Woo; Sang-Gyun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Woo; Sang-Gyun.The latest application filed is for "halftone phase shift blank photomasks and halftone phase shift photomasks".

Company Profile

0.56.76

Woo; Sang-Gyun - Yongin-si KR
Woo; Sang-Gyun - Gyeonggi-do KR
Woo; Sang-Gyun - Yonging-si KR
Woo; Sang-Gyun - Yongin KR
Woo; Sang-gyun - Suwon KR
Woo, Sang-gyun - Kyungki-do KR
Woo, Sang-gyun - Suwon-city KR
Woo, Sang-Gyun - Yongin-city KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Halftone phase shift blank photomasks and halftone phase shift photomasks Grant 8,865,375 - Jang , et al. October 21, 2	2014-10-21
Methods of correcting optical parameters in photomasks Grant 8,435,705 - Han , et al. May 7, 2	2013-05-07
Halftone Phase Shift Blank Photomasks and Halftone Phase Shift Photomasks App 20130101926 - Jang; Il-Yong ; et al.	2013-04-25
Methods of fabricating halftone phase shift blank photomasks and halftone phase shift photomasks Grant 8,329,363 - Jang , et al. December 11, 2	2012-12-11
Semiconductor device having fine contacts and method of fabricating the same Grant 8,242,018 - Lee , et al. August 14, 2	2012-08-14
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device Grant 8,241,837 - Hah , et al. August 14, 2	2012-08-14
Method of forming pattern using fine pitch hard mask Grant 8,062,981 - Lee , et al. November 22, 2	2011-11-22
Methods of Correcting Optical Parameters in Photomasks App 20110244374 - Han; Haek-seung ; et al.	2011-10-06
Semiconductor memory devices including diagonal bit lines Grant 8,013,375 - Goo , et al. September 6, 2	2011-09-06
Semiconductor memory devices including offset bit lines Grant 8,013,374 - Goo , et al. September 6, 2	2011-09-06
Photomask Grant 8,007,963 - Lee , et al. August 30, 2	2011-08-30
Mask patterns including gel layers for semiconductor device fabrication Grant 7,985,529 - Hata , et al. July 26, 2	2011-07-26
Methods of Fabricating Halftone Phase Shift Blank Photomasks and Halftone Phase Shift Photomasks App 20110104591 - Jang; Il-Yong ; et al.	2011-05-05
Semiconductor Device Having Fine Contacts And Method Of Fabricating The Same App 20110076846 - Lee; Ji-young ; et al.	2011-03-31
Mask Pattern For Semiconductor Device Fabrication, Method Of Forming The Same, And Method Of Fabricating Finely Patterned Semiconductor Device App 20110059613 - Hah; Jung-Hwan ; et al.	2011-03-10
System and method correcting optical proximity effect using pattern configuration dependent OPC models Grant 7,900,170 - Suh , et al. March 1, 2	2011-03-01
Method for forming patterns of semiconductor device Grant 7,862,988 - Koh , et al. January 4, 2	2011-01-04
Semiconductor device having fine contacts Grant 7,855,408 - Lee , et al. December 21, 2	2010-12-21
Mask patterns for semiconductor device fabrication and related methods and structures Grant 7,855,038 - Hah , et al. December 21, 2	2010-12-21
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device Grant 7,851,125 - Hah , et al. December 14, 2	2010-12-14
Method of forming pattern Grant 7,842,451 - Koh , et al. November 30, 2	2010-11-30
Method of forming small pitch pattern using double spacers Grant 7,842,601 - Lee , et al. November 30, 2	2010-11-30
Reflective photomask and method of fabricating the same Grant 7,807,318 - Park , et al. October 5, 2	2010-10-05
Optical masks and methods for measuring aberration of a beam Grant 7,799,490 - Hwang , et al. September 21, 2	2010-09-21
Photomask App 20100173230 - Lee; Myoung-soo ; et al.	2010-07-08
Optical Masks And Methods For Measuring Aberration Of A Beam App 20100112466 - Hwang; Chan ; et al.	2010-05-06
Nonvolatile memory device and method of manufacturing the same Grant 7,678,650 - Koh , et al. March 16, 2	2010-03-16
Optical masks and methods for measuring aberration of a beam Grant 7,670,725 - Hwang , et al. March 2, 2	2010-03-02
Polymer, top coating layer, top coating composition and immersion lithography process using the same Grant 7,642,042 - Hata , et al. January 5, 2	2010-01-05
Method Of Forming Pattern App 20090291561 - Koh; Cha-Won ; et al.	2009-11-26
Mask Patterns Including Gel Layers For Semiconductor Device Fabrication App 20090263732 - Hata; Mitsuhiro ; et al.	2009-10-22
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device Grant 7,604,911 - Hata , et al. October 20, 2	2009-10-20
Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets Grant 7,604,907 - Lee , et al. October 20, 2	2009-10-20
Nonvolatile memory device and method of manufacturing the same App 20090258473 - Koh; Cha-Won ; et al.	2009-10-15
Method of maintaining mask for semiconductor process App 20090239158 - Woo; Sang-Gyun ; et al.	2009-09-24
Semiconductor Memory Devices Including Diagonal Bit Lines App 20090218610 - Goo; Don-Hoon ; et al.	2009-09-03
Semiconductor Memory Devices Including Extended Memory Elements App 20090218654 - Goo; Don-Hoon ; et al.	2009-09-03
Semiconductor Memory Devices Including Offset Bit Lines App 20090218609 - Goo; Doo-Hoon ; et al.	2009-09-03
Semiconductor device having overlay measurement mark and method of fabricating the same Grant 7,582,899 - Koh , et al. September 1, 2	2009-09-01
Method of forming pattern Grant 7,575,855 - Koh , et al. August 18, 2	2009-08-18
Nonvolatile memory device and method of manufacturing the same Grant 7,560,768 - Koh , et al. July 14, 2	2009-07-14
Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same Grant 7,550,383 - Park , et al. June 23, 2	2009-06-23
Semiconductor memory devices including offset active regions Grant 7,547,936 - Goo , et al. June 16, 2	2009-06-16
Methods of fabricating a semiconductor device Grant 7,540,970 - Koh , et al. June 2, 2	2009-06-02
Method Of Forming Pattern Using Fine Pitch Hard Mask App 20090117497 - LEE; Ji-young ; et al.	2009-05-07
Method of forming pattern using fine pitch hard mask Grant 7,473,647 - Lee , et al. January 6, 2	2009-01-06
Mask Patterns for Semiconductor Device Fabrication and Related Methods and Structures App 20080176152 - Hah; Jung-hwan ; et al.	2008-07-24
Photomask for measuring lens aberration, method of its manufacture, and method of its use Grant 7,403,276 - Shin , et al. July 22, 2	2008-07-22
Method of forming pattern for semiconductor device Grant 7,387,869 - Koh , et al. June 17, 2	2008-06-17
Top coating composition for photoresist and method of forming photoresist pattern using same Grant 7,384,730 - Hata , et al. June 10, 2	2008-06-10
Mask patterns for semiconductor device fabrication and related methods Grant 7,361,609 - Hah , et al. April 22, 2	2008-04-22
Mask Pattern For Semiconductor Device Fabrication, Method Of Forming The Same, Method For Preparing Coating, Composition For Fine Pattern Formation, And Method Of Fabricating Semiconductor Device App 20080076255 - Hata; Mitsuhiro ; et al.	2008-03-27
Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same Grant 7,335,455 - Kim , et al. February 26, 2	2008-02-26
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device Grant 7,314,691 - Hata , et al. January 1, 2	2008-01-01
Composition for a bottom-layer resist Grant 7,314,702 - Lee , et al. January 1, 2	2008-01-01
Semiconductor device having vertical channel transistor App 20070284623 - Kim; Sang-Jin ; et al.	2007-12-13
Method of forming a photoresist pattern and method for patterning a layer using a photoresist Grant 7,297,466 - Lee , et al. November 20, 2	2007-11-20
Method of forming trench in semiconductor device Grant 7,259,065 - Goo , et al. August 21, 2	2007-08-21
Reflective photomask and method of fabricating the same App 20070178393 - Park; Jin-Hong ; et al.	2007-08-02
Resist composition comprising photosensitive polymer having lactone in its backbone Grant 7,241,552 - Yoon , et al. July 10, 2	2007-07-10
Polymer, top coating layer, top coating composition and immersion lithography process using the same App 20070155925 - Hata; Mitsuhiro ; et al.	2007-07-05
Method of fabricating semiconductor integrated circuit device App 20070128823 - Lee; Ji-young ; et al.	2007-06-07
DRAM devices having an increased density layout Grant 7,221,014 - Goo , et al. May 22, 2	2007-05-22
Nonvolatile memory device and method of manufacturing the same App 20070111441 - Koh; Cha-Won ; et al.	2007-05-17
Optical proximity correction system and methods thereof App 20070094635 - Suh; Sung-Soo ; et al.	2007-04-26
Photosensitive polymer including fluorine and resist composition containing the same Grant 7,202,011 - Yoon , et al. April 10, 2	2007-04-10
Method for forming patterns of semiconductor device App 20070077524 - Koh; Cha-Won ; et al.	2007-04-05
Semiconductor structure with multiple bottom anti-reflective coating layer and method of forming photoresist pattern and pattern of semiconductor device using the same structure App 20070023916 - Hah; Jung-hwan ; et al.	2007-02-01
Methods of fabricating a semiconductor device App 20070020565 - Koh; Cha-Won ; et al.	2007-01-25
Method measuring distortion using exposure equipment App 20070002293 - Park; Dong-woon ; et al.	2007-01-04
Top coating composition for photoresist and method of forming photoresist pattern using the same App 20060275697 - Hata; Mitsuhiro ; et al.	2006-12-07
Method of forming small pitch pattern using double spacers App 20060240361 - Lee; Ji-young ; et al.	2006-10-26
Method of forming pattern using fine pitch hard mask App 20060234166 - Lee; Ji-young ; et al.	2006-10-19
Semiconductor device having fine contacts and method of fabricating the same App 20060231900 - Lee; Ji-young ; et al.	2006-10-19
Photomask for measuring lens aberration, method of its manufacture, and method of its use App 20060216616 - Shin; Jang-Ho ; et al.	2006-09-28
Method of forming fine patterns of a semiconductor device App 20060160028 - Lee; Hyung-Rae ; et al.	2006-07-20
Optical masks and methods for measuring aberration of a beam App 20060154155 - Hwang; Chan ; et al.	2006-07-13
Semiconductor device having overlay measurement mark and method of fabricating the same App 20060131576 - Koh; Cha-Won ; et al.	2006-06-22
Double photolithography methods with reduced intermixing of solvents App 20060127816 - Kang; Yool ; et al.	2006-06-15
Polymeric tetrahedral carbon films, methods of forming the same and methods of forming fine patterns using the same App 20060115772 - Hah; Jung-Hwan ; et al.	2006-06-01
Focus monitoring masks having multiple phase shifter units and methods for fabricating the same App 20060115746 - Choi; Sung-Won ; et al.	2006-06-01
Photo mask structure used during twice-performed photo process and methods of using the same App 20060115747 - Lee; Hyung-Rae ; et al.	2006-06-01
Bottom layer resist polymers for photolithography and methods of manufacturing the same App 20060111547 - Hata; Mitsuhiro ; et al.	2006-05-25
Top coating composition for photoresist and method of forming photoresist pattern using same App 20060111550 - Hata; Mitsuhiro ; et al.	2006-05-25
Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same App 20060099538 - Park; Joon-Soo ; et al.	2006-05-11
Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devices App 20060079067 - Shin; Jang-Ho ; et al.	2006-04-13
Semiconductor memory devices including offset active regions App 20060076599 - Goo; Doo-Hoon ; et al.	2006-04-13
Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets App 20060073396 - Lee; Doo-Youl ; et al.	2006-04-06
Mask patterns for semiconductor device fabrication and related methods and structures App 20060063384 - Hah; Jung-hwan ; et al.	2006-03-23
Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same App 20060063077 - Hata; Mitsuhiro ; et al.	2006-03-23
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device App 20060046205 - Hah; Jung-Hwan ; et al.	2006-03-02
Method of forming pattern App 20050282092 - Koh, Cha-Won ; et al.	2005-12-22
Dram devices having an increased density layout App 20050269615 - Goo, Doo-hoon ; et al.	2005-12-08
Method of forming trench in semiconductor device App 20050266646 - Goo, Doo-hoon ; et al.	2005-12-01
Method of forming pattern for semiconductor device App 20050266356 - Koh, Cha-Won ; et al.	2005-12-01
Photosensitive polymer having cyclic backbone and resist composition containing the same Grant 6,964,839 - Choi , et al. November 15, 2	2005-11-15
Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same Grant 6,962,768 - Kim , et al. November 8, 2	2005-11-08
Cleaning solution and method of cleaning semiconductor devices using the same App 20050233922 - Jung, Myoung-Ho ; et al.	2005-10-20
Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device App 20050227492 - Hah, Jung-Hwan ; et al.	2005-10-13
Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device App 20050227151 - Hata, Mitsuhiro ; et al.	2005-10-13
Resist compositions including thermal crosslinking agents App 20050026078 - Choi, Sang-jun ; et al.	2005-02-03
Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same Grant 6,844,134 - Choi , et al. January 18, 2	2005-01-18
Resist composition comprising photosensitive polymer having lactone in its backbone App 20050008975 - Yoon, Kwang-sub ; et al.	2005-01-13
Polymer having butadiene sulfone repeating unit and resist composition comprising the same Grant 6,835,529 - Choi , et al. December 28, 2	2004-12-28
Method of forming an underlayer of a bi-layer resist film and method of fabricating a semiconductor device using the same App 20040259024 - Kim, Hyun-Woo ; et al.	2004-12-23
Cleaning solution used in process of fabricating semiconductor device App 20040248752 - Jung, Myoung-Ho ; et al.	2004-12-09
Methods for forming line patterns in semiconductor substrates Grant 6,803,176 - Choi , et al. October 12, 2	2004-10-12
Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same Grant 6,800,418 - Yoon , et al. October 5, 2	2004-10-05
Photosensitive polymers and resist compositions comprising the photosensitive polymers Grant 6,787,287 - Kim , et al. September 7, 2	2004-09-07
Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same App 20040170919 - Kim, Hyun-Woo ; et al.	2004-09-02
Composition for a bottom-layer resist App 20040146809 - Lee, Sung-Ho ; et al.	2004-07-29
Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same Grant 6,713,228 - Kim , et al. March 30, 2	2004-03-30
Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group Grant 6,696,217 - Yoon , et al. February 24, 2	2004-02-24
Method of forming a photoresist pattern and method for patterning a layer using a photoresist App 20040033445 - Lee, Sung-Ho ; et al.	2004-02-19
Resist composition comprising photosensitive polymer having lactone in its backbone App 20040018442 - Yoon, Kwang-Sub ; et al.	2004-01-29
Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same Grant 6,677,100 - Kim , et al. January 13, 2	2004-01-13
Photosensitive polymer including fluorine and resist composition containing the same App 20030228537 - Yoon, Kwang-Sub ; et al.	2003-12-11
Photosensitive polymers and resist compositions containing the same App 20030224289 - Choi, Sang-Jun ; et al.	2003-12-04
Photosensitive polymer and chemically amplified resist composition comprising the same App 20030215758 - Kim, Hyun-Woo ; et al.	2003-11-20
Photosensitive polymer Grant 6,642,336 - Lee , et al. November 4, 2	2003-11-04
Polymer having butadiene sulfone repeating unit and resist composition comprising the same App 20030180661 - Choi, Sang-jun ; et al.	2003-09-25
Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same App 20030157430 - Yoon, Kwang-Sub ; et al.	2003-08-21
Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist compositon comprising the same App 20030125511 - Choi, Sang-Jun ; et al.	2003-07-03
Methods for forming line patterns in semiconductor substrates App 20030054292 - Choi, Sang-Jun ; et al.	2003-03-20
Methods for forming line patterns in semiconductor substrates Grant 6,485,895 - Choi , et al. November 26, 2	2002-11-26
Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same App 20020160303 - Kim, Hyun-Woo ; et al.	2002-10-31
Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group App 20020155379 - Yoon, Kwang-sub ; et al.	2002-10-24
Photosensitive polymers and resist compositions comprising the photosensitive polymers App 20020146642 - Kim, Hyun-woo ; et al.	2002-10-10
Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same App 20020072009 - Kim, Hyun-Woo ; et al.	2002-06-13
Resist composition comprising photosensitive polymer having loctone in its backbone App 20020042016 - Yoon, Kwang-sub ; et al.	2002-04-11
Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition App 20010038968 - Kim, Hyun-woo ; et al.	2001-11-08