Wischmeier; Lars
Patent Applications and Registrations
Patent applications and USPTO patent grants for Wischmeier; Lars.The latest application filed is for "measurement illumination optical unit for guiding illumination light into an object field of a projection exposure system for euv lithography".
- Wischmeier; Lars - Aalen DE
| Patent | Date |
|---|---|
| Measurement Illumination Optical Unit For Guiding Illumination Light Into An Object Field Of A Projection Exposure System For Euv Lithography App 20220057717 - Fischer; Thomas ; et al. | 2022-02-24 |
| Method for illuminating an object field of a projection exposure system Grant 10,409,167 - Endres , et al. Sept | 2019-09-10 |
| Mirror array Grant 9,874,819 - Bieling , et al. January 23, 2 | 2018-01-23 |
| Mirror Array App 20160342095 - Bieling; Stig ; et al. | 2016-11-24 |
| Method For Illuminating An Object Field Of A Projection Exposure System App 20160342094 - Endres; Martin ; et al. | 2016-11-24 |
| EUV lithography system Grant 9,448,490 - Dinger , et al. September 20, 2 | 2016-09-20 |
| EUV Lithography System App 20130265560 - Dinger; Udo ; et al. | 2013-10-10 |
| Measurement Of An Imaging Optical System By Superposition Of Patterns App 20120249985 - WISCHMEIER; Lars ; et al. | 2012-10-04 |
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