loadpatents
name:-0.043222904205322
name:-0.1346321105957
name:-0.0069279670715332
WU; Hengpeng Patent Filings

WU; Hengpeng

Patent Applications and Registrations

Patent applications and USPTO patent grants for WU; Hengpeng.The latest application filed is for "photoresist remover compositions".

Company Profile
5.39.43
  • WU; Hengpeng - Hillsborough NJ
  • Wu; Hengpeng - Hillborough NJ
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Photoresist Remover Compositions
App 20220276562 - WU; Hengpeng ;   et al.
2022-09-01
Photoresist remover compositions
Grant 11,365,379 - Arent , et al. June 21, 2
2022-06-21
Photoresist remover compositions
Grant 11,366,392 - Wu , et al. June 21, 2
2022-06-21
Photoresist remover compositions
Grant 11,168,288 - Wu November 9, 2
2021-11-09
Compositions and processes for self-assembly of block copolymers
Grant 11,067,893 - Wu , et al. July 20, 2
2021-07-20
Photoresist Remover Compositions
App 20210115362 - ARENT; Robert ;   et al.
2021-04-22
Photoresist Remover Compositions
App 20210080833 - WU; Hengpeng ;   et al.
2021-03-18
Photoresist Remover Compositions
App 20210071120 - WU; Hengpeng
2021-03-11
Novel Compositions And Processes For Self-assembly Of Block Copolymers
App 20200019062 - Wu; Hengpeng ;   et al.
2020-01-16
Template for self assembly and method of making a self assembled pattern
Grant 10,457,088 - Kim , et al. Oc
2019-10-29
Polymer Compositions For Self-assembly Applications
App 20190161570 - WU; Hengpeng ;   et al.
2019-05-30
Compositions and use thereof for modification of substrate surfaces
Grant 10,155,879 - Lin , et al. Dec
2018-12-18
Novel Compositions And Use Thereof For Modification Of Substrate Surfaces
App 20170174931 - Lin; Guanyang ;   et al.
2017-06-22
Compositions and processes for self-assembly of block copolymers
Grant 9,574,104 - Kim , et al. February 21, 2
2017-02-21
Silicon containing block copolymers for direct self-assembly application
Grant 9,505,945 - Wu , et al. November 29, 2
2016-11-29
Silicon Containing Block Copolymers For Direct Self-assembly Application
App 20160122579 - WU; Hengpeng ;   et al.
2016-05-05
Composition comprising a polymeric thermal acid generator and processes thereof
Grant 9,291,909 - Wu , et al. March 22, 2
2016-03-22
Underlayer composition for promoting self assembly and method of making and using
Grant 9,093,263 - Wu , et al. July 28, 2
2015-07-28
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
Grant 9,052,598 - Wu , et al. June 9, 2
2015-06-09
Methods and materials for removing metals in block copolymers
Grant 9,040,659 - Yin , et al. May 26, 2
2015-05-26
Underlayer Composition For Promoting Self Assembly And Method Of Making And Using
App 20150093912 - WU; Hengpeng ;   et al.
2015-04-02
Composition Comprising A Polymeric Thermal Acid Generator And Processes Thereof
App 20140342290 - WU; Hengpeng ;   et al.
2014-11-20
Template For Self Assembly And Method Of Making A Self Assembled Pattern
App 20140335324 - KIM; Jihoon ;   et al.
2014-11-13
Composition for coating over a photoresist pattern
Grant 8,852,848 - Wu , et al. October 7, 2
2014-10-07
Neutral layer polymer composition for directed self assembly and processes thereof
Grant 8,835,581 - Wu , et al. September 16, 2
2014-09-16
Compositions Of Neutral Layer For Directed Self Assembly Block Copolymers And Processes Thereof
App 20140193754 - WU; Hengpeng ;   et al.
2014-07-10
Methods And Materials For Removing Metals In Block Copolymers
App 20140151330 - YIN; Jian ;   et al.
2014-06-05
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
Grant 8,691,925 - Wu , et al. April 8, 2
2014-04-08
Methods and materials for removing metals in block copolymers
Grant 8,686,109 - Yin , et al. April 1, 2
2014-04-01
Neutral Layer Polymer Composition For Directed Self Assembly And Processes Thereof
App 20130330668 - WU; Hengpeng ;   et al.
2013-12-12
Methods And Materials For Removing Metals In Block Copolymers
App 20130233827 - YIN; Jian ;   et al.
2013-09-12
Compositions Of Neutral Layer For Directed Self Assembly Block Copolymers And Processes Thereof
App 20130078576 - WU; Hengpeng ;   et al.
2013-03-28
Antireflective coating compositions
Grant 8,329,387 - Yao , et al. December 11, 2
2012-12-11
Antireflective coating compositions
Grant 8,221,965 - Yao , et al. July 17, 2
2012-07-17
Composition for Coating over a Photoresist Pattern
App 20120028195 - Wu; Hengpeng ;   et al.
2012-02-02
Positive-working photoimageable bottom antireflective coating
Grant 8,039,202 - Sui , et al. October 18, 2
2011-10-18
Silicone coating composition
Grant 8,026,040 - Wu , et al. September 27, 2
2011-09-27
Positive-working photoimageable bottom antireflective coating
Grant 7,824,837 - Wu , et al. November 2, 2
2010-11-02
Solvent mixtures for antireflective coating compositions for photoresists
Grant 7,824,844 - Xiang , et al. November 2, 2
2010-11-02
Antireflective compositions for photoresists
Grant 7,691,556 - Wu , et al. April 6, 2
2010-04-06
Antireflective coating compositions
Grant 7,666,575 - Kim , et al. February 23, 2
2010-02-23
Antireflective Coating Compositions
App 20100009293 - Yao; Huirong ;   et al.
2010-01-14
Antireflective Coating Compositions
App 20100009297 - Yao; Huirong ;   et al.
2010-01-14
Antireflective composition for photoresists
Grant 7,638,262 - Wu , et al. December 29, 2
2009-12-29
Underlayer Coating Composition Based on a Crosslinkable Polymer
App 20090035704 - Zhuang; Hong ;   et al.
2009-02-05
Antireflective Coating Compositions
App 20080286689 - Zhuang; Hong ;   et al.
2008-11-20
Silicone Coating Composition
App 20080196626 - Wu; Hengpeng ;   et al.
2008-08-21
Solvent Mixtures for Antireflective Coating Compositions for Photoresists
App 20080176165 - Xiang; Zhong ;   et al.
2008-07-24
Antireflective Coating Compositions
App 20080096125 - Kim; Woo-Kyu ;   et al.
2008-04-24
Positive -Working Photoimageable Bottom Antireflective Coating
App 20080090184 - Sui; Yu ;   et al.
2008-04-17
Positive-Working Photoimageable Bottom Antireflective Coating
App 20080038666 - Wu; Hengpeng ;   et al.
2008-02-14
Antireflective composition for photoresists
App 20080038659 - Wu; Hengpeng ;   et al.
2008-02-14
Antireflective compositions for photoresists
Grant 7,264,913 - Wu , et al. September 4, 2
2007-09-04
Process for making polyesters
Grant 7,081,511 - Wu , et al. July 25, 2
2006-07-25
Bottom antireflective coatings
Grant 7,030,201 - Yao , et al. April 18, 2
2006-04-18
Antireflective compositions for photoresists
App 20060057501 - Wu; Hengpeng ;   et al.
2006-03-16
Antireflective compositions for photoresists
App 20060058468 - Wu; Hengpeng ;   et al.
2006-03-16
Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof
Grant 7,008,476 - Wu , et al. March 7, 2
2006-03-07
Process for making polyesters
App 20050234201 - Wu, Hengpeng ;   et al.
2005-10-20
Positive-working photoimageable bottom antireflective coating
App 20050214674 - Sui, Yu ;   et al.
2005-09-29
Bottom antireflective coatings
App 20050112494 - Yao, Huirong ;   et al.
2005-05-26
Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof
App 20040253532 - Wu, Hengpeng ;   et al.
2004-12-16
Negative-acting aqueous photoresist composition
Grant 6,800,415 - Lu , et al. October 5, 2
2004-10-05
Antireflective compositions for photoresists
App 20040101779 - Wu, Hengpeng ;   et al.
2004-05-27
Negative- acting aqueous photoresist composition
App 20030077539 - Lu, Ping-Hung ;   et al.
2003-04-24

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