Wen; Liqing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Wen; Liqing.The latest application filed is for "polishing compositions and methods of using the same".

Company Profile

3.5.10

Wen; Liqing - Mesa AZ

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polishing compositions and methods of use thereof Grant 11,414,568 - Huang , et al. August 16, 2	2022-08-16
Polishing Compositions And Methods Of Using The Same App 20220135840 - Cheng; Qingmin ; et al.	2022-05-05
Polishing Compositions And Methods Of Use Thereof App 20210301177 - McDonough; James ; et al.	2021-09-30
Polishing Compositions And Methods Of Use Thereof App 20210253903 - Huang; Ting-Kai ; et al.	2021-08-19
Polishing Compositions And Methods Of Use Thereof App 20210253904 - Huang; Ting-Kai ; et al.	2021-08-19
Polishing Compositions And Methods Of Use Thereof App 20210108106 - Liang; Yannan ; et al.	2021-04-15
Polishing Compositions And Methods Of Use Thereof App 20210087431 - Liang; Yannan ; et al.	2021-03-25
Chemical mechanical polishing slurry for cobalt applications Grant 10,676,646 - Liang , et al.	2020-06-09
Chemical Mechanical Polishing Slurry For Cobalt Applications App 20180340094 - Liang; Yannan ; et al.	2018-11-29
Ultrapure colloidal silica for use in chemical mechanical polishing applications Grant 8,779,011 - Mahulikar , et al. July 15, 2	2014-07-15
Ultrapure colloidal silica for use in chemical mechanical polishing applications Grant 8,211,193 - Mahulikar , et al. July 3, 2	2012-07-03
Ultrapure Colloidal Silica For Use In Chemical Mechanical Polishing Applications App 20120145950 - Mahulikar; Deepak ; et al.	2012-06-14
Ultrapure colloidal silica for use in chemical mechanical polishing applications App 20070254964 - Mahulikar; Deepak ; et al.	2007-11-01
Ultrapure colloidal silica for use in chemical mechanical polishing applications App 20070075292 - Mahulikar; Deepak ; et al.	2007-04-05

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