Won; Jai-hyung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Won; Jai-hyung.The latest application filed is for "semiconductor process management system, semiconductor manufacturing system including the same, and method of manufacturing semiconductor".

Company Profile

0.4.10

Won; Jai-hyung - Seoul KR
Won; Jai-Hyung - Seongnam KR
Won, Jai-Hyung - Sungnam-si KR
Won, Jai-Hyung - Seongnam-city KR
Won; Jai Hyung - Seongnam-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor process management system, semiconductor manufacturing system including the same, and method of manufacturing semiconductor Grant 9,791,855 - Han , et al. October 17, 2	2017-10-17
Semiconductor Process Management System, Semiconductor Manufacturing System Including The Same, And Method Of Manufacturing Semiconductor App 20150346709 - Han; Dong-hoon ; et al.	2015-12-03
Showerhead And Apparatus For Processing A Substrate Including The Same App 20150129132 - LIM; Hong-Taek ; et al.	2015-05-14
Methods Of Forming A Carbon Type Hard Mask Layer Using Induced Coupled Plasma And Methods Of Forming Patterns Using The Same App 20120276743 - Won; Jai-Hyung ; et al.	2012-11-01
Filament member, ion source, and ion implantation apparatus App 20070114436 - Keum; Gyeong-Su ; et al.	2007-05-24
Plasma doping method and plasma doping apparatus for performing the same App 20070087584 - Keum; Gyeong-Su ; et al.	2007-04-19
Plasma doping method and plasma doping apparatus for performing the same App 20070077366 - Keum; Gyeong-Su ; et al.	2007-04-05
Ion implanters having an arc chamber that affects ion current density Grant 7,170,070 - Kwon , et al. January 30, 2	2007-01-30
High density plasma chemical vapor deposition process Grant 7,109,132 - Won , et al. September 19, 2	2006-09-19
Ion implanters having an arc chamber that affects ion current density App 20060060797 - Kwon; Ui-hui ; et al.	2006-03-23
Antenna for use in producing plasma and plasma processing apparatus comprising the same App 20050087139 - Kim, Woo-Seok ; et al.	2005-04-28
High density plasma chemical vapor deposition process App 20040166694 - Won, Jai-Hyung ; et al.	2004-08-26
PECVD method of forming a tungsten silicide layer on a polysilicon layer Grant 6,573,180 - Won June 3, 2	2003-06-03
Method for forming a tungsten silicide layer App 20020137336 - Won, Jai Hyung	2002-09-26

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