Wildman; Horatio S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wildman; Horatio S..The latest application filed is for "method and process for forming a self-aligned silicide contact".

Company Profile

0.5.8

Wildman; Horatio S. - Wappingers Falls NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and process for forming a self-aligned silicide contact Grant 8,101,518 - Cabral, Jr. , et al. January 24, 2	2012-01-24
Method and process for forming a self-aligned silicide contact Grant 7,544,610 - Cabral, Jr. , et al. June 9, 2	2009-06-09
Buried short location determination using voltage contrast inspection Grant 7,474,107 - Patterson , et al. January 6, 2	2009-01-06
Method And Process For Forming A Self-aligned Silicide Contact App 20080274611 - Cabral; Cyril ; et al.	2008-11-06
Buried Short Location Determination Using Voltage Contrast Inspection App 20070222470 - Patterson; Oliver D. ; et al.	2007-09-27
Electroless Cobalt-containing Liner For Middle-of-the-line (mol) Applications App 20070210448 - Wong; Keith Kwong Hon ; et al.	2007-09-13
Methods To Form Heterogeneous Silicides/germanides In Cmos Technology App 20070123042 - Rim; Kern ; et al.	2007-05-31
Method and process for forming a self-aligned silicide contact App 20060051961 - Cabral; Cyril JR. ; et al.	2006-03-09
A Low Thermal Budget (mol) Liner, A Semiconductor Device Comprising Said Liner And Method Of Forming Said Semiconductor Device App 20050221612 - Brown, Laura ; et al.	2005-10-06
Method and apparatus for removing backside edge polymer App 20040137745 - Houghton, Thomas F. ; et al.	2004-07-15
Method for producing a flat interface for a metal-silicon contact barrier film App 20020180046 - Wang, Yun-Yu ; et al.	2002-12-05
Method for forming an atomically flat interface for a highly disordered metal-silicon barrier film Grant 6,022,801 - Domenicucci , et al. February 8, 2	2000-02-08
Method of metal silicide formation in integrated circuit devices Grant 5,401,677 - Bailey , et al. March 28, 1	1995-03-28

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