| Patent | Date |
|---|
Liquid Compositions For Selectively Removing Polysilicon Over P-Doped Silicon And Silicon-Germanium During Manufacture Of A Semiconductor Device
App 20220298417 - Liu; Wen Dar ; et al. | 2022-09-22 |
Etching Composition And Method For Selectively Removing Silicon Nitride During Manufacture Of A Semiconductor Device
App 20220298182 - Ge; Jhih Kuei ; et al. | 2022-09-22 |
Cleaning Composition For Semiconductor Substrates
App 20220243150 - WANG; LILI ; et al. | 2022-08-04 |
Etching Composition And Method For Selectively Removing Silicon Nitride During Manufacture Of A Semiconductor Device
App 20220228062 - Ge; Jhih Kuei ; et al. | 2022-07-21 |
Post etch residue cleaning compositions and methods of using the same
Grant 11,091,727 - Sun , et al. August 17, 2 | 2021-08-17 |
Post Etch Residue Cleaning Compositions And Methods Of Using The Same
App 20200032177 - Sun; Laisheng ; et al. | 2020-01-30 |
Etching compositions and methods for using same
Grant 10,400,167 - Liu , et al. Sep | 2019-09-03 |
Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation
Grant 10,073,351 - Agarwal , et al. September 11, 2 | 2018-09-11 |
Etching Compositions and Methods for Using Same
App 20170145311 - Liu; Wen Dar ; et al. | 2017-05-25 |
Cleaning formulations
Grant 9,536,730 - Lee , et al. January 3, 2 | 2017-01-03 |
Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation
App 20160179011 - Agarwal; Rajiv Krishan ; et al. | 2016-06-23 |
Stripping and Cleaning Compositions for Removal of Thick Film Resist
App 20160152930 - Egbe; Matthew I. ; et al. | 2016-06-02 |
Water-rich stripping and cleaning formulation and method for using same
Grant 9,201,308 - Rao , et al. December 1, 2 | 2015-12-01 |
Multi-level voltage converter
Grant 9,042,142 - Guan , et al. May 26, 2 | 2015-05-26 |
Cleaning formulations and method of using the cleaning formulations
Grant 8,889,609 - Wu , et al. November 18, 2 | 2014-11-18 |
Aqueous cleaning composition for removing residues and method using same
Grant 8,772,214 - Wu , et al. July 8, 2 | 2014-07-08 |
Cleaning Formulations
App 20140109931 - Lee; Yi Chia ; et al. | 2014-04-24 |
Stripping and Cleaning Compositions for Removal of Thick Film Resist
App 20140100151 - Egbe; Matthew I. ; et al. | 2014-04-10 |
Method for Removal of Carbon from an Organosilicate Material
App 20130295334 - Wu; Aiping ; et al. | 2013-11-07 |
Water-rich Stripping And Cleaning Formulation And Method For Using Same
App 20130296215 - RAO; Madhukar Bhaskara ; et al. | 2013-11-07 |
Water-rich stripping and cleaning formulation and method for using same
Grant 8,518,865 - Rao , et al. August 27, 2 | 2013-08-27 |
Multi-level Voltage Converter
App 20130176014 - Guan; Eryong ; et al. | 2013-07-11 |
Compositions and Methods for Texturing of Silicon Wafers
App 20130130508 - Wu; Aiping ; et al. | 2013-05-23 |
Cleaning Formulations and Method of Using the Cleaning Formulations
App 20130061882 - Wu; Aiping ; et al. | 2013-03-14 |
Wet clean compositions for CoWP and porous dielectrics
Grant 8,361,237 - Wu , et al. January 29, 2 | 2013-01-29 |
Compositions and Methods for Texturing of Silicon Wafers
App 20120295447 - Tamboli; Dnyanesh Chandrakant ; et al. | 2012-11-22 |
Composition and method for photoresist removal
Grant 8,288,330 - Wu , et al. October 16, 2 | 2012-10-16 |
Process for restoring dielectric properties
Grant 8,283,260 - Weigel , et al. October 9, 2 | 2012-10-09 |
Water-rich Stripping And Cleaning Formulation And Method For Using Same
App 20110212866 - Rao; Madhukar Bhaskara ; et al. | 2011-09-01 |
Aqueous based residue removers comprising fluoride
Grant 7,888,302 - Wu , et al. February 15, 2 | 2011-02-15 |
Cleaning composition for semiconductor substrates
Grant 7,879,783 - Wu February 1, 2 | 2011-02-01 |
Aqueous cleaning composition and method for using same
Grant 7,879,782 - Wu , et al. February 1, 2 | 2011-02-01 |
Method for Removal of Carbon From An Organosilicate Material
App 20100151206 - Wu; Aiping ; et al. | 2010-06-17 |
Wet Clean Compositions for CoWP and Porous Dielectrics
App 20100152086 - Wu; Aiping ; et al. | 2010-06-17 |
Aqueous based residue removers comprising fluoride
Grant 7,682,458 - Rovito , et al. March 23, 2 | 2010-03-23 |
Process For Restoring Dielectric Properties
App 20100041234 - Weigel; Scott Jeffrey ; et al. | 2010-02-18 |
pH buffered aqueous cleaning composition and method for removing photoresist residue
Grant 7,534,753 - Wu , et al. May 19, 2 | 2009-05-19 |
Cleaning composition for semiconductor substrates
App 20080169004 - Wu; Aiping | 2008-07-17 |
Composition and Method for Photoresist Removal
App 20070272275 - Wu; Aiping ; et al. | 2007-11-29 |
pH buffered aqueous cleaning composition and method for removing photoresist residue
App 20070161528 - Wu; Aiping ; et al. | 2007-07-12 |
Aqueous cleaning composition for removing residues and method using same
App 20070087949 - Wu; Aiping ; et al. | 2007-04-19 |
Aqueous cleaning composition and method for using same
App 20070087948 - Wu; Aiping ; et al. | 2007-04-19 |
Aqueous based residue removers comprising fluoride
App 20060172905 - Rovito; Roberto John ; et al. | 2006-08-03 |
Aqueous based residue removers comprising fluoride
App 20060172906 - Wu; Aiping ; et al. | 2006-08-03 |
Composition and method comprising same for removing residue from a substrate
App 20060003910 - Hsu; Jiun Yi ; et al. | 2006-01-05 |
| 