| Patent | Date |
|---|
Contact stacks to reduce hydrogen in thin film transistor
Grant 11,444,205 - Sen Gupta , et al. September 13, 2 | 2022-09-13 |
Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece
Grant 10,957,518 - Ramaswamy , et al. March 23, 2 | 2021-03-23 |
Chamber With Individually Controllable Plasma Generation Regions For A Reactor For Processing A Workpiece
App 20200312630 - Ramaswamy; Kartik ; et al. | 2020-10-01 |
Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber
Grant 10,784,085 - Ramaswamy , et al. Sept | 2020-09-22 |
Real-time measurement of a surface charge profile of an electrostatic chuck
Grant 10,656,194 - Wang , et al. | 2020-05-19 |
Contact Stacks To Reduce Hydrogen In Thin Film Transistor
App 20200098657 - SEN GUPTA; Arnab ; et al. | 2020-03-26 |
Method of real time in-situ chamber condition monitoring using sensors and RF communication
Grant 10,395,904 - Wong , et al. A | 2019-08-27 |
Systems and methods for providing balance notifications
Grant 10,296,972 - Van Heerden , et al. | 2019-05-21 |
Method of Real Time In-Situ Chamber Condition Monitoring Using Sensors and Rf Communication
App 20190096641 - Wong; Lawrence ; et al. | 2019-03-28 |
Multiple Electrode Substrate Support Assembly And Phase Control System
App 20180366306 - YANG; Yang ; et al. | 2018-12-20 |
Multiple electrode substrate support assembly and phase control system
Grant 10,153,139 - Yang , et al. Dec | 2018-12-11 |
Method of real time in-situ chamber condition monitoring using sensors and RF communication
Grant 10,141,166 - Wong , et al. Nov | 2018-11-27 |
Method and apparatus for controlling plasma near the edge of a substrate
Grant 10,017,857 - Nguyen , et al. July 10, 2 | 2018-07-10 |
Method and system for generating and aggregating models based on disparate data from insurance, financial services, and public industries
Grant 9,697,469 - McMahon , et al. July 4, 2 | 2017-07-04 |
System and method for selective coil excitation in inductively coupled plasma processing reactors
Grant 9,659,751 - Ramaswamy , et al. May 23, 2 | 2017-05-23 |
Plasma Reactor For Processing A Workpiece With An Array Of Plasma Point Sources
App 20170092470 - Ramaswamy; Kartik ; et al. | 2017-03-30 |
Multiple Electrode Substrate Support Assembly And Phase Control System
App 20160372307 - YANG; YANG ; et al. | 2016-12-22 |
Method And Apparatus For Controlling Plasma Near The Edge Of A Substrate
App 20160322242 - NGUYEN; Andrew ; et al. | 2016-11-03 |
Method of multiple zone symmetric gas injection for inductively coupled plasma
Grant 9,472,379 - Lane , et al. October 18, 2 | 2016-10-18 |
Plasma Processing Reactor With A Magnetic Electron-blocking Filter External Of The Chamber And Uniform Field Within The Chamber
App 20160225466 - Ramaswamy; Kartik ; et al. | 2016-08-04 |
Real-time Measurement Of A Surface Charge Profile Of An Electrostatic Chuck
App 20160116518 - WANG; HAITAO ; et al. | 2016-04-28 |
Method And System For Generating And Aggregating Models Based On Disparate Data From Insurance, Financial Services, And Public Industries
App 20160048766 - McMahon; Andrew ; et al. | 2016-02-18 |
Method Of Real Time In-situ Chamber Condition Monitoring Using Sensors And Rf Communication
App 20160048111 - Wong; Lawrence ; et al. | 2016-02-18 |
System And Method For Selective Coil Excitation In Inductively Coupled Plasma Processing Reactors
App 20160027616 - RAMASWAMY; KARTIK ; et al. | 2016-01-28 |
Method Of Multiple Zone Symmetric Gas Injection For Inductively Coupled Plasma
App 20150371824 - LANE; Steven ; et al. | 2015-12-24 |
Independent control of RF phases of separate coils of an inductively coupled plasma reactor
Grant 9,161,428 - Collins , et al. October 13, 2 | 2015-10-13 |
Systems And Methods For Providing Balance Notifications
App 20150193866 - Van Heerden; Lauren ; et al. | 2015-07-09 |
Inductively Coupled Spatially Discrete Multi-loop Rf-driven Plasma Source
App 20150075717 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Spatially Discrete Multi-loop Rf-driven Plasma Source Having Plural Independent Zones
App 20150075716 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Orthopedic Device For Use With An Orthopedic Cast
App 20140330185 - Taslim; Mohammad ; et al. | 2014-11-06 |
Method of differential counter electrode tuning in an RF plasma reactor
Grant 8,734,664 - Yang , et al. May 27, 2 | 2014-05-27 |
Differential Counter Electrode Tuning In A Plasma Reactor With An Rf-driven Ceiling Electrode
App 20140069584 - Yang; Yang ; et al. | 2014-03-13 |
Method Of Differential Counter Electrode Tuning In An Rf Plasma Reactor
App 20140034612 - Yang; Yang ; et al. | 2014-02-06 |
Differential Counter Electrode Tuning In A Plasma Reactor With An Rf-driven Workpiece Support Electrode
App 20140034239 - Yang; Yang ; et al. | 2014-02-06 |
Apparatus for VHF impedance match tuning
Grant 8,578,879 - Ramaswamy , et al. November 12, 2 | 2013-11-12 |
Independent Control Of Rf Phases Of Separate Coils Of An Inductively Coupled Plasma Reactor
App 20130284370 - Collins; Kenneth S. ; et al. | 2013-10-31 |
Two-phase Operation Of Plasma Chamber By Phase Locked Loop
App 20130284369 - Kobayashi; Satoru ; et al. | 2013-10-31 |
Plasma Processing Using Rf Return Path Variable Impedance Controller With Two-dimensional Tuning Space
App 20130277333 - Misra; Nipun ; et al. | 2013-10-24 |
Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system
Grant 8,148,977 - Ramaswamy , et al. April 3, 2 | 2012-04-03 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
Grant 8,080,479 - Collins , et al. December 20, 2 | 2011-12-20 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes
Grant 8,076,247 - Collins , et al. December 13, 2 | 2011-12-13 |
Plasma reactor with reduced electrical skew using electrical bypass elements
Grant 7,988,815 - Rauf , et al. August 2, 2 | 2011-08-02 |
Plasma processing apparatus
Grant 7,972,469 - Hanawa , et al. July 5, 2 | 2011-07-05 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
Grant 7,968,469 - Collins , et al. June 28, 2 | 2011-06-28 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
Grant 7,884,025 - Collins , et al. February 8, 2 | 2011-02-08 |
Apparatus For Vhf Impedance Match Tuning
App 20110023780 - RAMASWAMY; KARTIK ; et al. | 2011-02-03 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
Grant 7,879,731 - Collins , et al. February 1, 2 | 2011-02-01 |
Plasma Reactor With Rf Generator And Automatic Impedance Match With Minimum Reflected Power-seeking Control
App 20110009999 - Zhang; Chunlei ; et al. | 2011-01-13 |
Method of Operating a Dual SIM Wireless Communications Device
App 20100279698 - Wong; Lawrence | 2010-11-04 |
Apparatus For Characterizing A Magnetic Field In A Magnetically Enhanced Substrate Processing System
App 20100188077 - RAMASWAMY; KARTIK ; et al. | 2010-07-29 |
Capacitively Coupled Plasma Etch Chamber With Multiple Rf Feeds
App 20100015357 - Hanawa; Hiroji ; et al. | 2010-01-21 |
Folded Coaxial Resonators
App 20090257927 - RAMASWAMY; KARTIK ; et al. | 2009-10-15 |
Delta code messaging
Grant 7,587,458 - Wong September 8, 2 | 2009-09-08 |
Plasma Reactor With Reduced Electrical Skew Using A Conductive Baffle
App 20090025879 - Rauf; Shahid ; et al. | 2009-01-29 |
Plasma Reactor With Reduced Electrical Skew Using Electrical Bypass Elements
App 20090025878 - Rauf; Shahid ; et al. | 2009-01-29 |
Plasma Processing Apparatus
App 20080257261 - Hanawa; Hiroji ; et al. | 2008-10-23 |
Plasma Processing Method
App 20080260966 - Hanawa; Hiroji ; et al. | 2008-10-23 |
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator
App 20080182418 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources
App 20080178803 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources
App 20080179011 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity
App 20080179181 - COLLINS; KENNETH S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes
App 20080180028 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources
App 20080182417 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources
App 20080182416 - Collins; Kenneth S. ; et al. | 2008-07-31 |
Thin passivation layer on 3D devices
App 20080142991 - Wong; Lawrence ; et al. | 2008-06-19 |
Thin passivation layer on 3D devices
Grant 7,354,862 - Wong , et al. April 8, 2 | 2008-04-08 |
Method and apparatus for up-and-down-conversion of radio frequency (RF) signals
Grant 7,215,931 - Snyder , et al. May 8, 2 | 2007-05-08 |
Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer
Grant 7,164,206 - Kloster , et al. January 16, 2 | 2007-01-16 |
Delta code messaging
App 20070005807 - Wong; Lawrence | 2007-01-04 |
Thin passivation layer on 3D devices
App 20060234473 - Wong; Lawrence ; et al. | 2006-10-19 |
Method and apparatus for up-and down-conversion of radio frequency (RF) signals
Grant 7,046,980 - Manku , et al. May 16, 2 | 2006-05-16 |
Dual-damascene interconnects without an etch stop layer by alternating ILDs
Grant 6,992,391 - Ott , et al. January 31, 2 | 2006-01-31 |
Method and apparatus for down-conversion of radio frequency (RF) signals with reduced local oscillator leakage
Grant 6,973,297 - Manku , et al. December 6, 2 | 2005-12-06 |
Dual-damascene interconnects without an etch stop layer by alternating ILDs
App 20050208753 - Ott, Andrew ; et al. | 2005-09-22 |
Method of making semiconductor devices using carbon nitride, a low-dielectric-constant hard mask and/or etch stop
App 20040119163 - Wong, Lawrence ; et al. | 2004-06-24 |
Method and apparatus for up-and-down-conversion of radio frequency (rf) signals
App 20040048585 - Snyder, Chris ; et al. | 2004-03-11 |
Dual-damascene interconnects without an etch stop layer by alternating ILDs
App 20030064580 - Ott, Andrew ; et al. | 2003-04-03 |
Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer
App 20020140103 - Kloster, Grant ; et al. | 2002-10-03 |
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