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Patent applications and USPTO patent grants for WON; Donghoon.The latest application filed is for "hardmask composition and method of forming patterns".
Patent | Date |
---|---|
Hardmask Composition And Method Of Forming Patterns App 20220195082 - WON; Donghoon ;   et al. | 2022-06-23 |
Semiconductor Device And Method Of Fabricating The Same App 20210125925 - HEO; Junyeong ;   et al. | 2021-04-29 |
Semiconductor Package Including A First Semiconductor Stack And A Second Semiconductor Stack Of Different Widths App 20210091045 - HEO; JUNYEONG ;   et al. | 2021-03-25 |
Semiconductor Substrate And Method Of Dicing The Same App 20210050264 - WON; Donghoon ;   et al. | 2021-02-18 |
Substrate, method of sawing substrate, and semiconductor device Grant 10,916,509 - Cho , et al. February 9, 2 | 2021-02-09 |
Substrate, Method Of Sawing Substrate, And Semiconductor Device App 20190355671 - CHO; Yun-Rae ;   et al. | 2019-11-21 |
Substrate, method of sawing substrate, and semiconductor device Grant 10,418,335 - Cho , et al. Sept | 2019-09-17 |
Substrate, Method Of Sawing Substrate, And Semiconductor Device App 20180261555 - CHO; Yun-Rae ;   et al. | 2018-09-13 |
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