WU; Hsing-Chen
Patent Applications and Registrations
Patent applications and USPTO patent grants for WU; Hsing-Chen.The latest application filed is for "method for removing hard masks".
- WU; Hsing-Chen - Hsinchu TW
- Wu; Hsing-Chen - Yonghe TW
- WU; Hsing-Chen - Hsinchu City TW
- WU; Hsing-Chen - Yonghe City TW
- Wu; Hsing-Chen - Hsin-chu TW
| Patent | Date |
|---|---|
| Method For Removing Hard Masks App 20220033709 - WU; Hsing-Chen ; et al. | 2022-02-03 |
| Selectively etching materials Grant 11,152,219 - Wang , et al. October 19, 2 | 2021-10-19 |
| Silicon Nitride Etching Composition And Method App 20210296136 - BILODEAU; Steven Michael ; et al. | 2021-09-23 |
| Silicon nitride etching composition and method Grant 11,053,440 - Bilodeau , et al. July 6, 2 | 2021-07-06 |
| Silicon Nitride Etching Composition And Method App 20200157423 - BILODEAU; Steven M. ; et al. | 2020-05-21 |
| Compositions and methods for etching silicon nitride-containing substrates Grant 10,651,045 - Cooper , et al. | 2020-05-12 |
| Selectively Etching Materials App 20200013633 - WANG; Chieh Ju ; et al. | 2020-01-09 |
| Ni:NiGe:Ge selective etch formulations and method of using same Grant 10,340,150 - Bilodeau , et al. | 2019-07-02 |
| Passivation of germanium surfaces Grant 10,290,505 - Bilodeau , et al. | 2019-05-14 |
| Compositions And Methods For Etching Silicon Nitride-containing Substrates App 20190074188 - Cooper; Emanuel ; et al. | 2019-03-07 |
| Passivation Of Germanium Surfaces App 20180240674 - Bilodeau; Steven ; et al. | 2018-08-23 |
| Compositions for cleaning III-V semiconductor materials and methods of using same Grant 9,765,288 - Cooper , et al. September 19, 2 | 2017-09-19 |
| Ni:nige:ge Selective Etch Formulations And Method Of Using Same App 20160314990 - BILODEAU; Steven ; et al. | 2016-10-27 |
| Compositions For Cleaning Iii-v Semiconductor Materials And Methods Of Using Same App 20150344825 - COOPER; Emanuel I. ; et al. | 2015-12-03 |
| Methods For The Selective Removal Of Ashed Spin-on Glass App 20150075570 - Wu; Hsing-chen ; et al. | 2015-03-19 |
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