Wood, II; Obert R.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Wood, II; Obert R..The latest application filed is for "extreme ultraviolet (euv) lithography mask".
- Wood, II; Obert R. - New York NY
- Wood, II; Obert R. - Loudonville NY
- Wood, II; Obert R. - Loundonville NY
- Wood, II; Obert R. - Little Silver NJ
| Patent | Date |
|---|---|
| Extreme ultraviolet (EUV) lithography mask Grant 10,802,393 - Sun , et al. October 13, 2 | 2020-10-13 |
| Extreme Ultraviolet (euv) Lithography Mask App 20190113836 - SUN; Lei ; et al. | 2019-04-18 |
| Pellicle with aerogel support frame Grant 9,547,232 - Levinson , et al. January 17, 2 | 2017-01-17 |
| Pellicle With Aerogel Support Frame App 20160161857 - Levinson; Harry J. ; et al. | 2016-06-09 |
| Extreme Ultraviolet Lithography (euvl) Alternating Phase Shift Mask App 20140170533 - Sun; Lei ; et al. | 2014-06-19 |
| Hydrocarbon getter for lithographic exposure tools Grant 7,671,348 - Wood, II March 2, 2 | 2010-03-02 |
| Lithographic Alignment Marks App 20090135390 - La Fontaine; Bruno ; et al. | 2009-05-28 |
| Hydrocarbon Getter For Lithographic Exposure Tools App 20090002647 - WOOD, II; Obert R. | 2009-01-01 |
| Laser surgical system Grant 4,583,539 - Karlin , et al. April 22, 1 | 1986-04-22 |
| Low voltage operation of arc discharge devices Grant 4,504,955 - Macklin , et al. March 12, 1 | 1985-03-12 |
| Foil electrode SPER light source Grant 4,441,189 - Macklin , et al. April 3, 1 | 1984-04-03 |
| SPER Device for material working Grant 4,411,733 - Macklin , et al. October 25, 1 | 1983-10-25 |
| External control of recombination rate for electron-ion recombination lasers Grant 4,388,720 - Silfvast , et al. June 14, 1 | 1983-06-14 |
| Segmented plasma excitation-recombination laser Grant 4,336,506 - Silfvast , et al. June 22, 1 | 1982-06-22 |
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