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Patent applications and USPTO patent grants for WONG; Manus.The latest application filed is for "electrostatic chuck, method of manufacturing electrostatic chuck, and plasma processing apparatus".
Patent | Date |
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Electrostatic Chuck, Method Of Manufacturing Electrostatic Chuck, And Plasma Processing Apparatus App 20210118716 - YE; Rubin ;   et al. | 2021-04-22 |
Lift Pin Assembly, An Electrostatic Chuck And A Processing Apparatus Where The Electrostatic Chuck Is Located App 20200083087 - Ni; Tuqiang ;   et al. | 2020-03-12 |
Symmetric tunable inductively coupled HDP-CVD reactor Grant 6,170,428 - Redeker , et al. January 9, 2 | 2001-01-09 |
Multi-zone RF inductively coupled source configuration Grant 6,083,344 - Hanawa , et al. July 4, 2 | 2000-07-04 |
Substrate support with pressure zones having reduced contact area and temperature feedback Grant 5,761,023 - Lue , et al. June 2, 1 | 1998-06-02 |
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