loadpatents
name:-0.022112846374512
name:-0.014617919921875
name:-0.0029129981994629
Wilcoxson; Mark H. Patent Filings

Wilcoxson; Mark H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wilcoxson; Mark H..The latest application filed is for "electrostatic chuck with flexible wafer temperature control".

Company Profile
2.13.16
  • Wilcoxson; Mark H. - Oakland CA
  • Wilcoxson; Mark H. - Piedmont CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Mask shrink layer for high aspect ratio dielectric etch
Grant 10,431,458 - Hudson , et al. O
2019-10-01
Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch
Grant 10,170,323 - Hudson , et al. J
2019-01-01
Electrostatic Chuck With Flexible Wafer Temperature Control
App 20180286642 - MATYUSHKIN; Alexander ;   et al.
2018-10-04
Technique To Deposit Metal-containing Sidewall Passivation For High Aspect Ratio Cylinder Etch
App 20170170026 - Hudson; Eric A. ;   et al.
2017-06-15
Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch
Grant 9,620,377 - Hudson , et al. April 11, 2
2017-04-11
Mask Shrink Layer For High Aspect Ratio Dielectric Etch
App 20170076945 - Hudson; Eric A. ;   et al.
2017-03-16
Mask shrink layer for high aspect ratio dielectric etch
Grant 9,543,148 - Hudson , et al. January 10, 2
2017-01-10
Technique To Deposit Metal-containing Sidewall Passivation For High Aspect Ratio Cylinder Etch
App 20160163558 - Hudson; Eric A. ;   et al.
2016-06-09
Method and apparatus for pattern collapse free wet processing of semiconductor devices
Grant 8,440,573 - Mikhaylichenko , et al. May 14, 2
2013-05-14
Methods for Using Proximity Head With Configurable Delivery
App 20120199164 - Wilcoxson; Mark H. ;   et al.
2012-08-09
Apparatus for isolated bevel edge clean and method for using the same
Grant 8,127,395 - Yoon , et al. March 6, 2
2012-03-06
Method And Apparatus For Pattern Collapse Free Wet Processing Of Semiconductor Devices
App 20110183522 - Mikhaylichenko; Katrina ;   et al.
2011-07-28
Apparatus for isolated bevel edge clean and method for using the same
App 20090113656 - Yoon; Hyungsuk Alexander ;   et al.
2009-05-07
Proximity Head With Configurable Delivery
App 20080149147 - Wilcoxson; Mark H. ;   et al.
2008-06-26
Plasma in-situ treatment of chemically amplified resist
Grant 7,347,915 - Keil , et al. March 25, 2
2008-03-25
Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition
Grant 7,294,580 - Yun , et al. November 13, 2
2007-11-13
Plasma in-situ treatment of chemically amplified resist
Grant 7,022,611 - Keil , et al. April 4, 2
2006-04-04
Materials and gas chemistries for processing systems
App 20060011583 - Bailey; Andrew D. III ;   et al.
2006-01-19
Method for producing a semiconductor device
Grant 6,873,112 - Wilcoxson , et al. March 29, 2
2005-03-29
Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition
App 20040224520 - Yun, Seokmin ;   et al.
2004-11-11
Method for producing a semiconductor device
App 20040216676 - Wilcoxson, Mark H. ;   et al.
2004-11-04
Antenna for producing uniform process rates
Grant 6,744,213 - Wilcoxson , et al. June 1, 2
2004-06-01
Materials and gas chemistries for processing systems
App 20040011467 - Hemker, David J. ;   et al.
2004-01-22
Antenna for producing uniform process rates
App 20030189524 - Wilcoxson, Mark H. ;   et al.
2003-10-09
Plasma Processing System With Dynamic Gas Distribution Control
App 20030155079 - BAILEY, ANDREW D. III ;   et al.
2003-08-21
Method and apparatus for producing uniform process rates
App 20030145952 - Wilcoxson, Mark H. ;   et al.
2003-08-07
Method and apparatus for producing uniform process rates
Grant 6,518,705 - Wilcoxson , et al. February 11, 2
2003-02-11
Method And Apparatus For Producing Uniform Process Rates
App 20020175869 - Wilcoxson, Mark H. ;   et al.
2002-11-28

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