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Patent applications and USPTO patent grants for Weidman; Timothy William.The latest application filed is for "bake strategies to enhance lithographic performance of metal-containing resist".
Patent | Date |
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Bake Strategies To Enhance Lithographic Performance Of Metal-containing Resist App 20220308454 - Weidman; Timothy William ;   et al. | 2022-09-29 |
Apparatus For Photoresist Dry Deposition App 20220308462 - Berney; Butch ;   et al. | 2022-09-29 |
Positive Tone Development Of Cvd Euv Resist Films App 20220299877 - Weidman; Timothy William ;   et al. | 2022-09-22 |
Photoresist Development With Halide Chemistries App 20220244645 - Tan; Samantha SiamHwa ;   et al. | 2022-08-04 |
Dry Development Of Resists App 20220020584 - Volosskiy; Boris ;   et al. | 2022-01-20 |
Methods For Making Hard Masks Useful In Next-generation Lithography App 20210397085 - Weidman; Timothy William ;   et al. | 2021-12-23 |
Methods For Making Euv Patternable Hard Masks App 20210013034 - Wu; Chenghao ;   et al. | 2021-01-14 |
Method for developing images in energy sensitive materials Grant 6,013,418 - Ma , et al. January 11, 2 | 2000-01-11 |
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