Patent | Date |
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Lithography method and lithography mask Grant 6,686,098 - Czech , et al. February 3, 2 | 2004-02-03 |
Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask Grant 6,635,388 - Friedrich , et al. October 21, 2 | 2003-10-21 |
Double gated transistor Grant 6,503,784 - Enders , et al. January 7, 2 | 2003-01-07 |
Method for producing a semiconductor memory device with a multiplicity of memory cells Grant 6,468,812 - Widmann , et al. October 22, 2 | 2002-10-22 |
Double gated transistor Grant 6,459,123 - Enders , et al. October 1, 2 | 2002-10-01 |
Field-effect-controlled transistor and method for fabricating the transistor App 20020014669 - Widmann, Dietrich ;   et al. | 2002-02-07 |
Lithography method and lithography mask App 20010021475 - Czech, G?uuml;nther ;   et al. | 2001-09-13 |
Method for producing a semiconductor memory device App 20010012658 - Widmann, Dietrich ;   et al. | 2001-08-09 |
Memory cell having trench capacitor and vertical, dual-gated transistor Grant 6,262,448 - Enders , et al. July 17, 2 | 2001-07-17 |
Ferroelectric memory device and method for producing the device Grant 5,869,860 - Widmann , et al. February 9, 1 | 1999-02-09 |
Method of manufacturing stable, low resistance contacts in integrated semiconductor circuits Grant 4,562,640 - Widmann , et al. January 7, 1 | 1986-01-07 |
Method of making MIS-field effect transistor having a short channel length Grant 4,382,826 - Pfleiderer , et al. May 10, 1 | 1983-05-10 |
Method of producing low-resistance diffused regions in IC MOS semiconductor circuits in silicon-gate technology metal silicide layer formation Grant 4,356,622 - Widmann November 2, 1 | 1982-11-02 |
Method of producing integrated MOS circuits via silicon gate technology Grant 4,313,256 - Widmann February 2, 1 | 1982-02-02 |
MIS-field effect transistor having a short channel length and method of making the same Grant 4,291,321 - Pfleiderer , et al. September 22, 1 | 1981-09-22 |
Arrangement with several thermal elements in series connection Grant 4,211,888 - Stein , et al. July 8, 1 | 1980-07-08 |
Process for the production of fine structures consisting of a vapor-deposited material on a base Grant 4,108,717 - Widmann August 22, 1 | 1978-08-22 |
Process for the automatic adjustment of semiconductor wafers Grant 4,090,068 - Widmann , et al. May 16, 1 | 1978-05-16 |
Process for the production of a bipolar integrated circuit Grant 4,047,975 - Widmann September 13, 1 | 1977-09-13 |
Semiconductors covered by a polymeric heat resistant relief structure Grant 3,953,877 - Sigusch , et al. April 27, 1 | 1976-04-27 |
Contact Exposure Mask For The Selective Exposure Of Photovarnish Coatings For Semiconductor Purposes Grant 3,644,134 - Widmann , et al. February 22, 1 | 1972-02-22 |