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Patent applications and USPTO patent grants for Williams; Richard Stanley.The latest application filed is for "alignment for contact lithography".
Patent | Date |
---|---|
Imprinting nanoscale patterns for catalysis and fuel cells Grant 7,445,742 - Chen , et al. November 4, 2 | 2008-11-04 |
Alignment for contact lithography App 20080020303 - Wu; Wei ;   et al. | 2008-01-24 |
Increasing adhesion in an imprinting procedure App 20070259189 - Jung; Gun Young ;   et al. | 2007-11-08 |
Increasing adhesion in an imprinting procedure Grant 7,252,862 - Jung , et al. August 7, 2 | 2007-08-07 |
Defect-tolerant and fault-tolerant circuit interconnections Grant 7,191,380 - Kuekes , et al. March 13, 2 | 2007-03-13 |
Polymer precursor and method of making the same App 20060276560 - Ganapathiappan; Sivapackia ;   et al. | 2006-12-07 |
Increasing adhesion in an imprinting procedure App 20060046069 - Jung; Gun Young ;   et al. | 2006-03-02 |
Defect-tolerant and fault-tolerant circuit interconnections App 20050055387 - Kuekes, Philip J. ;   et al. | 2005-03-10 |
Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure App 20040110856 - Young, Jung Gun ;   et al. | 2004-06-10 |
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