Welte; Joachim

Patent Applications and Registrations

Patent applications and USPTO patent grants for Welte; Joachim.The latest application filed is for "method and apparatus for performing an aerial image simulation of a photolithographic mask".

Company Profile

7.10.13

Welte; Joachim - Darmstadt DE
Welte; Joachim - Ubstadt-Weiher DE
Welte; Joachim - Harthausen N/A DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for compensating defects of a mask blank Grant 11,385,539 - Welte July 12, 2	2022-07-12
Method and apparatus for performing an aerial image simulation of a photolithographic mask Grant 11,366,382 - Dmitriev , et al. June 21, 2	2022-06-21
Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask Grant 11,366,383 - Dmitriev , et al. June 21, 2	2022-06-21
Method and apparatus for determining a wavefront of a massive particle beam Grant 11,355,311 - Welte , et al. June 7, 2	2022-06-07
Optical system and method for correcting mask defects using the system Grant 11,249,294 - Seesselberg , et al. February 15, 2	2022-02-15
Method And Apparatus For Performing An Aerial Image Simulation Of A Photolithographic Mask App 20210263406 - Dmitriev; Vladimir ; et al.	2021-08-26
Device And Method For Processing A Microstructured Component App 20210173310 - Auth; Nicole ; et al.	2021-06-10
Method And Apparatus For Determining An Effect Of One Or More Pixels To Be Introduced Into A Substrate Of A Photolithographic Mask App 20210124259 - Welte; Joachim ; et al.	2021-04-29
Method And Apparatus For Determining A Wavefront Of A Massive Particle Beam App 20200312613 - Welte; Joachim ; et al.	2020-10-01
Method And Apparatus For Compensating Defects Of A Mask Blank App 20200159111 - Welte; Joachim	2020-05-21
Method And Apparatus For Determining Positions Of A Plurality Of Pixels To Be Introduced In A Substrate Of A Photolithographic M App 20200124959 - Dmitriev; Vladimir ; et al.	2020-04-23
Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography Grant 10,578,975 - Thaler , et al.	2020-03-03
Financial reporting system integrating market segment attributes and accounting data Grant 10,325,276 - Walz , et al.	2019-06-18
Optical System And Method For Correcting Mask Defects Using The System App 20190170991 - Seesselberg; Markus ; et al.	2019-06-06
Method for Correcting the Critical Dimension Uniformity of a Photomask for Semiconductor Lithography App 20190107783 - Thaler; Thomas ; et al.	2019-04-11
Financial Reporting System Integrating Market Segment Attributes and Accounting Data App 20160292704 - Walz; Stefan ; et al.	2016-10-06
Managing consistent interfaces for financial business objects across heterogeneous systems Grant 8,775,280 - Zech , et al. July 8, 2	2014-07-08
Managing Consistent Interfaces For Financial Business Objects Across Heterogeneous Systems App 20130030963 - Cramer; Christiane ; et al.	2013-01-31
Systems and methods for generating an accounting document Grant 7,987,121 - Conrad , et al. July 26, 2	2011-07-26
Systems and methods for generating an accounting document App 20080004998 - Conrad; Michael ; et al.	2008-01-03
Reconciliation method and apparatus App 20070156546 - Oppert; Till ; et al.	2007-07-05

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