WOELFLE; Harald

Patent Applications and Registrations

Patent applications and USPTO patent grants for WOELFLE; Harald.The latest application filed is for "lens module comprising at least one exchangeable optical element".

Company Profile

0.8.9

WOELFLE; Harald - Waldkirch DE
Woelfle; Harald - Freiburg DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lens Module Comprising At Least One Exchangeable Optical Element App 20180031827 - SOYEZ; Guido ; et al.	2018-02-01
Lens module comprising at least one exchangeable optical element Grant 9,703,098 - Soyez , et al. July 11, 2	2017-07-11
Method for replacing objective parts Grant 9,551,944 - Geuppert , et al. January 24, 2	2017-01-24
Lens Module Comprising At Least One Exchangeable Optical Element App 20160357012 - SOYEZ; Guido ; et al.	2016-12-08
Lens module comprising at least one exchangeable optical element Grant 9,423,695 - Soyez , et al. August 23, 2	2016-08-23
Lens Module Comprising At Least One Exchangeable Optical Element App 20150138521 - SOYEZ; Guido ; et al.	2015-05-21
Lens module comprising at least one exchangeable optical element Grant 8,939,587 - Soyez , et al. January 27, 2	2015-01-27
Method and Device for Replacing Objective Parts App 20140359990 - Geuppert; Bernhard ; et al.	2014-12-11
Lens Module Comprising At Least One Exchangeable Optical Element App 20130155509 - SOYEZ; Guido ; et al.	2013-06-20
Lens module comprising at least one exchangeable optical element Grant 8,376,559 - Soyez , et al. February 19, 2	2013-02-19
Lens Module Comprising At Least One Exchangeable Optical Element App 20120105958 - SOYEZ; Guido ; et al.	2012-05-03
Lens module comprising at least one exchangeable optical element Grant 8,092,029 - Soyez , et al. January 10, 2	2012-01-10
Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography device Grant 7,911,598 - Kraus , et al. March 22, 2	2011-03-22
Method For Cleaning An Euv Lithography Device, Method For Measuring The Residual Gas Atmosphere And The Contamination And Euv Lithography Device App 20100034349 - KRAUS; Dieter ; et al.	2010-02-11
Method And Device For Replacing Objective Parts App 20090260654 - Geuppert; Bernhard ; et al.	2009-10-22
Lens Module Comprising at Least One Exchangeable Optical Element App 20080137192 - Soyez; Guido ; et al.	2008-06-12

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