Wu; Qingguo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wu; Qingguo.The latest application filed is for "methods for producing low stress porous and cdo low-k dielectric materials using precursors with organic functional groups".

Company Profile

0.17.2

Wu; Qingguo - Vancouver WA US
Wu; Qingguo - Tualatin OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
High compressive stress carbon liners for MOS devices Grant 8,362,571 - Wu , et al. January 29, 2	2013-01-29
Method for making high stress boron-doped carbon films Grant 7,998,881 - Wu , et al. August 16, 2	2011-08-16
Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups Grant 7,923,385 - Wu , et al. April 12, 2	2011-04-12
High compressive stress carbon liners for MOS devices Grant 7,906,817 - Wu , et al. March 15, 2	2011-03-15
PECVD methods for producing ultra low-k dielectric films using UV treatment Grant 7,906,174 - Wu , et al. March 15, 2	2011-03-15
Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups Grant 7,799,705 - Wu , et al. September 21, 2	2010-09-21
Methods for producing low-k carbon doped oxide films with low residual stress Grant 7,781,351 - Wu , et al. August 24, 2	2010-08-24
Method for producing low-K CDO films Grant 7,737,525 - Wu , et al. June 15, 2	2010-06-15
Method for improving mechanical properties of low dielectric constant materials Grant 7,622,400 - Fox , et al. November 24, 2	2009-11-24
Methods For Producing Low Stress Porous And Cdo Low-k Dielectric Materials Using Precursors With Organic Functional Groups App 20090239390 - Wu; Qingguo ; et al.	2009-09-24
Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups Grant 7,473,653 - Wu , et al. January 6, 2	2009-01-06
Methods for producing low-k CDO films with low residual stress Grant 7,390,537 - Wu , et al. June 24, 2	2008-06-24
Methods for producing low-k CDO films Grant 7,341,761 - Wu , et al. March 11, 2	2008-03-11
Methods for improving integration performance of low stress CDO films Grant 7,326,444 - Wu , et al. February 5, 2	2008-02-05
Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups Grant 7,241,704 - Wu , et al. July 10, 2	2007-07-10
Method of porogen removal from porous low-k films using UV radiation Grant 7,208,389 - Tipton , et al. April 24, 2	2007-04-24
Porous material formation by chemical vapor deposition onto colloidal crystal templates Grant 7,112,615 - Gleason , et al. September 26, 2	2006-09-26
Porous material formation by chemical vapor deposition onto colloidal crystal templates App 20040249006 - Gleason, Karen K. ; et al.	2004-12-09

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