Wu; Dingjun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wu; Dingjun.The latest application filed is for "multi-bed rapid cycle kinetic psa".

Company Profile

2.15.20

Wu; Dingjun - Macungie PA
Wu; Dingjun - Tianjin CN

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi-bed rapid cycle kinetic PSA Grant 10,744,450 - Bhadra , et al. A	2020-08-18
Multi-Bed Rapid Cycle Kinetic PSA App 20200054987 - Bhadra; Shubhra Jyoti ; et al.	2020-02-20
Pressure swing adsorption process Grant 9,381,460 - Weist, Jr. , et al. July 5, 2	2016-07-05
Three-in-one drum Grant 9,224,371 - Wu , et al. December 29, 2	2015-12-29
Pressure Swing Adsorption Process App 20140373713 - Weist, JR.; Edward Landis ; et al.	2014-12-25
Materials and Methods of Forming Controlled Void App 20140363950 - Vrtis; Raymond Nicholas ; et al.	2014-12-11
Materials and methods of forming controlled void Grant 8,846,522 - Vrtis , et al. September 30, 2	2014-09-30
Materials and Methods of Forming Controlled Void App 20130157435 - Vrtis; Raymond Nicholas ; et al.	2013-06-20
Materials and methods of forming controlled void Grant 8,399,349 - Vrtis , et al. March 19, 2	2013-03-19
Selective etching and formation of xenon difluoride Grant 8,278,222 - Wu , et al. October 2, 2	2012-10-02
Selective Etching and Formation of Xenon Difluoride App 20100022095 - Wu; Dingjun ; et al.	2010-01-28
Adsorbent for water removal from ammonia Grant 7,446,078 - Dong , et al. November 4, 2	2008-11-04
Removal of transition metal ternary and/or quaternary barrier materials from a substrate Grant 7,371,688 - Ji , et al. May 13, 2	2008-05-13
Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials Grant 7,357,138 - Ji , et al. April 15, 2	2008-04-15
Detecting the endpoint of a cleaning process App 20080047579 - Ji; Bing ; et al.	2008-02-28
Materials And Methods Of Forming Controlled Void App 20080038934 - VRTIS; RAYMOND NICHOLAS ; et al.	2008-02-14
Method for removing titanium dioxide deposits from a reactor Grant 7,267,842 - Wu , et al. September 11, 2	2007-09-11
Selective etching of titanium nitride with xenon difluoride App 20070117396 - Wu; Dingjun ; et al.	2007-05-24
Purification of hydride gases Grant 7,160,360 - Wu , et al. January 9, 2	2007-01-09
Method and process for reactive gas cleaning of tool parts App 20060254613 - Wu; Dingjun ; et al.	2006-11-16
Method to protect internal components of semiconductor processing equipment using layered superlattice materials Grant 7,119,032 - Ji , et al. October 10, 2	2006-10-10
Method for cleaning deposition chambers for high dielectric constant materials Grant 7,055,263 - Wu , et al. June 6, 2	2006-06-06
Method to protect internal components of semiconductor processing equipment using layered superlattice materials App 20060040508 - Ji; Bing ; et al.	2006-02-23
Process for titanium nitride removal App 20060016783 - Wu; Dingjun ; et al.	2006-01-26
Method for enhancing fluorine utilization App 20060017043 - Wu; Dingjun ; et al.	2006-01-26
Method for removing titanium dioxide deposits from a reactor App 20050202167 - Wu, Dingjun ; et al.	2005-09-15
Process For Removing Water From Ammonia App 20050120581 - Chiang, Robert Ling ; et al.	2005-06-09
Purification of hydride gases App 20050120877 - Wu, Dingjun ; et al.	2005-06-09
Method for cleaning deposition chambers for high dielectric constant materials App 20050108892 - Wu, Dingjun ; et al.	2005-05-26
Removal of transition metal ternary and/or quaternary barrier materials from a substrate App 20050112901 - Ji, Bing ; et al.	2005-05-26
Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials App 20040129671 - Ji, Bing ; et al.	2004-07-08
Adsorbent for moisture removal from fluorine-containing fluids Grant 6,709,487 - Dong , et al. March 23, 2	2004-03-23
Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials App 20040011380 - Ji, Bing ; et al.	2004-01-22
Adsorbent for water removal from ammonia App 20040009873 - Dong, Chun Christine ; et al.	2004-01-15

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