-06-05
Dual damascene trench formation to avoid low-K dielectric damage
Grant 7,169,701 - Yeh , et al. January 30, 2
2007-01-30
Dual damascene trench formation to avoid low-K dielectric damage
App 20060003576 - Yeh; Chen-Nan ;   et al.
2006-01-05
Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern
Grant 6,383,693 - Wu , et al. May 7, 2
2002-05-07

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