Westmoreland; Donald L.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Westmoreland; Donald L..The latest application filed is for "polymeric materials in self-assembled arrays and semiconductor structures and methods comprising such polymeric materials".

Company Profile

0.47.40

Westmoreland; Donald L. - Boise ID
Westmoreland; Donald L. - Garden City ID

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Templates including self-assembled block copolymer films Grant 9,257,256 - Millward , et al. February 9, 2	2016-02-09
Polymeric Materials In Self-assembled Arrays And Semiconductor Structures And Methods Comprising Such Polymeric Materials App 20150137331 - Millward; Dan B. ; et al.	2015-05-21
Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials Grant 8,993,088 - Millward , et al. March 31, 2	2015-03-31
Method And System For Binding Halide-based Contaminants App 20140151857 - Derderian; Garo J. ; et al.	2014-06-05
Method and system for binding halide-based contaminants Grant 8,691,015 - Derderian , et al. April 8, 2	2014-04-08
Templates Including Self-assembled Block Copolymer Films App 20140060736 - Millward; Dan B. ; et al.	2014-03-06
Polymeric Materials In Self-assembled Arrays And Semiconductor Structures Comprising Polymeric Materials App 20130285214 - Millward; Dan B. ; et al.	2013-10-31
Method And System For Binding Halide-based Contaminants App 20130231240 - Derderian; Garo J. ; et al.	2013-09-05
Chemical vapor deposition of titanium Grant 8,456,007 - Sandhu , et al. June 4, 2	2013-06-04
Method and system for binding halide-based contaminants Grant 8,435,886 - Derderian , et al. May 7, 2	2013-05-07
Method And System For Binding Halide-based Contaminants App 20120276750 - Derderian; Garo J. ; et al.	2012-11-01
Method and system for binding halide-based contaminants Grant 8,216,377 - Derderian , et al. July 10, 2	2012-07-10
Method And System For Binding Halide-based Contaminants App 20110147935 - Derderian; Garo J. ; et al.	2011-06-23
Method and system for binding halide-based contaminants Grant 7,922,818 - Derderian , et al. April 12, 2	2011-04-12
Systems and methods for forming niobium and/or vanadium containing layers using atomic layer deposition Grant 7,837,797 - Derderian , et al. November 23, 2	2010-11-23
Systems And Methods For Forming Niobium And/or Vanadium Containing Layers Using Atomic Layer Deposition App 20090127105 - Derderian; Garo J. ; et al.	2009-05-21
Chemical Vapor Deposition Of Titanium App 20090039517 - Sandhu; Gurtej Singh ; et al.	2009-02-12
Methods for forming niobium and/or vanadium containing layers using atomic layer deposition Grant 7,482,037 - Derderian , et al. January 27, 2	2009-01-27
Memory device with chemical vapor deposition of titanium for titanium silicide contacts Grant 7,443,032 - Sandhu , et al. October 28, 2	2008-10-28
Plasmaless dry contact cleaning method using interhalogen compounds Grant 7,371,263 - Sandhu , et al. May 13, 2	2008-05-13
Method for binding halide-based contaminants during formation of a titanium-based film Grant 7,311,942 - Derderian , et al. December 25, 2	2007-12-25
Method of planarizing a surface Grant 7,264,742 - Westmoreland September 4, 2	2007-09-04
Systems and methods for forming niobium and/or vanadium containing layers using atomic layer deposition App 20070148932 - Derderian; Garo J. ; et al.	2007-06-28
Mixed metal nitride and boride barrier layers App 20070045856 - Vaartstra; Brian A. ; et al.	2007-03-01
High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor Grant 7,182,979 - Westmoreland , et al. February 27, 2	2007-02-27
Methods for planarization of group VIII metal-containing surfaces using oxidizing agents App 20060261040 - Klein; Rita J. ; et al.	2006-11-23
Method of forming barrier layers Grant 7,101,779 - Vaartstra , et al. September 5, 2	2006-09-05
Plasmaless dry contact cleaning method using interhalogen compounds App 20060163200 - Sandhu; Gurtej S. ; et al.	2006-07-27
Mold for forming spacers for flat panel displays App 20060139561 - Hofmann; James J. ; et al.	2006-06-29
Plasmaless dry contact cleaning method using interhalogen compounds Grant 7,033,946 - Sandhu , et al. April 25, 2	2006-04-25
Method and system for binding halide-based contaminants App 20060070574 - Derderian; Garo J. ; et al.	2006-04-06
Systems and methods for forming niobium and/or vanadium containing layers using atomic layer deposition App 20060040480 - Derderian; Garo J. ; et al.	2006-02-23
Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides App 20050287819 - Vaartstra, Brian A. ; et al.	2005-12-29
Chemical vapor deposition of titanim App 20050255698 - Sandhu, Gurtej Singh ; et al.	2005-11-17
Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides Grant 6,958,300 - Vaartstra , et al. October 25, 2	2005-10-25
Chemical vapor deposition of titanium Grant 6,940,172 - Sandhu , et al. September 6, 2	2005-09-06
Chemical vapor deposition of titanium Grant 6,903,462 - Sandhu , et al. June 7, 2	2005-06-07
Method for making sol gel spacers for flat panel displays App 20050112298 - Hofmann, James J. ; et al.	2005-05-26
Method of planarizing a surface App 20050020078 - Westmoreland, Donald L.	2005-01-27
Systems and methods for the electrolytic removal of metals from substrates App 20050016869 - Marsh, Eugene P. ; et al.	2005-01-27
Chemical vapor deposition of titanium Grant 6,830,838 - Sandhu , et al. December 14, 2	2004-12-14
Chemical vapor deposition of titanium Grant 6,830,820 - Sandhu , et al. December 14, 2	2004-12-14
Ruthenium and ruthenium dioxide removal method and material Grant 6,827,871 - Westmoreland December 7, 2	2004-12-07
Method for making sol gel spacers for flat panel displays Grant 6,812,990 - Hofmann , et al. November 2, 2	2004-11-02
Systems and methods for the electrolytic removal of metals from substrates Grant 6,783,657 - Marsh , et al. August 31, 2	2004-08-31
Compositions and methods for removing etch residue App 20040157448 - Yates, Donald L. ; et al.	2004-08-12
Method of forming barrier layers App 20040053495 - Vaartstra, Brian A. ; et al.	2004-03-18
Compositions and methods for removing etch residue Grant 6,703,319 - Yates , et al. March 9, 2	2004-03-09
Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides App 20040043630 - Vaartstra, Brian A. ; et al.	2004-03-04
Systems and methods for the electrolytic removal of metals from substrates App 20040040853 - Marsh, Eugene P. ; et al.	2004-03-04
Method and system for binding halide-based contaminants App 20040043228 - Derderian, Garo J. ; et al.	2004-03-04
Mixed metal nitride and boride barrier layers Grant 6,664,159 - Vaartstra , et al. December 16, 2	2003-12-16
Film on a surface of a mold used during semiconductor device fabrication Grant 6,607,173 - Westmoreland August 19, 2	2003-08-19
Ruthenium and ruthenium dioxide removal method and material App 20030121891 - Westmoreland, Donald L.	2003-07-03
Plasmaless dry contact cleaning method using interhalogen compounds App 20030087523 - Sandhu, Gurtej S. ; et al.	2003-05-08
High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor App 20020192376 - Westmoreland, Donald L. ; et al.	2002-12-19
Film on a surface of a mold used during semiconductor device fabrication App 20020185584 - Westmoreland, Donald L.	2002-12-12
Mixed metal nitride and boride barrier layers App 20020163025 - Vaartstra, Brian A. ; et al.	2002-11-07
Ruthenium and ruthenium dioxide removal method and material Grant 6,451,214 - Westmoreland September 17, 2	2002-09-17
Film on a surface of a mold used during semiconductor device fabrication Grant 6,446,933 - Westmoreland September 10, 2	2002-09-10
Mixed metal nitride and boride barrier layers Grant 6,445,023 - Vaartstra , et al. September 3, 2	2002-09-03
Ruthenium and ruthenium dioxide removal method and material App 20020056829 - Westmoreland, Donald L.	2002-05-16
Ruthenium and ruthenium dioxide removal method and material App 20020056697 - Westmoreland, Donald L.	2002-05-16
Ruthenium and ruthenium dioxide removal method and material App 20020056701 - Westmoreland, Donald L.	2002-05-16
Chemical vapor deposition of titanium App 20020017724 - Sandhu, Gurtej Singh ; et al.	2002-02-14
Chemical vapor deposition of titanium App 20020006525 - Sandhu, Gurtej Singh ; et al.	2002-01-17
Plasmaless Dry Contact Cleaning Method Using Interhalogen Compounds App 20020004308 - SANDHU, GURTEJ S. ; et al.	2002-01-10
Chemical vapor deposition of titanium App 20020000263 - Sandhu, Gurtej Singh ; et al.	2002-01-03
Chemical vapor deposition of titanium App 20020000662 - Sandhu, Gurtej Singh ; et al.	2002-01-03
Chemical vapor deposition of titanium Grant 6,284,316 - Sandhu , et al. September 4, 2	2001-09-04
Chemical Vapor Deposition Apparatus With Liquid Feed App 20010001949 - WESTMORELAND, DONALD L. ; et al.	2001-05-31
System for wafer cleaning Grant 6,235,145 - Li , et al. May 22, 2	2001-05-22
Chamber and cleaning process therefor Grant 6,201,219 - Sandhu , et al. March 13, 2	2001-03-13
Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor Grant 6,162,499 - Sandhu , et al. December 19, 2	2000-12-19
Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds Grant 5,902,651 - Westmoreland , et al. May 11, 1	1999-05-11
Plasmaless dry contact cleaning method using interhalogen compounds Grant 5,888,906 - Sandhu , et al. March 30, 1	1999-03-30
Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor Grant 5,824,365 - Sandhu , et al. October 20, 1	1998-10-20
Method of wafer cleaning, and system and cleaning solution regarding same Grant 5,783,495 - Li , et al. July 21, 1	1998-07-21
Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds Grant 5,693,377 - Westmoreland , et al. December 2, 1	1997-12-02
Vapor delivery system for solid precursors and method regarding same Grant 5,674,574 - Atwell , et al. October 7, 1	1997-10-07
Reductive elimination chemical vapor deposition processes utilizing organometallic precursor compounds in semiconductor wafer processing Grant 5,384,289 - Westmoreland January 24, 1	1995-01-24
Method and appartus for subliming precursors Grant 5,377,429 - Sandhu , et al. January 3, 1	1995-01-03
Semiconductor processing method of etching insulating inorganic metal oxide materials and method of cleaning metals from the surface of semiconductor wafers Grant 5,368,687 - Sandhu , et al. November 29, 1	1994-11-29
Methods of chemical-mechanical polishing insulating inorganic metal oxide materials Grant 5,318,927 - Sandhu , et al. June 7, 1	1994-06-07
Titanium/aluminum/nitrogen material for semiconductor devices Grant 5,231,306 - Meikle , et al. July 27, 1	1993-07-27

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