loadpatents
Patent applications and USPTO patent grants for Weigel; Scott Jeffrey.The latest application filed is for "method for removal of carbon from an organosilicate material".
Patent | Date |
---|---|
Method for Removal of Carbon from an Organosilicate Material App 20130295334 - Wu; Aiping ;   et al. | 2013-11-07 |
Process for restoring dielectric properties Grant 8,283,260 - Weigel , et al. October 9, 2 | 2012-10-09 |
Aminosilanes for shallow trench isolation films Grant 7,999,355 - Weigel , et al. August 16, 2 | 2011-08-16 |
Method for Removal of Carbon From An Organosilicate Material App 20100151206 - Wu; Aiping ;   et al. | 2010-06-17 |
Process For Restoring Dielectric Properties App 20100041234 - Weigel; Scott Jeffrey ;   et al. | 2010-02-18 |
Aminosilanes for Shallow Trench Isolation Films App 20100009546 - Weigel; Scott Jeffrey ;   et al. | 2010-01-14 |
Compositions for Preparing Low Dielectric Materials Containing Solvents App 20090298671 - Weigel; Scott Jeffrey ;   et al. | 2009-12-03 |
Activated chemical process for enhancing material properties of dielectric films Grant 7,500,397 - Weigel , et al. March 10, 2 | 2009-03-10 |
Compositions for preparing low dielectric materials Grant 7,482,676 - Peterson , et al. January 27, 2 | 2009-01-27 |
Aerosol misted deposition of low dielectric organosilicate films Grant 7,446,055 - Weigel , et al. November 4, 2 | 2008-11-04 |
Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same App 20080264672 - Markley; Thomas John ;   et al. | 2008-10-30 |
Adsorbents, methods of preparation, and methods of use thereof Grant 7,442,232 - White , et al. October 28, 2 | 2008-10-28 |
Method for characterizing porous low dielectric constant films Grant 7,421,885 - Kitzhoffer , et al. September 9, 2 | 2008-09-09 |
Activated Chemical Process for Enhancing Material Properties of Dielectric Films App 20080199977 - Weigel; Scott Jeffrey ;   et al. | 2008-08-21 |
Low Temperature Sol-Gel Silicates As Dielectrics or Planarization Layers For Thin Film Transistors App 20080012074 - Braymer; Thomas Albert ;   et al. | 2008-01-17 |
Curing Dielectric Films Under A Reducing Atmosphere App 20070299239 - Weigel; Scott Jeffrey ;   et al. | 2007-12-27 |
Photodefinable low dielectric constant material and method for making and using same App 20070299176 - Markley; Thomas John ;   et al. | 2007-12-27 |
Low dielectric materials and methods for making same Grant 7,307,343 - Kirner , et al. December 11, 2 | 2007-12-11 |
Compositions for preparing low dielectric materials Grant 7,294,585 - Peterson , et al. November 13, 2 | 2007-11-13 |
Ionic additives for extreme low dielectric constant chemical formulations Grant 7,265,062 - Mandal , et al. September 4, 2 | 2007-09-04 |
Top coat for lithography processes App 20070196773 - Weigel; Scott Jeffrey ;   et al. | 2007-08-23 |
Low dielectric materials and methods for making same Grant 7,186,613 - Kirner , et al. March 6, 2 | 2007-03-06 |
Compositions for preparing low dielectric materials App 20060249713 - Peterson; Brian Keith ;   et al. | 2006-11-09 |
Compositions for preparing low dielectric materials App 20060249818 - Peterson; Brian Keith ;   et al. | 2006-11-09 |
Compositions for preparing low dielectric materials Grant 7,122,880 - Peterson , et al. October 17, 2 | 2006-10-17 |
Aerosol misted deposition of low dielectric organosilicate films App 20060211271 - Weigel; Scott Jeffrey ;   et al. | 2006-09-21 |
Method for defining a feature on a substrate App 20060183055 - O'Neill; Mark Leonard ;   et al. | 2006-08-17 |
Adsorbents, methods of preparation, and methods of use thereof App 20060144227 - White; MarkG ;   et al. | 2006-07-06 |
Method for characterizing porous low dielectric constant films App 20060005608 - Kitzhoffer; Ronald Joseph ;   et al. | 2006-01-12 |
Low dielectric materials and methods for making same App 20050260420 - Collins, Martha Jean ;   et al. | 2005-11-24 |
Mesoporous films having reduced dielectric constants Grant 6,942,918 - MacDougall , et al. September 13, 2 | 2005-09-13 |
Solvents and methods using same for removing silicon-containing residues from a substrate App 20050196535 - Weigel, Scott Jeffrey ;   et al. | 2005-09-08 |
Compositions for preparing low dielectric materials containing solvents App 20050196974 - Weigel, Scott Jeffrey ;   et al. | 2005-09-08 |
Low dielectric materials and methods for making same App 20050116346 - Kirner, John Francis ;   et al. | 2005-06-02 |
Mesoporous films having reduced dielectric constants Grant 6,818,289 - MacDougall , et al. November 16, 2 | 2004-11-16 |
Apparatus and method of research for creating and testing thin films App 20040071888 - Chondroudis, Konstantinos ;   et al. | 2004-04-15 |
Compositions for preparing low dielectric materials App 20040048960 - Peterson, Brian Keith ;   et al. | 2004-03-11 |
Low dielectric materials and methods for making same App 20030224156 - Kirner, John Francis ;   et al. | 2003-12-04 |
Mesoporous films having reduced dielectric constants App 20030157311 - MacDougall, James Edward ;   et al. | 2003-08-21 |
Mesoporous films having reduced dielectric constants Grant 6,592,980 - MacDougall , et al. July 15, 2 | 2003-07-15 |
Mesoporous films having reduced dielectric constants App 20020102396 - MacDougall, James Edward ;   et al. | 2002-08-01 |
Mesoporous films having reduced dielectric constants Grant 6,365,266 - MacDougall , et al. April 2, 2 | 2002-04-02 |
Carbon dioxide adsorbents containing magnesium oxide suitable for use at high temperatures Grant 6,280,503 - Mayorga , et al. August 28, 2 | 2001-08-28 |
Gas separation with lithium-containing ZSM-2 metallosilicates Grant 5,779,766 - Weigel , et al. July 14, 1 | 1998-07-14 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.