Wen; Youxian

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wen; Youxian.The latest application filed is for "systems and methods for enhancing inspection sensitivity of an inspection tool".

Company Profile

0.17.16

Wen; Youxian - Fremont CA
Wen; Youxian - Livermore CA US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Systems and methods for enhancing inspection sensitivity of an inspection tool Grant 9,747,520 - Li , et al. August 29, 2	2017-08-29
System and method for semiconductor wafer inspection and metrology Grant 9,658,150 - Li , et al. May 23, 2	2017-05-23
In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning Grant 9,645,097 - Nicolaides , et al. May 9, 2	2017-05-09
Systems and Methods for Enhancing Inspection Sensitivity of an Inspection Tool App 20160275671 - Li; Shifang ; et al.	2016-09-22
System And Method For Semiconductor Wafer Inspection And Metrology App 20160202177 - LI; Shifang ; et al.	2016-07-14
In-line Wafer Edge Inspection, Wafer Pre-alignment, And Wafer Cleaning App 20150370175 - Nicolaides; Lena ; et al.	2015-12-24
Evolution of library data sets Grant 8,543,557 - Aikens , et al. September 24, 2	2013-09-24
Determining transmittance of a photomask using optical metrology Grant 7,639,375 - Yedur , et al. December 29, 2	2009-12-29
Global shape definition method for scatterometry Grant 7,613,598 - Opsal , et al. November 3, 2	2009-11-03
Determining position accuracy of double exposure lithography using optical metrology Grant 7,523,439 - Wen , et al. April 21, 2	2009-04-21
Evaluating a profile model to characterize a structure to be examined using optical metrology Grant 7,518,740 - Chard , et al. April 14, 2	2009-04-14
Multiple tool and structure analysis Grant 7,478,019 - Zangooie , et al. January 13, 2	2009-01-13
Determining transmittance of a photomask using optical metrology App 20080144919 - Yedur; Sanjay ; et al.	2008-06-19
Determining position accuracy of double exposure lithography using optical metrology App 20080016487 - Wen; Youxian ; et al.	2008-01-17
Evaluating a profile model to characterize a structure to be examined using optical metrology App 20080007738 - Chard; Jeffrey A. ; et al.	2008-01-10
Global shape definition method for scatterometry App 20070040852 - Opsal; Jon ; et al.	2007-02-22
Global shape definition method for scatterometry Grant 7,145,664 - Opsal , et al. December 5, 2	2006-12-05
Feed forward critical dimension control Grant 7,085,676 - Opsal , et al. August 1, 2	2006-08-01
Multiple tool and structure analysis App 20060167651 - Zangooie; Shahin ; et al.	2006-07-27
Standardized sample for characterizing the performance of a scatterometer Grant 6,989,896 - Wen , et al. January 24, 2	2006-01-24
Evolution of library data sets App 20050182592 - Aikens, David M. ; et al.	2005-08-18
Evolution of library data sets Grant 6,898,596 - Aikens , et al. May 24, 2	2005-05-24
Standardized sample for characterizing the performance of a scatterometer App 20050083520 - Wen, Youxian ; et al.	2005-04-21
Apparatus for optical measurements of nitrogen concentration in thin films Grant 6,882,421 - Opsal , et al. April 19, 2	2005-04-19
Feed forward critical dimension control App 20040267490 - Opsal, Jon ; et al.	2004-12-30
Apparatus for optical measurements of nitrogen concentration in thin films App 20040239933 - Opsal, Jon ; et al.	2004-12-02
Global shape definition method for scatterometry App 20040210402 - Opsal, Jon ; et al.	2004-10-21
Apparatus for optical measurements of nitrogen concentration in thin films Grant 6,784,993 - Opsal , et al. August 31, 2	2004-08-31
Apparatus for optical measurements of nitrogen concentration in thin films App 20030206299 - Opsal, Jon ; et al.	2003-11-06
Apparatus for optical measurements of nitrogen concentration in thin films Grant 6,583,876 - Opsal , et al. June 24, 2	2003-06-24
Evolution of library data sets App 20030076511 - Aikens, David M. ; et al.	2003-04-24
Apparatus for optical measurements of nitrogen concentration in thin films App 20030053053 - Opsal, Jon ; et al.	2003-03-20

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