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name:-0.0091540813446045
name:-0.0066959857940674
name:-0.0043411254882812
WISE; Rich Patent Filings

WISE; Rich

Patent Applications and Registrations

Patent applications and USPTO patent grants for WISE; Rich.The latest application filed is for "extreme ultraviolet (euv) lithography using an intervening layer or a multi-layer stack with varying mean free paths for secondary electron generation".

Company Profile
2.3.6
  • WISE; Rich - Los Gatos CA
  • Wise; Rich - Newburgh NY
  • Wise; Rich - New Windsor NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Extreme Ultraviolet (euv) Lithography Using An Intervening Layer Or A Multi-layer Stack With Varying Mean Free Paths For Secondary Electron Generation
App 20220197147 - LIANG; Andrew ;   et al.
2022-06-23
System and method for determining dimensional range of repairable defects by deposition and etching in a virtual fabrication environment
Grant 10,885,253 - Sobieski , et al. January 5, 2
2021-01-05
System And Method For Determining Dimensional Range Of Repairable Defects By Deposition And Etching In A Virtual Fabrication Env
App 20200134117 - Sobieski; Daniel ;   et al.
2020-04-30
Method and apparatus for multilayer photoresist dry development
Grant 8,048,325 - Balasubramaniam , et al. November 1, 2
2011-11-01
Method and apparatus for multilayer photoresist dry development
App 20080128388 - BALASUBRAMANIAM; Vaidyanathan ;   et al.
2008-06-05
Method and apparatus for multilayer photoresist dry development
Grant 7,344,991 - Balasubramaniam , et al. March 18, 2
2008-03-18
Process and system for etching doped silicon
App 20070056927 - Tsou; Len Y. ;   et al.
2007-03-15
Method and apparatus for etching an organic layer
App 20050136666 - Balasubramaniam, Vaidyanathan ;   et al.
2005-06-23
Method and apparatus for multilayer photoresist dry development
App 20040180269 - Balasubramaniam, Vaidyanathan ;   et al.
2004-09-16

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